JPS51120178A - Scanning type mask detector - Google Patents
Scanning type mask detectorInfo
- Publication number
- JPS51120178A JPS51120178A JP50044274A JP4427475A JPS51120178A JP S51120178 A JPS51120178 A JP S51120178A JP 50044274 A JP50044274 A JP 50044274A JP 4427475 A JP4427475 A JP 4427475A JP S51120178 A JPS51120178 A JP S51120178A
- Authority
- JP
- Japan
- Prior art keywords
- scanning type
- type mask
- mask detector
- detector
- scanning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE: To obtain a scanning mark detector which performs, with high accuracy and high speed, the relative positioning of wafers and masks used in the processing of LSI.
COPYRIGHT: (C)1976,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50044274A JPS51120178A (en) | 1975-04-14 | 1975-04-14 | Scanning type mask detector |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50044274A JPS51120178A (en) | 1975-04-14 | 1975-04-14 | Scanning type mask detector |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS51120178A true JPS51120178A (en) | 1976-10-21 |
JPS5518044B2 JPS5518044B2 (en) | 1980-05-16 |
Family
ID=12686918
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50044274A Granted JPS51120178A (en) | 1975-04-14 | 1975-04-14 | Scanning type mask detector |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS51120178A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53111280A (en) * | 1977-03-10 | 1978-09-28 | Canon Inc | Mask or wafer for production of semiconductor elements and device for aligning these |
JPS54152975A (en) * | 1978-05-22 | 1979-12-01 | Siemens Ag | Method of and device for automatically coinciding |
JPS54157478A (en) * | 1978-06-01 | 1979-12-12 | Canon Inc | Alignment method |
JPS5534490A (en) * | 1978-09-01 | 1980-03-11 | Canon Inc | Alignment device |
-
1975
- 1975-04-14 JP JP50044274A patent/JPS51120178A/en active Granted
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53111280A (en) * | 1977-03-10 | 1978-09-28 | Canon Inc | Mask or wafer for production of semiconductor elements and device for aligning these |
JPS6216012B2 (en) * | 1977-03-10 | 1987-04-10 | Canon Kk | |
JPS54152975A (en) * | 1978-05-22 | 1979-12-01 | Siemens Ag | Method of and device for automatically coinciding |
JPH0135492B2 (en) * | 1978-05-22 | 1989-07-25 | Siemens Ag | |
JPS54157478A (en) * | 1978-06-01 | 1979-12-12 | Canon Inc | Alignment method |
JPS63942B2 (en) * | 1978-06-01 | 1988-01-09 | Canon Kk | |
JPS5534490A (en) * | 1978-09-01 | 1980-03-11 | Canon Inc | Alignment device |
Also Published As
Publication number | Publication date |
---|---|
JPS5518044B2 (en) | 1980-05-16 |
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