JPS53120276A - Electron beam exposure method - Google Patents
Electron beam exposure methodInfo
- Publication number
- JPS53120276A JPS53120276A JP3579977A JP3579977A JPS53120276A JP S53120276 A JPS53120276 A JP S53120276A JP 3579977 A JP3579977 A JP 3579977A JP 3579977 A JP3579977 A JP 3579977A JP S53120276 A JPS53120276 A JP S53120276A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- exposure method
- beam exposure
- pattern
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: To eliminate the unevenness of the exposure value of the pattern caused by the approximation effect and thus to increase the accuracy and reliability, by giving a repetitive exposure to the periphery in case the pattern of wider width than the electron beam diameter is scanned and exposed by the electron beam.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3579977A JPS53120276A (en) | 1977-03-29 | 1977-03-29 | Electron beam exposure method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3579977A JPS53120276A (en) | 1977-03-29 | 1977-03-29 | Electron beam exposure method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS53120276A true JPS53120276A (en) | 1978-10-20 |
Family
ID=12451953
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3579977A Pending JPS53120276A (en) | 1977-03-29 | 1977-03-29 | Electron beam exposure method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53120276A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57211232A (en) * | 1981-06-23 | 1982-12-25 | Toshiba Mach Co Ltd | Raster scanning type electron beam exposure |
JPS59208720A (en) * | 1983-05-13 | 1984-11-27 | Hitachi Ltd | Drawing method and apparatus |
JPS62169413A (en) * | 1986-01-22 | 1987-07-25 | Toshiba Corp | Electronic beam exposure method |
-
1977
- 1977-03-29 JP JP3579977A patent/JPS53120276A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57211232A (en) * | 1981-06-23 | 1982-12-25 | Toshiba Mach Co Ltd | Raster scanning type electron beam exposure |
JPS59208720A (en) * | 1983-05-13 | 1984-11-27 | Hitachi Ltd | Drawing method and apparatus |
JPS62169413A (en) * | 1986-01-22 | 1987-07-25 | Toshiba Corp | Electronic beam exposure method |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS51111076A (en) | Exposure device | |
JPS5412675A (en) | Electon beam exposure method | |
JPS5211774A (en) | Method of detecting relative position of patterns | |
JPS52119185A (en) | Electron beam exposure equipment | |
JPS5427369A (en) | Pattern formation method | |
JPS53120276A (en) | Electron beam exposure method | |
JPS5381116A (en) | Radiation sensitive polymer and its working method | |
JPS52120686A (en) | Electronic ray exposure method | |
JPS5359367A (en) | Formation of electron beam resist image | |
JPS5230170A (en) | Method of photoetching | |
JPS5431282A (en) | Pattern formation method | |
JPS51148365A (en) | Electron beam exposure method | |
JPS51148370A (en) | Electron ray exposure method | |
JPS5359374A (en) | Electron beam exposure unit | |
JPS53118980A (en) | Exposing method of electron ray | |
JPS52117077A (en) | Electron beam-exposing method | |
JPS5380168A (en) | Exposure method for electronic beam | |
JPS52119179A (en) | Electron beam exposing method | |
JPS5251870A (en) | Electron bean exposure method | |
JPS53114676A (en) | Electron beam exposure method | |
JPS5442979A (en) | Electron beam exposure device | |
JPS52117578A (en) | Electron beam exposing method | |
JPS5354974A (en) | Electron beam exposure system | |
JPS53117463A (en) | Position detection method | |
JPS5350978A (en) | Electron beam exposure method |