JPS52122083A - Electron beam exposing device - Google Patents

Electron beam exposing device

Info

Publication number
JPS52122083A
JPS52122083A JP3764176A JP3764176A JPS52122083A JP S52122083 A JPS52122083 A JP S52122083A JP 3764176 A JP3764176 A JP 3764176A JP 3764176 A JP3764176 A JP 3764176A JP S52122083 A JPS52122083 A JP S52122083A
Authority
JP
Japan
Prior art keywords
electron beam
exposing device
beam exposing
deflecting
masks
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3764176A
Other languages
Japanese (ja)
Other versions
JPS5311830B2 (en
Inventor
Hidekazu Goto
Takashi Soma
Masanori Idesawa
Sakae Miyauchi
Kazumitsu Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
RIKEN Institute of Physical and Chemical Research
Original Assignee
Jeol Ltd
Nihon Denshi KK
RIKEN Institute of Physical and Chemical Research
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK, RIKEN Institute of Physical and Chemical Research filed Critical Jeol Ltd
Priority to JP3764176A priority Critical patent/JPS52122083A/en
Publication of JPS52122083A publication Critical patent/JPS52122083A/en
Publication of JPS5311830B2 publication Critical patent/JPS5311830B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: Exposure speed is considerably increased by deflecting an electron beam passing through two sheets of masks to vary their sectional shape and size and scanning at a high speed over the reduced picture by way of a D/A converter of a small number of bits.
COPYRIGHT: (C)1977,JPO&Japio
JP3764176A 1976-04-02 1976-04-02 Electron beam exposing device Granted JPS52122083A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3764176A JPS52122083A (en) 1976-04-02 1976-04-02 Electron beam exposing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3764176A JPS52122083A (en) 1976-04-02 1976-04-02 Electron beam exposing device

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP4611977A Division JPS52120686A (en) 1977-04-21 1977-04-21 Electronic ray exposure method

Publications (2)

Publication Number Publication Date
JPS52122083A true JPS52122083A (en) 1977-10-13
JPS5311830B2 JPS5311830B2 (en) 1978-04-25

Family

ID=12503266

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3764176A Granted JPS52122083A (en) 1976-04-02 1976-04-02 Electron beam exposing device

Country Status (1)

Country Link
JP (1) JPS52122083A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52120686A (en) * 1977-04-21 1977-10-11 Jeol Ltd Electronic ray exposure method

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3638231A (en) * 1968-05-27 1972-01-25 Tno Device for recording with electron rays

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3638231A (en) * 1968-05-27 1972-01-25 Tno Device for recording with electron rays

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52120686A (en) * 1977-04-21 1977-10-11 Jeol Ltd Electronic ray exposure method
JPS5324792B2 (en) * 1977-04-21 1978-07-22

Also Published As

Publication number Publication date
JPS5311830B2 (en) 1978-04-25

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