JPS5353978A - Rotating position relation adjusting method - Google Patents
Rotating position relation adjusting methodInfo
- Publication number
- JPS5353978A JPS5353978A JP12893376A JP12893376A JPS5353978A JP S5353978 A JPS5353978 A JP S5353978A JP 12893376 A JP12893376 A JP 12893376A JP 12893376 A JP12893376 A JP 12893376A JP S5353978 A JPS5353978 A JP S5353978A
- Authority
- JP
- Japan
- Prior art keywords
- rotating position
- position relation
- adjusting method
- relation adjusting
- diaphragm
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: To obtain fine patterns with good accuracy by changing the imaging position of the rectagular by a first diaphragm in relation to a second diaphragm and adjusting the rotating position relation of the two apeatures based on the results being displyed.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12893376A JPS5353978A (en) | 1976-10-27 | 1976-10-27 | Rotating position relation adjusting method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12893376A JPS5353978A (en) | 1976-10-27 | 1976-10-27 | Rotating position relation adjusting method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5353978A true JPS5353978A (en) | 1978-05-16 |
Family
ID=14996980
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12893376A Pending JPS5353978A (en) | 1976-10-27 | 1976-10-27 | Rotating position relation adjusting method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5353978A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5442980A (en) * | 1977-09-10 | 1979-04-05 | Cho Lsi Gijutsu Kenkyu Kumiai | Electron beam unit |
JPS54107677A (en) * | 1978-02-10 | 1979-08-23 | Jeol Ltd | Rotation error detection method of apperture in electronic ray exposure and its unit |
JPS59169132A (en) * | 1983-03-16 | 1984-09-25 | Hitachi Ltd | Drawing device by electron beam |
-
1976
- 1976-10-27 JP JP12893376A patent/JPS5353978A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5442980A (en) * | 1977-09-10 | 1979-04-05 | Cho Lsi Gijutsu Kenkyu Kumiai | Electron beam unit |
JPS54107677A (en) * | 1978-02-10 | 1979-08-23 | Jeol Ltd | Rotation error detection method of apperture in electronic ray exposure and its unit |
JPS5549768B2 (en) * | 1978-02-10 | 1980-12-13 | ||
JPS59169132A (en) * | 1983-03-16 | 1984-09-25 | Hitachi Ltd | Drawing device by electron beam |
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