JPS53120277A - Electron beam exposure device - Google Patents

Electron beam exposure device

Info

Publication number
JPS53120277A
JPS53120277A JP3580377A JP3580377A JPS53120277A JP S53120277 A JPS53120277 A JP S53120277A JP 3580377 A JP3580377 A JP 3580377A JP 3580377 A JP3580377 A JP 3580377A JP S53120277 A JPS53120277 A JP S53120277A
Authority
JP
Japan
Prior art keywords
electron beam
exposure device
beam exposure
scanning
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3580377A
Other languages
Japanese (ja)
Inventor
Katsumi Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP3580377A priority Critical patent/JPS53120277A/en
Publication of JPS53120277A publication Critical patent/JPS53120277A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To ensure an exposure scanning with a high accuracy at the periphery of a rectangle as well as to shorten easily the pattern exposure scanning time, by carrying out both the current amount control and the cross-section area control of the electron beam for an electron beam exposure device according to the scanning position of the electronic beam.
COPYRIGHT: (C)1978,JPO&Japio
JP3580377A 1977-03-29 1977-03-29 Electron beam exposure device Pending JPS53120277A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3580377A JPS53120277A (en) 1977-03-29 1977-03-29 Electron beam exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3580377A JPS53120277A (en) 1977-03-29 1977-03-29 Electron beam exposure device

Publications (1)

Publication Number Publication Date
JPS53120277A true JPS53120277A (en) 1978-10-20

Family

ID=12452071

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3580377A Pending JPS53120277A (en) 1977-03-29 1977-03-29 Electron beam exposure device

Country Status (1)

Country Link
JP (1) JPS53120277A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5598830A (en) * 1979-01-23 1980-07-28 Chiyou Lsi Gijutsu Kenkyu Kumiai Drawing device for pattern by electron beam
JPS5793528A (en) * 1980-11-28 1982-06-10 Ibm Electron beam device
US4692579A (en) * 1984-05-18 1987-09-08 Hitachi, Ltd. Electron beam lithography apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5598830A (en) * 1979-01-23 1980-07-28 Chiyou Lsi Gijutsu Kenkyu Kumiai Drawing device for pattern by electron beam
JPS5793528A (en) * 1980-11-28 1982-06-10 Ibm Electron beam device
US4692579A (en) * 1984-05-18 1987-09-08 Hitachi, Ltd. Electron beam lithography apparatus

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