JPS59195647A - Device for washing exposure mask - Google Patents

Device for washing exposure mask

Info

Publication number
JPS59195647A
JPS59195647A JP58070496A JP7049683A JPS59195647A JP S59195647 A JPS59195647 A JP S59195647A JP 58070496 A JP58070496 A JP 58070496A JP 7049683 A JP7049683 A JP 7049683A JP S59195647 A JPS59195647 A JP S59195647A
Authority
JP
Japan
Prior art keywords
mask
clean
washing
flow
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58070496A
Other languages
Japanese (ja)
Other versions
JPS6319858B2 (en
Inventor
Susumu Yasuda
進 安田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP58070496A priority Critical patent/JPS59195647A/en
Publication of JPS59195647A publication Critical patent/JPS59195647A/en
Publication of JPS6319858B2 publication Critical patent/JPS6319858B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82Auxiliary processes, e.g. cleaning or inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PURPOSE:To prevent the mask of which washing has been finished from the following contamination by installing plural purified gas blowing devices for introducing the gases from different directions to a zone including a housing station and a conveying route. CONSTITUTION:An automatic mask washing device 6 comprises an automatic dust detecting station.a station for automatically housing the mask 2 into a protective case 1, vessels 3a, 3b for washing the mask 2, a washing chemical soln. feeder 4, a mask conveying means 5, and a clean flow device. This device is composed of a down-flow type clean unit 7 for forcing the flow direction from the upper part to the lower part throughout the zone where the mask 2 is present, and a cross-flow type clean unit 8 for forcing the flow direction forward from the rear part, a purified air flow passed through a filter incorporated in the unit 8 is made composite, and the range of the mask 2 especially necessary to be kept clean is prevented from being again contaminated there with dust suspending in the space where the mask 2 is present.

Description

【発明の詳細な説明】 本発明は半導体デバイスの製造工程に於いて、縮小投影
妬光装置に使用されるレチクルマスクおよびその他の露
光用マスク(以下総称してマスクと称する)を洗浄する
装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an apparatus for cleaning reticle masks and other exposure masks (hereinafter collectively referred to as masks) used in reduction projection optical equipment in the manufacturing process of semiconductor devices. It is something.

マスクを洗浄する方法として、従来は湿式摩擦洗浄方式
が一般的であり、ここでは洗浄後のマスクが再び室内の
塵埃によシ汚染されることへの対策として室内の清浄度
を維持することに重点が置かれていた。この洗浄方式を
機械化し、洗浄プロセスの設定、マスクの搬送、洗浄用
薬液の供給を自動的に行なう連続式自動洗浄装置に於い
ても。
Conventionally, the common method for cleaning masks is the wet friction cleaning method, which is used to maintain indoor cleanliness in order to prevent the cleaned masks from becoming contaminated again by indoor dust. The emphasis was on Continuous automatic cleaning equipment also mechanizes this cleaning method, automatically setting the cleaning process, transporting the mask, and supplying cleaning chemicals.

その装置を設置しである室内の清浄度を高めるとともに
、部分的に強制風向を作り出してマスクが室内の塵埃に
よシ再汚染されることを防ぐ必要がある。
It is necessary to install this device to improve the cleanliness of a certain room, and to create a forced wind direction in some areas to prevent masks from being recontaminated by indoor dust.

