JPS53120276A - Electron beam exposure method - Google Patents

Electron beam exposure method

Info

Publication number
JPS53120276A
JPS53120276A JP3579977A JP3579977A JPS53120276A JP S53120276 A JPS53120276 A JP S53120276A JP 3579977 A JP3579977 A JP 3579977A JP 3579977 A JP3579977 A JP 3579977A JP S53120276 A JPS53120276 A JP S53120276A
Authority
JP
Japan
Prior art keywords
electron beam
exposure method
beam exposure
pattern
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3579977A
Other languages
Japanese (ja)
Inventor
Katsumi Mori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP3579977A priority Critical patent/JPS53120276A/en
Publication of JPS53120276A publication Critical patent/JPS53120276A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To eliminate the unevenness of the exposure value of the pattern caused by the approximation effect and thus to increase the accuracy and reliability, by giving a repetitive exposure to the periphery in case the pattern of wider width than the electron beam diameter is scanned and exposed by the electron beam.
COPYRIGHT: (C)1978,JPO&Japio
JP3579977A 1977-03-29 1977-03-29 Electron beam exposure method Pending JPS53120276A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3579977A JPS53120276A (en) 1977-03-29 1977-03-29 Electron beam exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3579977A JPS53120276A (en) 1977-03-29 1977-03-29 Electron beam exposure method

Publications (1)

Publication Number Publication Date
JPS53120276A true JPS53120276A (en) 1978-10-20

Family

ID=12451953

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3579977A Pending JPS53120276A (en) 1977-03-29 1977-03-29 Electron beam exposure method

Country Status (1)

Country Link
JP (1) JPS53120276A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57211232A (en) * 1981-06-23 1982-12-25 Toshiba Mach Co Ltd Raster scanning type electron beam exposure
JPS59208720A (en) * 1983-05-13 1984-11-27 Hitachi Ltd Drawing method and apparatus
JPS62169413A (en) * 1986-01-22 1987-07-25 Toshiba Corp Electronic beam exposure method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57211232A (en) * 1981-06-23 1982-12-25 Toshiba Mach Co Ltd Raster scanning type electron beam exposure
JPS59208720A (en) * 1983-05-13 1984-11-27 Hitachi Ltd Drawing method and apparatus
JPS62169413A (en) * 1986-01-22 1987-07-25 Toshiba Corp Electronic beam exposure method

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