JPS53114676A - Electron beam exposure method - Google Patents

Electron beam exposure method

Info

Publication number
JPS53114676A
JPS53114676A JP2860277A JP2860277A JPS53114676A JP S53114676 A JPS53114676 A JP S53114676A JP 2860277 A JP2860277 A JP 2860277A JP 2860277 A JP2860277 A JP 2860277A JP S53114676 A JPS53114676 A JP S53114676A
Authority
JP
Japan
Prior art keywords
electron beam
exposure method
beam exposure
resist
constituting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2860277A
Other languages
Japanese (ja)
Inventor
Kiyokatsu Jinno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP2860277A priority Critical patent/JPS53114676A/en
Publication of JPS53114676A publication Critical patent/JPS53114676A/en
Pending legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To accurately control the size of resist pattern, by constituting the resist with two layer coating of high and low sensitivity.
COPYRIGHT: (C)1978,JPO&Japio
JP2860277A 1977-03-17 1977-03-17 Electron beam exposure method Pending JPS53114676A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2860277A JPS53114676A (en) 1977-03-17 1977-03-17 Electron beam exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2860277A JPS53114676A (en) 1977-03-17 1977-03-17 Electron beam exposure method

Publications (1)

Publication Number Publication Date
JPS53114676A true JPS53114676A (en) 1978-10-06

Family

ID=12253124

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2860277A Pending JPS53114676A (en) 1977-03-17 1977-03-17 Electron beam exposure method

Country Status (1)

Country Link
JP (1) JPS53114676A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5558529A (en) * 1978-10-26 1980-05-01 Chiyou Lsi Gijutsu Kenkyu Kumiai Electron beam exposure
JPS55140228A (en) * 1979-04-20 1980-11-01 Hitachi Ltd Method for formation of pattern

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5558529A (en) * 1978-10-26 1980-05-01 Chiyou Lsi Gijutsu Kenkyu Kumiai Electron beam exposure
JPS55140228A (en) * 1979-04-20 1980-11-01 Hitachi Ltd Method for formation of pattern

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