JPS5375768A - Size check pattern - Google Patents

Size check pattern

Info

Publication number
JPS5375768A
JPS5375768A JP15077176A JP15077176A JPS5375768A JP S5375768 A JPS5375768 A JP S5375768A JP 15077176 A JP15077176 A JP 15077176A JP 15077176 A JP15077176 A JP 15077176A JP S5375768 A JPS5375768 A JP S5375768A
Authority
JP
Japan
Prior art keywords
check pattern
size check
size
pattern
copied
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15077176A
Other languages
Japanese (ja)
Other versions
JPS5427708B2 (en
Inventor
Seiya Futamura
Takenori Okubo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15077176A priority Critical patent/JPS5375768A/en
Publication of JPS5375768A publication Critical patent/JPS5375768A/en
Publication of JPS5427708B2 publication Critical patent/JPS5427708B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

PURPOSE: To enable the size of the pattern image scaled down or copied to be known with a simple check pattern without using expensive instruments.
COPYRIGHT: (C)1978,JPO&Japio
JP15077176A 1976-12-17 1976-12-17 Size check pattern Granted JPS5375768A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15077176A JPS5375768A (en) 1976-12-17 1976-12-17 Size check pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15077176A JPS5375768A (en) 1976-12-17 1976-12-17 Size check pattern

Publications (2)

Publication Number Publication Date
JPS5375768A true JPS5375768A (en) 1978-07-05
JPS5427708B2 JPS5427708B2 (en) 1979-09-11

Family

ID=15504051

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15077176A Granted JPS5375768A (en) 1976-12-17 1976-12-17 Size check pattern

Country Status (1)

Country Link
JP (1) JPS5375768A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55147304A (en) * 1979-05-04 1980-11-17 Nec Corp Monitoring method of quantity of change in shape
US4650744A (en) * 1984-07-17 1987-03-17 Nec Corporation Method of manufacturing semiconductor device
JPH02159011A (en) * 1988-12-13 1990-06-19 Fujitsu Ltd Control of pattern size in photolithography
JPH0677109A (en) * 1990-12-14 1994-03-18 Seiko Epson Corp Method for evaluating resist pattern

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55147304A (en) * 1979-05-04 1980-11-17 Nec Corp Monitoring method of quantity of change in shape
US4650744A (en) * 1984-07-17 1987-03-17 Nec Corporation Method of manufacturing semiconductor device
US5005071A (en) * 1984-07-17 1991-04-02 Nec Corporation Semiconductor device
JPH02159011A (en) * 1988-12-13 1990-06-19 Fujitsu Ltd Control of pattern size in photolithography
JPH0677109A (en) * 1990-12-14 1994-03-18 Seiko Epson Corp Method for evaluating resist pattern
JPH0727858B2 (en) * 1990-12-14 1995-03-29 セイコーエプソン株式会社 Resist pattern evaluation method

Also Published As

Publication number Publication date
JPS5427708B2 (en) 1979-09-11

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