JPS5366375A - Manufacture for semiconductor device - Google Patents

Manufacture for semiconductor device

Info

Publication number
JPS5366375A
JPS5366375A JP14247176A JP14247176A JPS5366375A JP S5366375 A JPS5366375 A JP S5366375A JP 14247176 A JP14247176 A JP 14247176A JP 14247176 A JP14247176 A JP 14247176A JP S5366375 A JPS5366375 A JP S5366375A
Authority
JP
Japan
Prior art keywords
manufacture
semiconductor device
pattern
exposing
resist film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14247176A
Other languages
Japanese (ja)
Inventor
Chuichi Takada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP14247176A priority Critical patent/JPS5366375A/en
Publication of JPS5366375A publication Critical patent/JPS5366375A/en
Pending legal-status Critical Current

Links

Landscapes

  • Manufacturing Of Printed Circuit Boards (AREA)
  • Drying Of Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE: To leave the photo resist film in matching with the exposing pattern and to form accurate pattern, by making plasma incineration and by incinerating the part not exposed first than the exposed part after exposing with a given pattern to the photo resist film.
COPYRIGHT: (C)1978,JPO&Japio
JP14247176A 1976-11-26 1976-11-26 Manufacture for semiconductor device Pending JPS5366375A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14247176A JPS5366375A (en) 1976-11-26 1976-11-26 Manufacture for semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14247176A JPS5366375A (en) 1976-11-26 1976-11-26 Manufacture for semiconductor device

Publications (1)

Publication Number Publication Date
JPS5366375A true JPS5366375A (en) 1978-06-13

Family

ID=15316079

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14247176A Pending JPS5366375A (en) 1976-11-26 1976-11-26 Manufacture for semiconductor device

Country Status (1)

Country Link
JP (1) JPS5366375A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5744143A (en) * 1980-08-29 1982-03-12 Tokyo Ohka Kogyo Co Ltd Composition and method for forming micropattern

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5744143A (en) * 1980-08-29 1982-03-12 Tokyo Ohka Kogyo Co Ltd Composition and method for forming micropattern
JPS6341047B2 (en) * 1980-08-29 1988-08-15 Tokyo Oka Kogyo Kk

Similar Documents

Publication Publication Date Title
JPS51120180A (en) Pattern printing device
JPS5366375A (en) Manufacture for semiconductor device
JPS5373073A (en) Treatment method for photo resist
JPS5361280A (en) Pattern projector
JPS5389673A (en) Fine pattern forming method of semiconductor device
JPS54141573A (en) Mask for exposure
JPS5429976A (en) Manufacture of semiconductor device
JPS5272175A (en) Mask patterning of resist meterial
JPS5347825A (en) Photoresist exposure
JPS5211868A (en) Photoresist coating method
JPS533821A (en) Exposure method
JPS5255867A (en) Exposure method
JPS539473A (en) Photoetching process
JPS5244570A (en) Photoetching method
JPS53147468A (en) Production of semiconductor device
JPS5316631A (en) Photographic exposure method
JPS52153668A (en) Photo mask of semiconductor integrated circuit
JPS5368172A (en) Production of semiconductor device
JPS5354974A (en) Electron beam exposure system
JPS5397374A (en) Mask producing method
JPS52156569A (en) Production of optical mask
JPS53126879A (en) Formation mathod of electrode wiring layer
JPS53135844A (en) Photochemical etching procee
JPS5376745A (en) Production of semiconductor device
JPS5382268A (en) Production of mask