JPS52119179A - Electron beam exposing method - Google Patents

Electron beam exposing method

Info

Publication number
JPS52119179A
JPS52119179A JP3646676A JP3646676A JPS52119179A JP S52119179 A JPS52119179 A JP S52119179A JP 3646676 A JP3646676 A JP 3646676A JP 3646676 A JP3646676 A JP 3646676A JP S52119179 A JPS52119179 A JP S52119179A
Authority
JP
Japan
Prior art keywords
electron beam
exposing method
beam exposing
pattern
edge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3646676A
Other languages
Japanese (ja)
Inventor
Seigo Igaki
Masahiro Okabe
Noriaki Nakayama
Yasuo Furukawa
Yushi Inagaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP3646676A priority Critical patent/JPS52119179A/en
Publication of JPS52119179A publication Critical patent/JPS52119179A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To shorten the exposing time and to improve the linearity of the edge by frame-scanning around the edge of the pattern and by raster-scanning the inside of the pattern to form the pattern onthe resist on the substrate.
COPYRIGHT: (C)1977,JPO&Japio
JP3646676A 1976-03-31 1976-03-31 Electron beam exposing method Pending JPS52119179A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3646676A JPS52119179A (en) 1976-03-31 1976-03-31 Electron beam exposing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3646676A JPS52119179A (en) 1976-03-31 1976-03-31 Electron beam exposing method

Publications (1)

Publication Number Publication Date
JPS52119179A true JPS52119179A (en) 1977-10-06

Family

ID=12470578

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3646676A Pending JPS52119179A (en) 1976-03-31 1976-03-31 Electron beam exposing method

Country Status (1)

Country Link
JP (1) JPS52119179A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55111130A (en) * 1979-02-21 1980-08-27 Hitachi Ltd Electron beam scanning system
US20190270159A1 (en) * 2012-01-16 2019-09-05 Carl Zeiss Microscopy Gmbh Methods and systems for raster scanning a surface of an object using a particle beam

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55111130A (en) * 1979-02-21 1980-08-27 Hitachi Ltd Electron beam scanning system
JPS5745058B2 (en) * 1979-02-21 1982-09-25
US20190270159A1 (en) * 2012-01-16 2019-09-05 Carl Zeiss Microscopy Gmbh Methods and systems for raster scanning a surface of an object using a particle beam
US11504798B2 (en) * 2012-01-16 2022-11-22 Carl Zeiss Microscopy Gmbh Methods and systems for raster scanning a surface of an object using a particle beam

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