JPS5360177A - Photo mask - Google Patents
Photo maskInfo
- Publication number
- JPS5360177A JPS5360177A JP13578176A JP13578176A JPS5360177A JP S5360177 A JPS5360177 A JP S5360177A JP 13578176 A JP13578176 A JP 13578176A JP 13578176 A JP13578176 A JP 13578176A JP S5360177 A JPS5360177 A JP S5360177A
- Authority
- JP
- Japan
- Prior art keywords
- photo mask
- quartz
- glass
- transfer
- providing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
PURPOSE: To reduce the dimensional shift at the time of transfer by providing an antireflection film on the substrate surface of quartz or glass.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13578176A JPS5360177A (en) | 1976-11-10 | 1976-11-10 | Photo mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13578176A JPS5360177A (en) | 1976-11-10 | 1976-11-10 | Photo mask |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5360177A true JPS5360177A (en) | 1978-05-30 |
Family
ID=15159692
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13578176A Pending JPS5360177A (en) | 1976-11-10 | 1976-11-10 | Photo mask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5360177A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6229139A (en) * | 1985-07-31 | 1987-02-07 | Hitachi Ltd | Pattern transfer mask and application thereof |
JPS63204259A (en) * | 1987-02-20 | 1988-08-23 | Hitachi Ltd | Mask |
JPH02195354A (en) * | 1989-01-24 | 1990-08-01 | Hoya Corp | Photomask |
-
1976
- 1976-11-10 JP JP13578176A patent/JPS5360177A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6229139A (en) * | 1985-07-31 | 1987-02-07 | Hitachi Ltd | Pattern transfer mask and application thereof |
JPS63204259A (en) * | 1987-02-20 | 1988-08-23 | Hitachi Ltd | Mask |
JPH02195354A (en) * | 1989-01-24 | 1990-08-01 | Hoya Corp | Photomask |
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