JPS53117463A - Position detection method - Google Patents

Position detection method

Info

Publication number
JPS53117463A
JPS53117463A JP3272277A JP3272277A JPS53117463A JP S53117463 A JPS53117463 A JP S53117463A JP 3272277 A JP3272277 A JP 3272277A JP 3272277 A JP3272277 A JP 3272277A JP S53117463 A JPS53117463 A JP S53117463A
Authority
JP
Japan
Prior art keywords
detection method
position detection
electron beam
scanning
axissymmetrically
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3272277A
Other languages
Japanese (ja)
Other versions
JPS5847005B2 (en
Inventor
Masahiro Okabe
Seigo Igaki
Noriaki Nakayama
Yasuo Furukawa
Yushi Inagaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP52032722A priority Critical patent/JPS5847005B2/en
Publication of JPS53117463A publication Critical patent/JPS53117463A/en
Publication of JPS5847005B2 publication Critical patent/JPS5847005B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Length Measuring Devices By Optical Means (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Transmission And Conversion Of Sensor Element Output (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To make possible the detection of rotating angles with respect to exposure positions through less electron beam scanning by forming axissymmetrically inclined two linear marks concerning the central mark on a substrate and scanning these with an electron beam.
COPYRIGHT: (C)1978,JPO&Japio
JP52032722A 1977-03-23 1977-03-23 Position detection method Expired JPS5847005B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP52032722A JPS5847005B2 (en) 1977-03-23 1977-03-23 Position detection method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP52032722A JPS5847005B2 (en) 1977-03-23 1977-03-23 Position detection method

Publications (2)

Publication Number Publication Date
JPS53117463A true JPS53117463A (en) 1978-10-13
JPS5847005B2 JPS5847005B2 (en) 1983-10-20

Family

ID=12366723

Family Applications (1)

Application Number Title Priority Date Filing Date
JP52032722A Expired JPS5847005B2 (en) 1977-03-23 1977-03-23 Position detection method

Country Status (1)

Country Link
JP (1) JPS5847005B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55160428A (en) * 1979-05-31 1980-12-13 Jeol Ltd Position detecting method for exposed material in electron beam exposure
JPS63284405A (en) * 1987-05-18 1988-11-21 Hitachi Ltd Scanning electron microscope
JPH0737968A (en) * 1993-07-22 1995-02-07 Nec Corp Method and apparatus for calculating orientation for positioning wafer

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55160428A (en) * 1979-05-31 1980-12-13 Jeol Ltd Position detecting method for exposed material in electron beam exposure
JPS5741810B2 (en) * 1979-05-31 1982-09-04
JPS63284405A (en) * 1987-05-18 1988-11-21 Hitachi Ltd Scanning electron microscope
JPH0587764B2 (en) * 1987-05-18 1993-12-17 Hitachi Ltd
JPH0737968A (en) * 1993-07-22 1995-02-07 Nec Corp Method and apparatus for calculating orientation for positioning wafer

Also Published As

Publication number Publication date
JPS5847005B2 (en) 1983-10-20

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