これ等、従来の方法に於いては、洗浄後のマスクが浮遊
塵埃等により再汚染されることから保護する為の方策と
しては、局部的な対策に終始していた。そもそも浮遊塵
埃は如何に清浄化が図られた室内に此いても常に皆無の
状態に保つことは不可能である。そのため、洗浄前は勿
論のこと、洗浄後に於いても、マスクは常に再汚染の危
機に直前していると云える。殊にレチクルマスクは唯一
個の塵埃付着でも使用不能となるため、その浮遊塵埃の
汚染を避けることが必要である。それにもかかわらず、
浮遊塵埃の位置、浮遊状態等に於いて多種多様の状態を
呈することによシ、その予測並びにその動向を規制する
ことについて絶対的対策は困帷であるとされ、前述の如
く不完全な対策にとどまっていた。
In these conventional methods, measures to protect the mask after cleaning from being recontaminated by floating dust and the like have been limited to local measures. In the first place, no matter how clean a room is, it is impossible to always keep it completely free of floating dust. Therefore, it can be said that the mask is always on the verge of being recontaminated, not only before cleaning but also after cleaning. In particular, since a reticle mask becomes unusable even if a single piece of dust adheres to it, it is necessary to avoid contamination from floating dust. Nevertheless,
Due to the wide variety of floating dust locations, floating conditions, etc., it is difficult to take absolute measures to predict and control its trends, and as mentioned above, there are incomplete countermeasures. It stayed in.

本発明は、手動方式、自動方式のマスク洗浄装置にかか
わらず、該装置を用いて洗浄を完了したマスクが、再汚
染されるのを防止することのできるマスク洗浄装置を提
供することを目的とする。
An object of the present invention is to provide a mask cleaning device that can prevent a mask that has been cleaned using the device from being recontaminated, regardless of whether it is a manual or automatic mask cleaning device. do.

本発明の露光用マスク洗浄装置は、露光用マスクの洗浄
槽と、前記マスクの収納部と、前記マスクを前記洗浄槽
と収納部間の搬送路を移動させる搬送装置と、少なくと
も前記収納部及び前記搬送路にわたって相異なる方向よ
り清浄気体を流す複数個の清浄気体吹き出し装置を備え
たことを特徴とするものである。
The exposure mask cleaning apparatus of the present invention includes a cleaning tank for an exposure mask, a storage section for the mask, a transport device that moves the mask along a transport path between the cleaning tank and the storage section, and at least the storage section and the storage section. The present invention is characterized in that it includes a plurality of clean gas blowing devices that flow clean gas from different directions across the conveyance path.

本発明によれば、複数個の清浄気体吹き出し装置からそ
れぞれ必要な方向に清浄な気体を流すことができるため
、洗浄装置内特にマスクの収納部や搬送路などの必要な
個所のすみずみまでを清浄な気体で充満させ、浮遊塵埃
を速やかに装置外方向に追い出すことができる。したが
って、洗浄済マスクを清浄な空気の中で収納部の保護ケ
ースの中に収納することができ、前記マスクの再汚染を
有効に防止することができる。
According to the present invention, clean gas can be flowed in the required direction from a plurality of clean gas blowing devices, so that clean gas can be flowed into every corner of the cleaning device, especially where it is needed, such as the mask storage area and the transport path. It can be filled with clean gas and any floating dust can be quickly expelled to the outside of the device. Therefore, the cleaned mask can be stored in the protective case of the storage part in clean air, and re-contamination of the mask can be effectively prevented.

本発明の一実施例として、清浄気体吹き出し装置にダウ
ンフロー(垂直吹き出し)型クリーンユニット及びクロ
スフロー(水平吹き出し)型クリーンユニットを組み合
せて設け、該洗浄装置に複合風向をもつクリーンフロー
機能をもたせた場合について、図面を参照して詳細に説
明する。
As an embodiment of the present invention, a clean gas blowing device is provided with a combination of a downflow (vertical blowing) type clean unit and a crossflow (horizontal blowing) type clean unit, and the cleaning device is provided with a clean flow function having multiple wind directions. The case will be explained in detail with reference to the drawings.

すなわち、本実施例のマスク自動洗浄装置6は、自製塵
埃検出部−マスク保護ケース収納部1、マスク2の洗浄
槽部3a、3b、洗浄用薬液供給部4、及びマスクの搬
送部5、並びにクリーンフロー(清浄気体吹き出し)装
置から構成されている。
That is, the automatic mask cleaning device 6 of this embodiment includes a self-made dust detection section-mask protective case storage section 1, cleaning tank sections 3a and 3b of the mask 2, a cleaning chemical supply section 4, a mask transport section 5, and It consists of a clean flow (clean gas blowing) device.

