JPS53114685A - Manufacture for semiconductor device - Google Patents
Manufacture for semiconductor deviceInfo
- Publication number
- JPS53114685A JPS53114685A JP2859977A JP2859977A JPS53114685A JP S53114685 A JPS53114685 A JP S53114685A JP 2859977 A JP2859977 A JP 2859977A JP 2859977 A JP2859977 A JP 2859977A JP S53114685 A JPS53114685 A JP S53114685A
- Authority
- JP
- Japan
- Prior art keywords
- manufacture
- semiconductor device
- deteriorating
- aligning
- accuracy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Drying Of Semiconductors (AREA)
- Element Separation (AREA)
- Weting (AREA)
Abstract
PURPOSE: To manufacture the semiconductor device with increasing the accuracy in size and without deteriorating the performance of element, by self-aligning the part to become the element on the substrate and the field part separating the elements, with a simple manufacturing process.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2859977A JPS53114685A (en) | 1977-03-17 | 1977-03-17 | Manufacture for semiconductor device |
US05/831,393 US4140547A (en) | 1976-09-09 | 1977-09-08 | Method for manufacturing MOSFET devices by ion-implantation |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2859977A JPS53114685A (en) | 1977-03-17 | 1977-03-17 | Manufacture for semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS53114685A true JPS53114685A (en) | 1978-10-06 |
JPS5741101B2 JPS5741101B2 (en) | 1982-09-01 |
Family
ID=12253044
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2859977A Granted JPS53114685A (en) | 1976-09-09 | 1977-03-17 | Manufacture for semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53114685A (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5633841A (en) * | 1979-08-29 | 1981-04-04 | Sony Corp | Manufacture of semiconductor device |
JPS56113509U (en) * | 1980-02-01 | 1981-09-01 | ||
JPS5763522U (en) * | 1980-09-27 | 1982-04-15 | ||
JPS5775440A (en) * | 1980-10-28 | 1982-05-12 | Toshiba Corp | Manufacture of semiconductor device |
JPS62271450A (en) * | 1987-04-24 | 1987-11-25 | Hitachi Ltd | Manufacture of semiconductor device |
JPH033244A (en) * | 1989-05-30 | 1991-01-09 | Shin Etsu Handotai Co Ltd | Heat treatment method for semiconductor silicon substrate |
US5316965A (en) * | 1993-07-29 | 1994-05-31 | Digital Equipment Corporation | Method of decreasing the field oxide etch rate in isolation technology |
US5342803A (en) * | 1993-02-03 | 1994-08-30 | Rohm, Co., Ltd. | Method for isolating circuit elements for semiconductor device |
-
1977
- 1977-03-17 JP JP2859977A patent/JPS53114685A/en active Granted
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5633841A (en) * | 1979-08-29 | 1981-04-04 | Sony Corp | Manufacture of semiconductor device |
JPS6227539B2 (en) * | 1979-08-29 | 1987-06-15 | Sony Corp | |
JPS56113509U (en) * | 1980-02-01 | 1981-09-01 | ||
JPS5763522U (en) * | 1980-09-27 | 1982-04-15 | ||
JPS6038424Y2 (en) * | 1980-09-27 | 1985-11-16 | 遠藤商事株式会社 | coffee filtration stand |
JPS5775440A (en) * | 1980-10-28 | 1982-05-12 | Toshiba Corp | Manufacture of semiconductor device |
JPH0311090B2 (en) * | 1980-10-28 | 1991-02-15 | Tokyo Shibaura Electric Co | |
JPS62271450A (en) * | 1987-04-24 | 1987-11-25 | Hitachi Ltd | Manufacture of semiconductor device |
JPH033244A (en) * | 1989-05-30 | 1991-01-09 | Shin Etsu Handotai Co Ltd | Heat treatment method for semiconductor silicon substrate |
US5342803A (en) * | 1993-02-03 | 1994-08-30 | Rohm, Co., Ltd. | Method for isolating circuit elements for semiconductor device |
US5316965A (en) * | 1993-07-29 | 1994-05-31 | Digital Equipment Corporation | Method of decreasing the field oxide etch rate in isolation technology |
Also Published As
Publication number | Publication date |
---|---|
JPS5741101B2 (en) | 1982-09-01 |
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