JPS5267271A - Formation of through-hole onto semiconductor substrate - Google Patents
Formation of through-hole onto semiconductor substrateInfo
- Publication number
- JPS5267271A JPS5267271A JP14351975A JP14351975A JPS5267271A JP S5267271 A JPS5267271 A JP S5267271A JP 14351975 A JP14351975 A JP 14351975A JP 14351975 A JP14351975 A JP 14351975A JP S5267271 A JPS5267271 A JP S5267271A
- Authority
- JP
- Japan
- Prior art keywords
- formation
- semiconductor substrate
- hole onto
- onto semiconductor
- hole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Weting (AREA)
Abstract
PURPOSE: To obtain a through-hole of high edge accuracy.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14351975A JPS5267271A (en) | 1975-12-01 | 1975-12-01 | Formation of through-hole onto semiconductor substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14351975A JPS5267271A (en) | 1975-12-01 | 1975-12-01 | Formation of through-hole onto semiconductor substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5267271A true JPS5267271A (en) | 1977-06-03 |
Family
ID=15340616
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14351975A Pending JPS5267271A (en) | 1975-12-01 | 1975-12-01 | Formation of through-hole onto semiconductor substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5267271A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4455192A (en) * | 1981-05-07 | 1984-06-19 | Fuji Xerox Company, Ltd. | Formation of a multi-nozzle ink jet |
JPS629636A (en) * | 1985-07-08 | 1987-01-17 | Hitachi Ltd | Method for formation of through-hole on semiconductor integral circuit substrate |
JP2008532319A (en) * | 2005-03-02 | 2008-08-14 | エンデヴコ コーポレイション | Junction separation via |
-
1975
- 1975-12-01 JP JP14351975A patent/JPS5267271A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4455192A (en) * | 1981-05-07 | 1984-06-19 | Fuji Xerox Company, Ltd. | Formation of a multi-nozzle ink jet |
JPS629636A (en) * | 1985-07-08 | 1987-01-17 | Hitachi Ltd | Method for formation of through-hole on semiconductor integral circuit substrate |
JP2008532319A (en) * | 2005-03-02 | 2008-08-14 | エンデヴコ コーポレイション | Junction separation via |
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