JPS53114676A - Electron beam exposure method - Google Patents
Electron beam exposure methodInfo
- Publication number
- JPS53114676A JPS53114676A JP2860277A JP2860277A JPS53114676A JP S53114676 A JPS53114676 A JP S53114676A JP 2860277 A JP2860277 A JP 2860277A JP 2860277 A JP2860277 A JP 2860277A JP S53114676 A JPS53114676 A JP S53114676A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- exposure method
- beam exposure
- resist
- constituting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: To accurately control the size of resist pattern, by constituting the resist with two layer coating of high and low sensitivity.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2860277A JPS53114676A (en) | 1977-03-17 | 1977-03-17 | Electron beam exposure method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2860277A JPS53114676A (en) | 1977-03-17 | 1977-03-17 | Electron beam exposure method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS53114676A true JPS53114676A (en) | 1978-10-06 |
Family
ID=12253124
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2860277A Pending JPS53114676A (en) | 1977-03-17 | 1977-03-17 | Electron beam exposure method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53114676A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5558529A (en) * | 1978-10-26 | 1980-05-01 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Electron beam exposure |
JPS55140228A (en) * | 1979-04-20 | 1980-11-01 | Hitachi Ltd | Method for formation of pattern |
-
1977
- 1977-03-17 JP JP2860277A patent/JPS53114676A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5558529A (en) * | 1978-10-26 | 1980-05-01 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Electron beam exposure |
JPS55140228A (en) * | 1979-04-20 | 1980-11-01 | Hitachi Ltd | Method for formation of pattern |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS52143776A (en) | Electron beam exposure apparatus | |
JPS52119185A (en) | Electron beam exposure equipment | |
JPS5427369A (en) | Pattern formation method | |
JPS53114676A (en) | Electron beam exposure method | |
JPS51148365A (en) | Electron beam exposure method | |
JPS52117077A (en) | Electron beam-exposing method | |
JPS5359374A (en) | Electron beam exposure unit | |
JPS5431282A (en) | Pattern formation method | |
JPS5251874A (en) | Electron beam exposure device | |
JPS53112671A (en) | Forming method for pattern | |
JPS5251870A (en) | Electron bean exposure method | |
JPS52119179A (en) | Electron beam exposing method | |
JPS5362477A (en) | Electron beam drawing device | |
JPS5332677A (en) | Electron beam exposure apparatus | |
JPS53120276A (en) | Electron beam exposure method | |
JPS53120277A (en) | Electron beam exposure device | |
JPS52119079A (en) | Electron beam exposure | |
JPS52117578A (en) | Electron beam exposing method | |
JPS52119184A (en) | Electron beam exposing method | |
JPS5276879A (en) | Counting device for number of exposure times of electron beam exposure device | |
JPS5390766A (en) | Exposure method | |
JPS5350978A (en) | Electron beam exposure method | |
JPS53135580A (en) | Electron beam exposing method | |
JPS5339078A (en) | Electron beam exposure method | |
JPS53136965A (en) | Pattern formation method for manufacture of electron beam mask |