JPS52119185A - Electron beam exposure equipment - Google Patents

Electron beam exposure equipment

Info

Publication number
JPS52119185A
JPS52119185A JP3647376A JP3647376A JPS52119185A JP S52119185 A JPS52119185 A JP S52119185A JP 3647376 A JP3647376 A JP 3647376A JP 3647376 A JP3647376 A JP 3647376A JP S52119185 A JPS52119185 A JP S52119185A
Authority
JP
Japan
Prior art keywords
electron beam
beam exposure
exposure equipment
masks
japio
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3647376A
Inventor
Moritaka Nakamura
Haruo Tsuchikawa
Hiroshi Yasuda
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP3647376A priority Critical patent/JPS52119185A/en
Publication of JPS52119185A publication Critical patent/JPS52119185A/en
Application status is Pending legal-status Critical

Links

Abstract

PURPOSE: To enable the simple, precise and rapid exposure by inserting the masks with the different patterns on the different block positions into the channel of the electron beams.
COPYRIGHT: (C)1977,JPO&Japio
JP3647376A 1976-03-31 1976-03-31 Electron beam exposure equipment Pending JPS52119185A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3647376A JPS52119185A (en) 1976-03-31 1976-03-31 Electron beam exposure equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3647376A JPS52119185A (en) 1976-03-31 1976-03-31 Electron beam exposure equipment

Publications (1)

Publication Number Publication Date
JPS52119185A true JPS52119185A (en) 1977-10-06

Family

ID=12470773

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3647376A Pending JPS52119185A (en) 1976-03-31 1976-03-31 Electron beam exposure equipment

Country Status (1)

Country Link
JP (1) JPS52119185A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5316578A (en) * 1976-07-30 1978-02-15 Toshiba Corp Electron beam exposure apparatus
JPS553710U (en) * 1978-06-21 1980-01-11
US5148033A (en) * 1989-09-30 1992-09-15 Fujitsu Limited Electron beam exposure device and exposure method using the same
US5288567A (en) * 1990-06-27 1994-02-22 Fujitsu Limited Stencil mask and charged particle beam exposure method and apparatus using the stencil mask
US5347592A (en) * 1991-07-29 1994-09-13 Fujitsu Limited Pattern judging method and mask producing method using the pattern judging method
US5393988A (en) * 1988-11-04 1995-02-28 Fujitsu Limited Mask and charged particle beam exposure method using the mask
US5537487A (en) * 1991-07-29 1996-07-16 Fujitsu Limited Pattern judging method, mask producing method, and method of dividing block pattern for use in block exposure
EP0780879A2 (en) 1995-12-21 1997-06-25 Nec Corporation Electron beam exposure apparatus
US5932884A (en) * 1996-03-28 1999-08-03 Nec Corporation Charged-beam exposure system and charged-beam exposure method

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5316578A (en) * 1976-07-30 1978-02-15 Toshiba Corp Electron beam exposure apparatus
JPS54374B2 (en) * 1976-07-30 1979-01-10
JPS553710U (en) * 1978-06-21 1980-01-11
US5393988A (en) * 1988-11-04 1995-02-28 Fujitsu Limited Mask and charged particle beam exposure method using the mask
US5148033A (en) * 1989-09-30 1992-09-15 Fujitsu Limited Electron beam exposure device and exposure method using the same
US5288567A (en) * 1990-06-27 1994-02-22 Fujitsu Limited Stencil mask and charged particle beam exposure method and apparatus using the stencil mask
US5376802A (en) * 1990-06-27 1994-12-27 Fujitsu Limited Stencil mask and charge particle beam exposure method and apparatus using the stencil mask
US5347592A (en) * 1991-07-29 1994-09-13 Fujitsu Limited Pattern judging method and mask producing method using the pattern judging method
US5537487A (en) * 1991-07-29 1996-07-16 Fujitsu Limited Pattern judging method, mask producing method, and method of dividing block pattern for use in block exposure
EP0780879A2 (en) 1995-12-21 1997-06-25 Nec Corporation Electron beam exposure apparatus
US5932884A (en) * 1996-03-28 1999-08-03 Nec Corporation Charged-beam exposure system and charged-beam exposure method

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