JPS5429976A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS5429976A JPS5429976A JP9589877A JP9589877A JPS5429976A JP S5429976 A JPS5429976 A JP S5429976A JP 9589877 A JP9589877 A JP 9589877A JP 9589877 A JP9589877 A JP 9589877A JP S5429976 A JPS5429976 A JP S5429976A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- manufacture
- semiconductor device
- exposure
- evade
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To evade the generation of an unexposed part due to the dust, etc., by shifting the relative position between a mask and semiconductor substrate or by achieving exposure once or more with the mask replaced after the 1st exposure of a photo resist film via the mask.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9589877A JPS5429976A (en) | 1977-08-10 | 1977-08-10 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9589877A JPS5429976A (en) | 1977-08-10 | 1977-08-10 | Manufacture of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5429976A true JPS5429976A (en) | 1979-03-06 |
Family
ID=14150114
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9589877A Pending JPS5429976A (en) | 1977-08-10 | 1977-08-10 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5429976A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56116625A (en) * | 1980-02-20 | 1981-09-12 | Sanyo Electric Co Ltd | Exposure of fine pattern |
JPS6115140A (en) * | 1984-07-02 | 1986-01-23 | Fujitsu Ltd | Formation of pattern |
JP2007164085A (en) * | 2005-11-15 | 2007-06-28 | Nsk Ltd | Proximity exposure method |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4833908A (en) * | 1971-09-01 | 1973-05-15 | ||
JPS4852479A (en) * | 1971-11-05 | 1973-07-23 |
-
1977
- 1977-08-10 JP JP9589877A patent/JPS5429976A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4833908A (en) * | 1971-09-01 | 1973-05-15 | ||
JPS4852479A (en) * | 1971-11-05 | 1973-07-23 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56116625A (en) * | 1980-02-20 | 1981-09-12 | Sanyo Electric Co Ltd | Exposure of fine pattern |
JPS6115140A (en) * | 1984-07-02 | 1986-01-23 | Fujitsu Ltd | Formation of pattern |
JPH0526182B2 (en) * | 1984-07-02 | 1993-04-15 | Fujitsu Ltd | |
JP2007164085A (en) * | 2005-11-15 | 2007-06-28 | Nsk Ltd | Proximity exposure method |
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