JPS52119179A - Electron beam exposing method - Google Patents
Electron beam exposing methodInfo
- Publication number
- JPS52119179A JPS52119179A JP3646676A JP3646676A JPS52119179A JP S52119179 A JPS52119179 A JP S52119179A JP 3646676 A JP3646676 A JP 3646676A JP 3646676 A JP3646676 A JP 3646676A JP S52119179 A JPS52119179 A JP S52119179A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- exposing method
- beam exposing
- pattern
- edge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To shorten the exposing time and to improve the linearity of the edge by frame-scanning around the edge of the pattern and by raster-scanning the inside of the pattern to form the pattern onthe resist on the substrate.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3646676A JPS52119179A (en) | 1976-03-31 | 1976-03-31 | Electron beam exposing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3646676A JPS52119179A (en) | 1976-03-31 | 1976-03-31 | Electron beam exposing method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS52119179A true JPS52119179A (en) | 1977-10-06 |
Family
ID=12470578
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3646676A Pending JPS52119179A (en) | 1976-03-31 | 1976-03-31 | Electron beam exposing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52119179A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55111130A (en) * | 1979-02-21 | 1980-08-27 | Hitachi Ltd | Electron beam scanning system |
US20190270159A1 (en) * | 2012-01-16 | 2019-09-05 | Carl Zeiss Microscopy Gmbh | Methods and systems for raster scanning a surface of an object using a particle beam |
-
1976
- 1976-03-31 JP JP3646676A patent/JPS52119179A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55111130A (en) * | 1979-02-21 | 1980-08-27 | Hitachi Ltd | Electron beam scanning system |
JPS5745058B2 (en) * | 1979-02-21 | 1982-09-25 | ||
US20190270159A1 (en) * | 2012-01-16 | 2019-09-05 | Carl Zeiss Microscopy Gmbh | Methods and systems for raster scanning a surface of an object using a particle beam |
US11504798B2 (en) * | 2012-01-16 | 2022-11-22 | Carl Zeiss Microscopy Gmbh | Methods and systems for raster scanning a surface of an object using a particle beam |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5412675A (en) | Electon beam exposure method | |
JPS5218175A (en) | Circuit pattern formation method and its device | |
JPS52119185A (en) | Electron beam exposure equipment | |
JPS5427369A (en) | Pattern formation method | |
JPS52119179A (en) | Electron beam exposing method | |
JPS5359374A (en) | Electron beam exposure unit | |
JPS51148365A (en) | Electron beam exposure method | |
JPS5431282A (en) | Pattern formation method | |
JPS52117578A (en) | Electron beam exposing method | |
JPS5251870A (en) | Electron bean exposure method | |
JPS53114676A (en) | Electron beam exposure method | |
JPS5277671A (en) | Method and equipment of masking | |
JPS52117077A (en) | Electron beam-exposing method | |
JPS5277670A (en) | Semiconductive device | |
JPS5362477A (en) | Electron beam drawing device | |
JPS5442979A (en) | Electron beam exposure device | |
JPS53120276A (en) | Electron beam exposure method | |
JPS52119184A (en) | Electron beam exposing method | |
JPS5350978A (en) | Electron beam exposure method | |
JPS53117463A (en) | Position detection method | |
JPS52119079A (en) | Electron beam exposure | |
JPS53135580A (en) | Electron beam exposing method | |
JPS5299775A (en) | Pattern exposing method | |
JPS53127267A (en) | Inspection method for pattern | |
JPS5339078A (en) | Electron beam exposure method |