JPS52120686A - Electronic ray exposure method - Google Patents

Electronic ray exposure method

Info

Publication number
JPS52120686A
JPS52120686A JP4611977A JP4611977A JPS52120686A JP S52120686 A JPS52120686 A JP S52120686A JP 4611977 A JP4611977 A JP 4611977A JP 4611977 A JP4611977 A JP 4611977A JP S52120686 A JPS52120686 A JP S52120686A
Authority
JP
Japan
Prior art keywords
ray exposure
electronic ray
exposure method
electronic
designating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4611977A
Other languages
Japanese (ja)
Other versions
JPS5324792B2 (en
Inventor
Hidekazu Goto
Takashi Soma
Masanori Idesawa
Sakae Miyauchi
Kazumitsu Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
RIKEN Institute of Physical and Chemical Research
Original Assignee
Jeol Ltd
Nihon Denshi KK
RIKEN Institute of Physical and Chemical Research
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK, RIKEN Institute of Physical and Chemical Research filed Critical Jeol Ltd
Priority to JP4611977A priority Critical patent/JPS52120686A/en
Publication of JPS52120686A publication Critical patent/JPS52120686A/en
Publication of JPS5324792B2 publication Critical patent/JPS5324792B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To make the electronic ray exposure, by designating the electronic ray radiation position in the supposed standard section by the high speed D - A converter, and designating the standard section in order according to the definite sequence by the D - A converter of high exactitude.
COPYRIGHT: (C)1977,JPO&Japio
JP4611977A 1977-04-21 1977-04-21 Electronic ray exposure method Granted JPS52120686A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4611977A JPS52120686A (en) 1977-04-21 1977-04-21 Electronic ray exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4611977A JPS52120686A (en) 1977-04-21 1977-04-21 Electronic ray exposure method

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP3764176A Division JPS52122083A (en) 1976-04-02 1976-04-02 Electron beam exposing device

Publications (2)

Publication Number Publication Date
JPS52120686A true JPS52120686A (en) 1977-10-11
JPS5324792B2 JPS5324792B2 (en) 1978-07-22

Family

ID=12738097

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4611977A Granted JPS52120686A (en) 1977-04-21 1977-04-21 Electronic ray exposure method

Country Status (1)

Country Link
JP (1) JPS52120686A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5543821A (en) * 1978-09-22 1980-03-27 Hitachi Ltd Electronic drawing device
JPS55146931A (en) * 1979-05-04 1980-11-15 Hitachi Ltd Depicting method by electronic beam
JPS56153739A (en) * 1981-04-09 1981-11-27 Fujitsu Ltd Exposing method for electron beam
JPS5746835U (en) * 1980-08-29 1982-03-16
JPS5748230A (en) * 1980-09-04 1982-03-19 Jeol Ltd Electron ray exposure
JPS5793528A (en) * 1980-11-28 1982-06-10 Ibm Electron beam device
JP2006190555A (en) * 2005-01-06 2006-07-20 Jeol Ltd Charged particle beam device and control method of charged particle beam device

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS501783A (en) * 1973-05-02 1975-01-09
JPS5093571A (en) * 1973-12-19 1975-07-25
JPS52122083A (en) * 1976-04-02 1977-10-13 Jeol Ltd Electron beam exposing device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS501783A (en) * 1973-05-02 1975-01-09
JPS5093571A (en) * 1973-12-19 1975-07-25
JPS52122083A (en) * 1976-04-02 1977-10-13 Jeol Ltd Electron beam exposing device

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5543821A (en) * 1978-09-22 1980-03-27 Hitachi Ltd Electronic drawing device
JPS55146931A (en) * 1979-05-04 1980-11-15 Hitachi Ltd Depicting method by electronic beam
JPS5746835U (en) * 1980-08-29 1982-03-16
JPS5748230A (en) * 1980-09-04 1982-03-19 Jeol Ltd Electron ray exposure
JPS631741B2 (en) * 1980-09-04 1988-01-13 Nippon Electron Optics Lab
JPS5793528A (en) * 1980-11-28 1982-06-10 Ibm Electron beam device
JPS56153739A (en) * 1981-04-09 1981-11-27 Fujitsu Ltd Exposing method for electron beam
JPS6227534B2 (en) * 1981-04-09 1987-06-15 Fujitsu Ltd
JP2006190555A (en) * 2005-01-06 2006-07-20 Jeol Ltd Charged particle beam device and control method of charged particle beam device
JP4583936B2 (en) * 2005-01-06 2010-11-17 日本電子株式会社 Charged particle beam device and control method of charged particle beam device

Also Published As

Publication number Publication date
JPS5324792B2 (en) 1978-07-22

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