JPS5318965A - Resist coating method - Google Patents

Resist coating method

Info

Publication number
JPS5318965A
JPS5318965A JP9324676A JP9324676A JPS5318965A JP S5318965 A JPS5318965 A JP S5318965A JP 9324676 A JP9324676 A JP 9324676A JP 9324676 A JP9324676 A JP 9324676A JP S5318965 A JPS5318965 A JP S5318965A
Authority
JP
Japan
Prior art keywords
coating method
resist coating
centrifugally
wafers
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9324676A
Other languages
Japanese (ja)
Other versions
JPS5337705B2 (en
Inventor
Koji Igarashi
Niwaji Majima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP9324676A priority Critical patent/JPS5318965A/en
Publication of JPS5318965A publication Critical patent/JPS5318965A/en
Publication of JPS5337705B2 publication Critical patent/JPS5337705B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)

Abstract

PURPOSE: To centrifugally coat resist on wafers and form a uniform film while injecting air of 0 to 10°C nearly perpendicularly to the wafer.
COPYRIGHT: (C)1978,JPO&Japio
JP9324676A 1976-08-06 1976-08-06 Resist coating method Granted JPS5318965A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9324676A JPS5318965A (en) 1976-08-06 1976-08-06 Resist coating method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9324676A JPS5318965A (en) 1976-08-06 1976-08-06 Resist coating method

Publications (2)

Publication Number Publication Date
JPS5318965A true JPS5318965A (en) 1978-02-21
JPS5337705B2 JPS5337705B2 (en) 1978-10-11

Family

ID=14077141

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9324676A Granted JPS5318965A (en) 1976-08-06 1976-08-06 Resist coating method

Country Status (1)

Country Link
JP (1) JPS5318965A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0824621A (en) * 1995-07-17 1996-01-30 Hitachi Ltd Method for dropping treating liquid
US6498433B1 (en) 1999-12-30 2002-12-24 General Electric Company High temperature glaze for metal halide arctubes

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0824621A (en) * 1995-07-17 1996-01-30 Hitachi Ltd Method for dropping treating liquid
US6498433B1 (en) 1999-12-30 2002-12-24 General Electric Company High temperature glaze for metal halide arctubes

Also Published As

Publication number Publication date
JPS5337705B2 (en) 1978-10-11

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