JPS51132085A - Manufacturing method of semiconductor device - Google Patents
Manufacturing method of semiconductor deviceInfo
- Publication number
- JPS51132085A JPS51132085A JP50056307A JP5630775A JPS51132085A JP S51132085 A JPS51132085 A JP S51132085A JP 50056307 A JP50056307 A JP 50056307A JP 5630775 A JP5630775 A JP 5630775A JP S51132085 A JPS51132085 A JP S51132085A
- Authority
- JP
- Japan
- Prior art keywords
- manufacturing
- semiconductor device
- pattern
- processings
- arranging
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To form a correct pattern by arranging a cover film which has an appointed pattern of stage difference on the surface of a semiconductor base plate and is made of the material that is resistible against a various kind of processings.
COPYRIGHT: (C)1976,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50056307A JPS51132085A (en) | 1975-05-12 | 1975-05-12 | Manufacturing method of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50056307A JPS51132085A (en) | 1975-05-12 | 1975-05-12 | Manufacturing method of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS51132085A true JPS51132085A (en) | 1976-11-16 |
Family
ID=13023474
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50056307A Pending JPS51132085A (en) | 1975-05-12 | 1975-05-12 | Manufacturing method of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS51132085A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57186334A (en) * | 1981-05-04 | 1982-11-16 | Fairchild Camera Instr Co | Matching mark in electron beam drawing system |
JPS58128A (en) * | 1981-06-11 | 1983-01-05 | ウエスタ−ン・エレクトリツク・カムパニ−・インコ−ポレ−テツド | Method of producing integrated circuit |
-
1975
- 1975-05-12 JP JP50056307A patent/JPS51132085A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57186334A (en) * | 1981-05-04 | 1982-11-16 | Fairchild Camera Instr Co | Matching mark in electron beam drawing system |
JPH0363207B2 (en) * | 1981-05-04 | 1991-09-30 | Fueachairudo Kamera Endo Insutsurumento Corp | |
JPS58128A (en) * | 1981-06-11 | 1983-01-05 | ウエスタ−ン・エレクトリツク・カムパニ−・インコ−ポレ−テツド | Method of producing integrated circuit |
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