JPS5349955A - Spin coating method - Google Patents
Spin coating methodInfo
- Publication number
- JPS5349955A JPS5349955A JP12462076A JP12462076A JPS5349955A JP S5349955 A JPS5349955 A JP S5349955A JP 12462076 A JP12462076 A JP 12462076A JP 12462076 A JP12462076 A JP 12462076A JP S5349955 A JPS5349955 A JP S5349955A
- Authority
- JP
- Japan
- Prior art keywords
- coating method
- spin coating
- substrate surface
- entire substrate
- nearly
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/40—Distributing applied liquids or other fluent materials by members moving relatively to surface
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To secure a uniform thickness application film formation on the entire substrate surface by rotating the substrate after applying uniformly the application solution previously on nearly the entire substrate surface.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12462076A JPS5349955A (en) | 1976-10-18 | 1976-10-18 | Spin coating method |
DE19772746519 DE2746519A1 (en) | 1976-10-18 | 1977-10-17 | Spreading of photoresist emulsion over plate - includes application from array of nozzles followed by plate spinning |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12462076A JPS5349955A (en) | 1976-10-18 | 1976-10-18 | Spin coating method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5349955A true JPS5349955A (en) | 1978-05-06 |
JPS5613377B2 JPS5613377B2 (en) | 1981-03-27 |
Family
ID=14889914
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12462076A Granted JPS5349955A (en) | 1976-10-18 | 1976-10-18 | Spin coating method |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPS5349955A (en) |
DE (1) | DE2746519A1 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57192955A (en) * | 1981-05-25 | 1982-11-27 | Toppan Printing Co Ltd | Developing method |
JPS6242766A (en) * | 1985-08-14 | 1987-02-24 | Kyodo Printing Co Ltd | Formation of coated film |
JP2006263638A (en) * | 2005-03-25 | 2006-10-05 | Dainippon Printing Co Ltd | Coater of coating liquid and method of coating |
JP2007055846A (en) * | 2005-08-24 | 2007-03-08 | Tokyo Electron Ltd | METHOD OF FORMING DIELECTRIC FILM HAVING ABOx TYPE PEROVSKITE CRYSTAL STRUCTURE |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4564280A (en) * | 1982-10-28 | 1986-01-14 | Fujitsu Limited | Method and apparatus for developing resist film including a movable nozzle arm |
JPS6145506A (en) * | 1985-07-16 | 1986-03-05 | 三菱電機株式会社 | Hooked ceiling |
JPH07284715A (en) * | 1994-04-15 | 1995-10-31 | Dainippon Screen Mfg Co Ltd | Device and method for applying treatment liquid |
JPH08213308A (en) * | 1994-11-29 | 1996-08-20 | Tokyo Ohka Kogyo Co Ltd | Coating method |
DE10351963B4 (en) * | 2003-11-07 | 2013-08-22 | Süss Microtec Lithography Gmbh | Process for coating semiconductor substrates |
DE102020005723A1 (en) | 2020-09-18 | 2022-03-24 | Westsächsische Hochschule Zwickau | Process for coating three-dimensional substrates with photostructurable resists |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5067578A (en) * | 1973-10-15 | 1975-06-06 |
-
1976
- 1976-10-18 JP JP12462076A patent/JPS5349955A/en active Granted
-
1977
- 1977-10-17 DE DE19772746519 patent/DE2746519A1/en not_active Withdrawn
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5067578A (en) * | 1973-10-15 | 1975-06-06 |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57192955A (en) * | 1981-05-25 | 1982-11-27 | Toppan Printing Co Ltd | Developing method |
JPS6242766A (en) * | 1985-08-14 | 1987-02-24 | Kyodo Printing Co Ltd | Formation of coated film |
JP2006263638A (en) * | 2005-03-25 | 2006-10-05 | Dainippon Printing Co Ltd | Coater of coating liquid and method of coating |
JP4588506B2 (en) * | 2005-03-25 | 2010-12-01 | 大日本印刷株式会社 | Coating liquid coating apparatus and coating method |
JP2007055846A (en) * | 2005-08-24 | 2007-03-08 | Tokyo Electron Ltd | METHOD OF FORMING DIELECTRIC FILM HAVING ABOx TYPE PEROVSKITE CRYSTAL STRUCTURE |
Also Published As
Publication number | Publication date |
---|---|
DE2746519A1 (en) | 1978-04-20 |
JPS5613377B2 (en) | 1981-03-27 |
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