JPS5277670A - Semiconductive device - Google Patents

Semiconductive device

Info

Publication number
JPS5277670A
JPS5277670A JP50154219A JP15421975A JPS5277670A JP S5277670 A JPS5277670 A JP S5277670A JP 50154219 A JP50154219 A JP 50154219A JP 15421975 A JP15421975 A JP 15421975A JP S5277670 A JPS5277670 A JP S5277670A
Authority
JP
Japan
Prior art keywords
pattern
semiconductive device
masking
differenct
allignment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP50154219A
Other languages
Japanese (ja)
Other versions
JPS5854496B2 (en
Inventor
Mitsuharu Kodaira
Keiko Hayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Suwa Seikosha KK
Original Assignee
Seiko Epson Corp
Suwa Seikosha KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp, Suwa Seikosha KK filed Critical Seiko Epson Corp
Priority to JP50154219A priority Critical patent/JPS5854496B2/en
Publication of JPS5277670A publication Critical patent/JPS5277670A/en
Publication of JPS5854496B2 publication Critical patent/JPS5854496B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE: To improve the precision of allignment of the semiconductor by masking with outer side and inner side of each pattern when the pattern is put upon another on the masking process with using the mask which has at least three differenct pattern.
COPYRIGHT: (C)1977,JPO&Japio
JP50154219A 1975-12-24 1975-12-24 Manufacturing method of semiconductor device Expired JPS5854496B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50154219A JPS5854496B2 (en) 1975-12-24 1975-12-24 Manufacturing method of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50154219A JPS5854496B2 (en) 1975-12-24 1975-12-24 Manufacturing method of semiconductor device

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP59183892A Division JPS6074435A (en) 1984-09-03 1984-09-03 Manufacture of semiconductor device

Publications (2)

Publication Number Publication Date
JPS5277670A true JPS5277670A (en) 1977-06-30
JPS5854496B2 JPS5854496B2 (en) 1983-12-05

Family

ID=15579438

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50154219A Expired JPS5854496B2 (en) 1975-12-24 1975-12-24 Manufacturing method of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5854496B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5627927A (en) * 1979-08-14 1981-03-18 Toshiba Corp Location in electron beam injection
JPS5794941U (en) * 1980-12-02 1982-06-11
JPS5875836A (en) * 1981-10-30 1983-05-07 Matsushita Electric Ind Co Ltd Matching method for mask of integrated circuit

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5872280A (en) * 1981-10-26 1983-04-30 Tamura Electric Works Ltd Counter

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5627927A (en) * 1979-08-14 1981-03-18 Toshiba Corp Location in electron beam injection
JPS6244686B2 (en) * 1979-08-14 1987-09-22 Tokyo Shibaura Electric Co
JPS5794941U (en) * 1980-12-02 1982-06-11
JPS622764Y2 (en) * 1980-12-02 1987-01-22
JPS5875836A (en) * 1981-10-30 1983-05-07 Matsushita Electric Ind Co Ltd Matching method for mask of integrated circuit

Also Published As

Publication number Publication date
JPS5854496B2 (en) 1983-12-05

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