JPS51120180A - Pattern printing device - Google Patents

Pattern printing device

Info

Publication number
JPS51120180A
JPS51120180A JP50044831A JP4483175A JPS51120180A JP S51120180 A JPS51120180 A JP S51120180A JP 50044831 A JP50044831 A JP 50044831A JP 4483175 A JP4483175 A JP 4483175A JP S51120180 A JPS51120180 A JP S51120180A
Authority
JP
Japan
Prior art keywords
printing device
pattern printing
masks
wafers
positioning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP50044831A
Other languages
Japanese (ja)
Other versions
JPS5519425B2 (en
Inventor
Kazue Yoshida
Makoto Asakawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP50044831A priority Critical patent/JPS51120180A/en
Publication of JPS51120180A publication Critical patent/JPS51120180A/en
Publication of JPS5519425B2 publication Critical patent/JPS5519425B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Control Of Position Or Direction (AREA)
  • Projection-Type Copiers In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To obtain a pattern printing device can automatically perform the positioning of masks and wafers with a high accuracy.
COPYRIGHT: (C)1976,JPO&Japio
JP50044831A 1975-04-15 1975-04-15 Pattern printing device Granted JPS51120180A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50044831A JPS51120180A (en) 1975-04-15 1975-04-15 Pattern printing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50044831A JPS51120180A (en) 1975-04-15 1975-04-15 Pattern printing device

Publications (2)

Publication Number Publication Date
JPS51120180A true JPS51120180A (en) 1976-10-21
JPS5519425B2 JPS5519425B2 (en) 1980-05-26

Family

ID=12702396

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50044831A Granted JPS51120180A (en) 1975-04-15 1975-04-15 Pattern printing device

Country Status (1)

Country Link
JP (1) JPS51120180A (en)

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5364479A (en) * 1976-11-22 1978-06-08 Nippon Telegr & Teleph Corp <Ntt> Position aligning system
JPS5496358A (en) * 1977-12-24 1979-07-30 Nec Home Electronics Ltd Manufacture of semiconductor device
JPS5496374A (en) * 1978-01-17 1979-07-30 Hitachi Ltd Automatic positioning device
JPS54114183A (en) * 1978-02-27 1979-09-06 Canon Inc Position matching method
JPS5560949A (en) * 1978-10-31 1980-05-08 Nippon Telegr & Teleph Corp <Ntt> Positioning mark for radiation working
JPS587136A (en) * 1981-07-06 1983-01-14 Hitachi Ltd Method and device for projection type exposure
JPS5831526A (en) * 1981-08-19 1983-02-24 Nippon Kogaku Kk <Nikon> Alignment device of printing equipment
JPS5918950A (en) * 1982-07-09 1984-01-31 パ−キン−エルマ−・ツエンゾ−ル・アンシユタルト Apparatus for projection transfer of mask on work piece and adjusting method thereof
JPS62199031A (en) * 1986-02-27 1987-09-02 Rohm Co Ltd Exposure device
JPS63175859A (en) * 1987-01-16 1988-07-20 Ushio Inc Exposure system for production of liquid crystal substrate
JPH0316113A (en) * 1990-06-15 1991-01-24 Hitachi Ltd Exposure device
JPH04123404U (en) * 1991-04-23 1992-11-09 安藤電気株式会社 Mechanism for stopping moving objects using light
JP2006165359A (en) * 2004-12-09 2006-06-22 Canon Inc Dicing method of wafer and liquid ejecting head
JP2007150297A (en) * 2005-11-23 2007-06-14 Asml Netherlands Bv Method of measuring magnification of projection system, manufacturing method for device, and computer program product

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6277034A (en) * 1985-09-25 1987-04-09 Nippon Denso Co Ltd Ac generator for vehicle

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4959576A (en) * 1972-06-29 1974-06-10

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4959576A (en) * 1972-06-29 1974-06-10

Cited By (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS563660B2 (en) * 1976-11-22 1981-01-26
JPS5364479A (en) * 1976-11-22 1978-06-08 Nippon Telegr & Teleph Corp <Ntt> Position aligning system
JPS5496358A (en) * 1977-12-24 1979-07-30 Nec Home Electronics Ltd Manufacture of semiconductor device
JPS5496374A (en) * 1978-01-17 1979-07-30 Hitachi Ltd Automatic positioning device
JPS6238853B2 (en) * 1978-01-17 1987-08-20 Hitachi Ltd
JPS6148251B2 (en) * 1978-02-27 1986-10-23 Canon Kk
JPS54114183A (en) * 1978-02-27 1979-09-06 Canon Inc Position matching method
JPS5560949A (en) * 1978-10-31 1980-05-08 Nippon Telegr & Teleph Corp <Ntt> Positioning mark for radiation working
JPS5760623B2 (en) * 1978-10-31 1982-12-20 Nippon Telegraph & Telephone
JPS587136A (en) * 1981-07-06 1983-01-14 Hitachi Ltd Method and device for projection type exposure
JPH0516014B2 (en) * 1981-07-06 1993-03-03 Hitachi Ltd
JPH0341972B2 (en) * 1981-08-19 1991-06-25
JPS5831526A (en) * 1981-08-19 1983-02-24 Nippon Kogaku Kk <Nikon> Alignment device of printing equipment
JPS5918950A (en) * 1982-07-09 1984-01-31 パ−キン−エルマ−・ツエンゾ−ル・アンシユタルト Apparatus for projection transfer of mask on work piece and adjusting method thereof
JPH0588529B2 (en) * 1986-02-27 1993-12-22 Rohm Kk
JPS62199031A (en) * 1986-02-27 1987-09-02 Rohm Co Ltd Exposure device
JPS63175859A (en) * 1987-01-16 1988-07-20 Ushio Inc Exposure system for production of liquid crystal substrate
JPH0316113A (en) * 1990-06-15 1991-01-24 Hitachi Ltd Exposure device
JPH04123404U (en) * 1991-04-23 1992-11-09 安藤電気株式会社 Mechanism for stopping moving objects using light
JP2006165359A (en) * 2004-12-09 2006-06-22 Canon Inc Dicing method of wafer and liquid ejecting head
JP4617150B2 (en) * 2004-12-09 2011-01-19 キヤノン株式会社 Wafer dicing method
JP2007150297A (en) * 2005-11-23 2007-06-14 Asml Netherlands Bv Method of measuring magnification of projection system, manufacturing method for device, and computer program product
JP4527099B2 (en) * 2005-11-23 2010-08-18 エーエスエムエル ネザーランズ ビー．ブイ． Method for measuring the magnification of a projection system, device manufacturing method and computer program product

Also Published As

Publication number Publication date
JPS5519425B2 (en) 1980-05-26

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