そして、前記クリーン70−装置は、マスク2が存在す
る部分全体について上部から下部方向にその風向を強制
するダウン70−型クリーンユニツト7と、後部よシ前
面方向(作業面方向)にその風向を強制するクロス70
−型クリーンユニツト8を組み合わせて構成されている
。そして、このクリーンフロー装置では、クリーンユニ
ットに組み込まれているフィルターを通過した清浄なる
空気の流れを複合化し、マスク2が存在する個所に浮遊
する塵埃がマスクの特に清浄度を保つ必要がある範囲を
再汚染せぬようクリーン70−機能を生じせしめている
The clean 70-device includes a down 70-type clean unit 7 that forces the wind direction from the top to the bottom over the entire area where the mask 2 is present, and a down 70-type clean unit 7 that forces the wind direction from the rear to the front (direction of the work surface). Forced cross 70
- type clean unit 8 in combination. In this clean flow device, the flow of clean air that has passed through the filter built into the clean unit is combined, and the dust floating in the area where the mask 2 is present is removed from the area where it is necessary to maintain the cleanliness of the mask. A clean 70 function is provided to prevent re-contamination.

本実施例に於いては、前述の如く自動洗浄装置をその基
本として説明したが、これ等の構成要素を各々単独とし
た手動機に於いても、この発明による複合風向を合わせ
もつクリーン機能を保持させることが可能なことは自明
のことである。さらにその構成要素の特殊性によっては
、ダウンフロー型り’)−7ユニツト7とクロスフロー
W りIJ −ンユニット8の取付角度を微妙に変化さ
せ、その複合風向が浮遊塵埃を最も有効に装置外に追い
出し、マスクを再汚染から防御するように構成すること
もでき、このような変更実施が本発明の適用範囲に含ま
れることは自明のことである。
In this embodiment, as described above, the automatic cleaning device was explained as the basis, but even in a manual machine in which each of these components is independent, the clean function of the present invention having multiple air directions can be achieved. It is obvious that it is possible to maintain this. Furthermore, depending on the specificity of the components, the mounting angles of the downflow type unit 7 and the crossflow type IJ-type unit 8 may be slightly changed to ensure that the combined wind direction is the most effective for removing floating dust. It is obvious that the respirator can also be configured to protect the mask from re-contamination, and that such modifications fall within the scope of the present invention.

なお、前記実施例においては2つのクリーンユニットを
用いる場合について説明したが、必ずしも2つのクリー
ンユニットを使う必要はなく、1つのクリーンユニット
に2つの吹き出し口を設けることにより、前記実施例と
同様の効果を得ることができる0 本発明は、以上説明したように、マスク洗浄装置VC2
つ以上のクリーンフローを局部的に作ったりあるいは合
成させることにより、例えばダウンフロー及びクロスフ
ローの複合風向を合わせ持つクリーン70−機能を生じ
させることにより、その種類、大きさ、その存在する位
置及び浮遊状態等に於いて多種多様の状態を呈する塵埃
を最も有効に装置外に追い出し、マスクが浮遊塵埃によ
り再汚染されることを防御する効果を発揮させることが
可能である。
Although the above embodiment describes the case where two clean units are used, it is not necessary to use two clean units, and by providing two air outlets in one clean unit, the same effect as in the above embodiment can be achieved. As explained above, the present invention provides the mask cleaning device VC2 with the following effects.
By locally creating or combining two or more clean flows, for example, by creating a clean function that has a combination of downflow and crossflow wind directions, the type, size, location and It is possible to most effectively expel dust in various states such as floating state from the device, and to exhibit the effect of preventing the mask from being re-contaminated by the floating dust.

