JPS52124872A - Electron beam exposure device - Google Patents

Electron beam exposure device

Info

Publication number
JPS52124872A
JPS52124872A JP4120476A JP4120476A JPS52124872A JP S52124872 A JPS52124872 A JP S52124872A JP 4120476 A JP4120476 A JP 4120476A JP 4120476 A JP4120476 A JP 4120476A JP S52124872 A JPS52124872 A JP S52124872A
Authority
JP
Japan
Prior art keywords
electron beam
exposure device
beam exposure
driving shaft
elongating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4120476A
Other languages
Japanese (ja)
Inventor
Kohei Hori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP4120476A priority Critical patent/JPS52124872A/en
Publication of JPS52124872A publication Critical patent/JPS52124872A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To attenuate the oscillations of an exposing stage driving shaft by using elongating and contracting of a bellows with movement of the driving shaft.
COPYRIGHT: (C)1977,JPO&Japio
JP4120476A 1976-04-14 1976-04-14 Electron beam exposure device Pending JPS52124872A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4120476A JPS52124872A (en) 1976-04-14 1976-04-14 Electron beam exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4120476A JPS52124872A (en) 1976-04-14 1976-04-14 Electron beam exposure device

Publications (1)

Publication Number Publication Date
JPS52124872A true JPS52124872A (en) 1977-10-20

Family

ID=12601875

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4120476A Pending JPS52124872A (en) 1976-04-14 1976-04-14 Electron beam exposure device

Country Status (1)

Country Link
JP (1) JPS52124872A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0187533U (en) * 1987-12-01 1989-06-09
WO2000016371A1 (en) * 1998-09-16 2000-03-23 Hitachi, Ltd. Beam-utilizing equipment

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0187533U (en) * 1987-12-01 1989-06-09
WO2000016371A1 (en) * 1998-09-16 2000-03-23 Hitachi, Ltd. Beam-utilizing equipment

Similar Documents

Publication Publication Date Title
JPS52119178A (en) Electron beam exposure device
JPS5442126A (en) Exposure scanning device
JPS52124872A (en) Electron beam exposure device
JPS5292509A (en) Folidng bellows for camera
JPS5359367A (en) Formation of electron beam resist image
JPS5244375A (en) Link mechanism
JPS5219865A (en) Rotational amount changing mechanism
JPS52130570A (en) Electron beam exposing device
JPS5214100A (en) Device for aiming
JPS52125977A (en) Gear apparatus
JPS527723A (en) Photographic lens of large aperture ratio
JPS53101279A (en) Electron beam exposure device
JPS5221947A (en) Upper body rocking doll
JPS52122083A (en) Electron beam exposing device
JPS5434091A (en) Constructing device for long material with offset
JPS5429976A (en) Manufacture of semiconductor device
JPS5360162A (en) Electron beam irradiation device
JPS5210680A (en) Method of manufacturing photo-mask for photo etching
JPS5342747A (en) Optical logic device device
JPS523936A (en) Co-operative device for tandem-type carbreator
JPS5249045A (en) Exciter
JPS5350978A (en) Electron beam exposure method
JPS52131474A (en) Wafer chuck for mask aligner
JPS5254545A (en) Pinball device
JPS5295177A (en) Electronic beam mask and manufacture