JPS5386169A - Exposure apparatus - Google Patents
Exposure apparatusInfo
- Publication number
- JPS5386169A JPS5386169A JP37777A JP37777A JPS5386169A JP S5386169 A JPS5386169 A JP S5386169A JP 37777 A JP37777 A JP 37777A JP 37777 A JP37777 A JP 37777A JP S5386169 A JPS5386169 A JP S5386169A
- Authority
- JP
- Japan
- Prior art keywords
- exposure apparatus
- exposure
- conveying
- cleaning
- exposed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
Abstract
PURPOSE: To perform exposure of accurate patterns by conveying the objects to be exposed by a contactless conveying mechanism, and cleaning the exposure surface by blowing gas on the way thereafter performing exposure.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP52000377A JPS5943819B2 (en) | 1977-01-07 | 1977-01-07 | exposure equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP52000377A JPS5943819B2 (en) | 1977-01-07 | 1977-01-07 | exposure equipment |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58184983A Division JPS5990854A (en) | 1983-10-05 | 1983-10-05 | Air blow mechanism for plate-like object |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5386169A true JPS5386169A (en) | 1978-07-29 |
JPS5943819B2 JPS5943819B2 (en) | 1984-10-24 |
Family
ID=11472095
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP52000377A Expired JPS5943819B2 (en) | 1977-01-07 | 1977-01-07 | exposure equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5943819B2 (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57104231A (en) * | 1980-12-19 | 1982-06-29 | Fujitsu Ltd | Attaching method of dice |
JPS57109344A (en) * | 1980-12-26 | 1982-07-07 | Hitachi Ltd | Manufacture and its apparatus for semiconductor device |
JPS57120936A (en) * | 1981-01-21 | 1982-07-28 | Hitachi Ltd | Step and repeat camera device |
JPS5990854A (en) * | 1983-10-05 | 1984-05-25 | Hitachi Ltd | Air blow mechanism for plate-like object |
JPS59195647A (en) * | 1983-04-21 | 1984-11-06 | Nec Corp | Device for washing exposure mask |
JPS62295053A (en) * | 1986-06-16 | 1987-12-22 | Sumio Yokoyama | Photoplotter |
JPH0283521U (en) * | 1988-12-14 | 1990-06-28 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60182607U (en) * | 1984-05-15 | 1985-12-04 | シャープ株式会社 | microwave oven |
CN113678261A (en) | 2019-04-09 | 2021-11-19 | 三菱电机株式会社 | Semiconductor device and semiconductor module |
-
1977
- 1977-01-07 JP JP52000377A patent/JPS5943819B2/en not_active Expired
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57104231A (en) * | 1980-12-19 | 1982-06-29 | Fujitsu Ltd | Attaching method of dice |
JPS57109344A (en) * | 1980-12-26 | 1982-07-07 | Hitachi Ltd | Manufacture and its apparatus for semiconductor device |
JPH0330297B2 (en) * | 1980-12-26 | 1991-04-26 | ||
JPS57120936A (en) * | 1981-01-21 | 1982-07-28 | Hitachi Ltd | Step and repeat camera device |
JPS6323539B2 (en) * | 1981-01-21 | 1988-05-17 | Hitachi Ltd | |
JPS59195647A (en) * | 1983-04-21 | 1984-11-06 | Nec Corp | Device for washing exposure mask |
JPS6319858B2 (en) * | 1983-04-21 | 1988-04-25 | Nippon Electric Co | |
JPS5990854A (en) * | 1983-10-05 | 1984-05-25 | Hitachi Ltd | Air blow mechanism for plate-like object |
JPS62295053A (en) * | 1986-06-16 | 1987-12-22 | Sumio Yokoyama | Photoplotter |
JPH0283521U (en) * | 1988-12-14 | 1990-06-28 |
Also Published As
Publication number | Publication date |
---|---|
JPS5943819B2 (en) | 1984-10-24 |
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