JPS539473A - Photoetching process - Google Patents

Photoetching process

Info

Publication number
JPS539473A
JPS539473A JP8347376A JP8347376A JPS539473A JP S539473 A JPS539473 A JP S539473A JP 8347376 A JP8347376 A JP 8347376A JP 8347376 A JP8347376 A JP 8347376A JP S539473 A JPS539473 A JP S539473A
Authority
JP
Japan
Prior art keywords
photoetching process
films
photoetching
undulations
etched
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8347376A
Other languages
Japanese (ja)
Inventor
Akiyoshi Hori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP8347376A priority Critical patent/JPS539473A/en
Publication of JPS539473A publication Critical patent/JPS539473A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Bipolar Transistors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To perform hole opening with good accuracy and make possible fine processing by forming photo resist films twice and photoetching said films with the quantity of light according to the difference in film thickness based on the undulations of the material to be etched.
COPYRIGHT: (C)1978,JPO&Japio
JP8347376A 1976-07-15 1976-07-15 Photoetching process Pending JPS539473A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8347376A JPS539473A (en) 1976-07-15 1976-07-15 Photoetching process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8347376A JPS539473A (en) 1976-07-15 1976-07-15 Photoetching process

Publications (1)

Publication Number Publication Date
JPS539473A true JPS539473A (en) 1978-01-27

Family

ID=13803423

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8347376A Pending JPS539473A (en) 1976-07-15 1976-07-15 Photoetching process

Country Status (1)

Country Link
JP (1) JPS539473A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5511335A (en) * 1978-07-11 1980-01-26 Oki Electric Ind Co Ltd Pattern forming method
JPS55138839A (en) * 1979-04-17 1980-10-30 Nec Kyushu Ltd Method of fabricating semiconductor device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5511335A (en) * 1978-07-11 1980-01-26 Oki Electric Ind Co Ltd Pattern forming method
JPS55138839A (en) * 1979-04-17 1980-10-30 Nec Kyushu Ltd Method of fabricating semiconductor device

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