JPS5353978A - Rotating position relation adjusting method - Google Patents

Rotating position relation adjusting method

Info

Publication number
JPS5353978A
JPS5353978A JP12893376A JP12893376A JPS5353978A JP S5353978 A JPS5353978 A JP S5353978A JP 12893376 A JP12893376 A JP 12893376A JP 12893376 A JP12893376 A JP 12893376A JP S5353978 A JPS5353978 A JP S5353978A
Authority
JP
Japan
Prior art keywords
rotating position
position relation
adjusting method
relation adjusting
diaphragm
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12893376A
Other languages
Japanese (ja)
Inventor
Hiroshi Yasuda
Haruo Tsuchikawa
Moritaka Nakamura
Yasutaka Ban
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP12893376A priority Critical patent/JPS5353978A/en
Publication of JPS5353978A publication Critical patent/JPS5353978A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To obtain fine patterns with good accuracy by changing the imaging position of the rectagular by a first diaphragm in relation to a second diaphragm and adjusting the rotating position relation of the two apeatures based on the results being displyed.
COPYRIGHT: (C)1978,JPO&Japio
JP12893376A 1976-10-27 1976-10-27 Rotating position relation adjusting method Pending JPS5353978A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12893376A JPS5353978A (en) 1976-10-27 1976-10-27 Rotating position relation adjusting method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12893376A JPS5353978A (en) 1976-10-27 1976-10-27 Rotating position relation adjusting method

Publications (1)

Publication Number Publication Date
JPS5353978A true JPS5353978A (en) 1978-05-16

Family

ID=14996980

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12893376A Pending JPS5353978A (en) 1976-10-27 1976-10-27 Rotating position relation adjusting method

Country Status (1)

Country Link
JP (1) JPS5353978A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5442980A (en) * 1977-09-10 1979-04-05 Cho Lsi Gijutsu Kenkyu Kumiai Electron beam unit
JPS54107677A (en) * 1978-02-10 1979-08-23 Jeol Ltd Rotation error detection method of apperture in electronic ray exposure and its unit
JPS59169132A (en) * 1983-03-16 1984-09-25 Hitachi Ltd Drawing device by electron beam

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5442980A (en) * 1977-09-10 1979-04-05 Cho Lsi Gijutsu Kenkyu Kumiai Electron beam unit
JPS54107677A (en) * 1978-02-10 1979-08-23 Jeol Ltd Rotation error detection method of apperture in electronic ray exposure and its unit
JPS5549768B2 (en) * 1978-02-10 1980-12-13
JPS59169132A (en) * 1983-03-16 1984-09-25 Hitachi Ltd Drawing device by electron beam

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