JPS51120178A - Scanning type mask detector - Google Patents

Scanning type mask detector

Info

Publication number
JPS51120178A
JPS51120178A JP50044274A JP4427475A JPS51120178A JP S51120178 A JPS51120178 A JP S51120178A JP 50044274 A JP50044274 A JP 50044274A JP 4427475 A JP4427475 A JP 4427475A JP S51120178 A JPS51120178 A JP S51120178A
Authority
JP
Japan
Prior art keywords
scanning type
type mask
mask detector
detector
scanning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP50044274A
Other languages
Japanese (ja)
Other versions
JPS5518044B2 (en
Inventor
Shinichi Yamazaki
Hiroshi Horikawa
Kazuo Minowa
Hideo Watanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP50044274A priority Critical patent/JPS51120178A/en
Publication of JPS51120178A publication Critical patent/JPS51120178A/en
Publication of JPS5518044B2 publication Critical patent/JPS5518044B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE: To obtain a scanning mark detector which performs, with high accuracy and high speed, the relative positioning of wafers and masks used in the processing of LSI.
COPYRIGHT: (C)1976,JPO&Japio
JP50044274A 1975-04-14 1975-04-14 Scanning type mask detector Granted JPS51120178A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50044274A JPS51120178A (en) 1975-04-14 1975-04-14 Scanning type mask detector

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50044274A JPS51120178A (en) 1975-04-14 1975-04-14 Scanning type mask detector

Publications (2)

Publication Number Publication Date
JPS51120178A true JPS51120178A (en) 1976-10-21
JPS5518044B2 JPS5518044B2 (en) 1980-05-16

Family

ID=12686918

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50044274A Granted JPS51120178A (en) 1975-04-14 1975-04-14 Scanning type mask detector

Country Status (1)

Country Link
JP (1) JPS51120178A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53111280A (en) * 1977-03-10 1978-09-28 Canon Inc Mask or wafer for production of semiconductor elements and device for aligning these
JPS54152975A (en) * 1978-05-22 1979-12-01 Siemens Ag Method of and device for automatically coinciding
JPS54157478A (en) * 1978-06-01 1979-12-12 Canon Inc Alignment method
JPS5534490A (en) * 1978-09-01 1980-03-11 Canon Inc Alignment device

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53111280A (en) * 1977-03-10 1978-09-28 Canon Inc Mask or wafer for production of semiconductor elements and device for aligning these
JPS6216012B2 (en) * 1977-03-10 1987-04-10 Canon Kk
JPS54152975A (en) * 1978-05-22 1979-12-01 Siemens Ag Method of and device for automatically coinciding
JPH0135492B2 (en) * 1978-05-22 1989-07-25 Siemens Ag
JPS54157478A (en) * 1978-06-01 1979-12-12 Canon Inc Alignment method
JPS63942B2 (en) * 1978-06-01 1988-01-09 Canon Kk
JPS5534490A (en) * 1978-09-01 1980-03-11 Canon Inc Alignment device

Also Published As

Publication number Publication date
JPS5518044B2 (en) 1980-05-16

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