JPS52101991A - Preparation of silicon target - Google Patents
Preparation of silicon targetInfo
- Publication number
- JPS52101991A JPS52101991A JP1843676A JP1843676A JPS52101991A JP S52101991 A JPS52101991 A JP S52101991A JP 1843676 A JP1843676 A JP 1843676A JP 1843676 A JP1843676 A JP 1843676A JP S52101991 A JPS52101991 A JP S52101991A
- Authority
- JP
- Japan
- Prior art keywords
- preparation
- silicon target
- transparent substrate
- photoconductive film
- treating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: To improve yield and efficiency at manufacturing, by treating a photoconductive film and a transparent substrate together during manufacturing process, by forming the photoconductive film directly on the transparent substrate.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP51018436A JPS5847874B2 (en) | 1976-02-24 | 1976-02-24 | Manufacturing method of silicon target |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP51018436A JPS5847874B2 (en) | 1976-02-24 | 1976-02-24 | Manufacturing method of silicon target |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS52101991A true JPS52101991A (en) | 1977-08-26 |
JPS5847874B2 JPS5847874B2 (en) | 1983-10-25 |
Family
ID=11971585
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP51018436A Expired JPS5847874B2 (en) | 1976-02-24 | 1976-02-24 | Manufacturing method of silicon target |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5847874B2 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6140341U (en) * | 1984-08-17 | 1986-03-14 | 株式会社ミツプス | Separable roll continuous bag |
JPH0356970U (en) * | 1989-10-09 | 1991-05-31 |
-
1976
- 1976-02-24 JP JP51018436A patent/JPS5847874B2/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS5847874B2 (en) | 1983-10-25 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5313424A (en) | Photosensitive element of selenium for electronic photography | |
JPS5225651A (en) | Process for fabricating an optical curved surface using a photopolymer izable adhesive | |
JPS5320767A (en) | X-ray mask supporting underlayer and its production | |
JPS5237788A (en) | Process for production of photovoltaic elements | |
JPS52101991A (en) | Preparation of silicon target | |
JPS5225576A (en) | Exposure method of photo-resist | |
JPS5425169A (en) | Matching method for photo mask against semiconductor wafer | |
JPS53147549A (en) | Forming method of antireflection film | |
JPS5210065A (en) | Method for manufacturing multi-alkali photo electric surface | |
JPS543473A (en) | Manufacture of semiconductor device | |
JPS53128287A (en) | Production of semiconductor device | |
JPS525270A (en) | Photo-mask | |
JPS5267838A (en) | High frequency heater | |
JPS5346222A (en) | Solid state pick up unit | |
JPS5360177A (en) | Photo mask | |
JPS5348458A (en) | Production of semiconductor device | |
JPS5267271A (en) | Formation of through-hole onto semiconductor substrate | |
JPS5386177A (en) | Production of semiconductor device | |
JPS51139251A (en) | Method of manufacturing black heater | |
JPS5273673A (en) | Production of semiconductor device | |
JPS53135278A (en) | Photomask for photomechanics | |
JPS51142957A (en) | Magnetron | |
JPS51151071A (en) | Manufacturing method of a semiconductor apparatus | |
JPS51123559A (en) | Production method of aerial phase growth wafer | |
JPS51118394A (en) | Light united semiconductor unit and manufacturing process |