JPS5318965A - Resist coating method - Google Patents
Resist coating methodInfo
- Publication number
- JPS5318965A JPS5318965A JP9324676A JP9324676A JPS5318965A JP S5318965 A JPS5318965 A JP S5318965A JP 9324676 A JP9324676 A JP 9324676A JP 9324676 A JP9324676 A JP 9324676A JP S5318965 A JPS5318965 A JP S5318965A
- Authority
- JP
- Japan
- Prior art keywords
- coating method
- resist coating
- centrifugally
- wafers
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Coating Apparatus (AREA)
Abstract
PURPOSE: To centrifugally coat resist on wafers and form a uniform film while injecting air of 0 to 10°C nearly perpendicularly to the wafer.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9324676A JPS5318965A (en) | 1976-08-06 | 1976-08-06 | Resist coating method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9324676A JPS5318965A (en) | 1976-08-06 | 1976-08-06 | Resist coating method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5318965A true JPS5318965A (en) | 1978-02-21 |
JPS5337705B2 JPS5337705B2 (en) | 1978-10-11 |
Family
ID=14077141
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9324676A Granted JPS5318965A (en) | 1976-08-06 | 1976-08-06 | Resist coating method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5318965A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0824621A (en) * | 1995-07-17 | 1996-01-30 | Hitachi Ltd | Method for dropping treating liquid |
US6498433B1 (en) | 1999-12-30 | 2002-12-24 | General Electric Company | High temperature glaze for metal halide arctubes |
-
1976
- 1976-08-06 JP JP9324676A patent/JPS5318965A/en active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0824621A (en) * | 1995-07-17 | 1996-01-30 | Hitachi Ltd | Method for dropping treating liquid |
US6498433B1 (en) | 1999-12-30 | 2002-12-24 | General Electric Company | High temperature glaze for metal halide arctubes |
Also Published As
Publication number | Publication date |
---|---|
JPS5337705B2 (en) | 1978-10-11 |
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