本機能を保持するマスク洗浄装置を用いて清浄に洗浄さ
れたマスクを使用することによシ、生産される半導体デ
バイスの良品率を飛曜的に向上せしめる仁とが可能とな
る。従って、本発明の実用上の効果は極めて大きいと云
える。
By using a mask that has been cleanly cleaned using a mask cleaning device that maintains this function, it is possible to dramatically improve the yield rate of manufactured semiconductor devices. Therefore, it can be said that the practical effects of the present invention are extremely large.

【図面の簡単な説明】[Brief explanation of drawings]

図は本発明の一実施例を示す斜視図である。 1・・・・・・自動躍埃検出部・マスク保護ケース収納
部、2・・・・・・マスク、3a、3b・・・・・・洗
浄槽部、4・・・・・・洗浄用薬液供給部、5・・・・
・・マスクの搬送部、6・・・・・・マスク自動洗浄装
置、7・・・・・・ダウン70−!クリーンユニツト、
8・・・・・・クロスフロー型クリーンユニット。
The figure is a perspective view showing one embodiment of the present invention. 1...Automatic dust detection section/mask protective case storage section, 2...Mask, 3a, 3b...Cleaning tank section, 4...For cleaning Chemical solution supply section, 5...
...Mask transport section, 6...Mask automatic cleaning device, 7...Down 70-! clean unit,
8...Cross flow type clean unit.

Claims (1)

【特許請求の範囲】[Claims] 括光用マスクの洗浄槽と、前記マスクの収納部と、前記
マスクを前記洗浄槽と収納部間の搬送路を移動させる搬
送装置と、少なくとも前記収納部及び前記搬送路にわた
って相異なる方向より清浄気体を流す複数個の清浄気体
吹き出し装置を備えたことを特徴とする露光用マスクの
洗浄装置。
a cleaning tank for a mask for illumination, a storage section for the mask, a transport device for moving the mask along a transport path between the cleaning tank and the storage section, and cleaning from different directions across at least the storage section and the transport path. A cleaning device for an exposure mask, comprising a plurality of clean gas blowing devices for flowing gas.
JP58070496A 1983-04-21 1983-04-21 Device for washing exposure mask Granted JPS59195647A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58070496A JPS59195647A (en) 1983-04-21 1983-04-21 Device for washing exposure mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58070496A JPS59195647A (en) 1983-04-21 1983-04-21 Device for washing exposure mask

Publications (2)

Publication Number Publication Date
JPS59195647A true JPS59195647A (en) 1984-11-06
JPS6319858B2 JPS6319858B2 (en) 1988-04-25

Family

ID=13433187

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58070496A Granted JPS59195647A (en) 1983-04-21 1983-04-21 Device for washing exposure mask

Country Status (1)

Country Link
JP (1) JPS59195647A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001223196A (en) * 1999-12-01 2001-08-17 Ses Co Ltd Substrate washing system
WO2002052345A1 (en) * 2000-12-22 2002-07-04 Nikon Corporation Method and device for mask cleaning, and device manufacturing system

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5386169A (en) * 1977-01-07 1978-07-29 Hitachi Ltd Exposure apparatus
JPS55102233A (en) * 1979-01-30 1980-08-05 Matsushita Electric Ind Co Ltd Removing method of dust

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5386169A (en) * 1977-01-07 1978-07-29 Hitachi Ltd Exposure apparatus
JPS55102233A (en) * 1979-01-30 1980-08-05 Matsushita Electric Ind Co Ltd Removing method of dust

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001223196A (en) * 1999-12-01 2001-08-17 Ses Co Ltd Substrate washing system
WO2002052345A1 (en) * 2000-12-22 2002-07-04 Nikon Corporation Method and device for mask cleaning, and device manufacturing system

Also Published As

Publication number Publication date
JPS6319858B2 (en) 1988-04-25

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