JPS5267271A - Formation of through-hole onto semiconductor substrate - Google Patents

Formation of through-hole onto semiconductor substrate

Info

Publication number
JPS5267271A
JPS5267271A JP14351975A JP14351975A JPS5267271A JP S5267271 A JPS5267271 A JP S5267271A JP 14351975 A JP14351975 A JP 14351975A JP 14351975 A JP14351975 A JP 14351975A JP S5267271 A JPS5267271 A JP S5267271A
Authority
JP
Japan
Prior art keywords
formation
semiconductor substrate
hole onto
onto semiconductor
hole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14351975A
Other languages
Japanese (ja)
Inventor
Toru Funayama
Yushi Inagaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP14351975A priority Critical patent/JPS5267271A/en
Publication of JPS5267271A publication Critical patent/JPS5267271A/en
Pending legal-status Critical Current

Links

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Weting (AREA)

Abstract

PURPOSE: To obtain a through-hole of high edge accuracy.
COPYRIGHT: (C)1977,JPO&Japio
JP14351975A 1975-12-01 1975-12-01 Formation of through-hole onto semiconductor substrate Pending JPS5267271A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14351975A JPS5267271A (en) 1975-12-01 1975-12-01 Formation of through-hole onto semiconductor substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14351975A JPS5267271A (en) 1975-12-01 1975-12-01 Formation of through-hole onto semiconductor substrate

Publications (1)

Publication Number Publication Date
JPS5267271A true JPS5267271A (en) 1977-06-03

Family

ID=15340616

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14351975A Pending JPS5267271A (en) 1975-12-01 1975-12-01 Formation of through-hole onto semiconductor substrate

Country Status (1)

Country Link
JP (1) JPS5267271A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4455192A (en) * 1981-05-07 1984-06-19 Fuji Xerox Company, Ltd. Formation of a multi-nozzle ink jet
JPS629636A (en) * 1985-07-08 1987-01-17 Hitachi Ltd Method for formation of through-hole on semiconductor integral circuit substrate
JP2008532319A (en) * 2005-03-02 2008-08-14 エンデヴコ コーポレイション Junction separation via

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4455192A (en) * 1981-05-07 1984-06-19 Fuji Xerox Company, Ltd. Formation of a multi-nozzle ink jet
JPS629636A (en) * 1985-07-08 1987-01-17 Hitachi Ltd Method for formation of through-hole on semiconductor integral circuit substrate
JP2008532319A (en) * 2005-03-02 2008-08-14 エンデヴコ コーポレイション Junction separation via

Similar Documents

Publication Publication Date Title
JPS5237785A (en) Process for production of photovoltaic elements
JPS5267271A (en) Formation of through-hole onto semiconductor substrate
JPS5279654A (en) Production of semiconductor device
JPS5279664A (en) Forming method for electrodes of semiconductor devices
JPS5219975A (en) Semiconductor device
JPS5232263A (en) Semiconductor manufacturing process
JPS5267272A (en) Formation of through-hole onto semiconductor substrate
JPS5410682A (en) Production of semiconductor elements
JPS5261475A (en) Production of silicon crystal film
JPS5353263A (en) Manufacture of semiconductor element
JPS53123083A (en) Production of semiconductor device
JPS542663A (en) Positioning method for mounting semiconductor chip
JPS51122375A (en) Semiconductor device
JPS51142978A (en) Mounting method of circuit elements
JPS5273675A (en) Structure of die bonding
JPS52130292A (en) Patterning method
JPS51118369A (en) Manufacturing process for simiconduator unit
JPS51113571A (en) Precision processing method of semi-conductor
JPS5261959A (en) Production of semiconductor device
JPS52141565A (en) Manufacture of semiconductor unit
JPS53118990A (en) Manufacture for resistor
JPS5258372A (en) Semiconductor device and its production
JPS51137390A (en) Thin film current magnetic effect element manufacturing method
JPS5267959A (en) Manufacture of semiconductor element
JPS524180A (en) Semiconductor device