JPS51123559A - Production method of aerial phase growth wafer - Google Patents

Production method of aerial phase growth wafer

Info

Publication number
JPS51123559A
JPS51123559A JP4821475A JP4821475A JPS51123559A JP S51123559 A JPS51123559 A JP S51123559A JP 4821475 A JP4821475 A JP 4821475A JP 4821475 A JP4821475 A JP 4821475A JP S51123559 A JPS51123559 A JP S51123559A
Authority
JP
Japan
Prior art keywords
phase growth
production method
aerial phase
growth wafer
aerial
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4821475A
Other languages
Japanese (ja)
Inventor
Hasuichi Takiguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumco Techxiv Corp
Original Assignee
Komatsu Electronic Metals Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Komatsu Electronic Metals Co Ltd filed Critical Komatsu Electronic Metals Co Ltd
Priority to JP4821475A priority Critical patent/JPS51123559A/en
Publication of JPS51123559A publication Critical patent/JPS51123559A/en
Pending legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

PURPOSE: To reduce outdoping phenomenon at the time of manufacturing a semiconductor by aerial phase growth.
COPYRIGHT: (C)1976,JPO&Japio
JP4821475A 1975-04-22 1975-04-22 Production method of aerial phase growth wafer Pending JPS51123559A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4821475A JPS51123559A (en) 1975-04-22 1975-04-22 Production method of aerial phase growth wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4821475A JPS51123559A (en) 1975-04-22 1975-04-22 Production method of aerial phase growth wafer

Publications (1)

Publication Number Publication Date
JPS51123559A true JPS51123559A (en) 1976-10-28

Family

ID=12797148

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4821475A Pending JPS51123559A (en) 1975-04-22 1975-04-22 Production method of aerial phase growth wafer

Country Status (1)

Country Link
JP (1) JPS51123559A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022075369A1 (en) * 2020-10-09 2022-04-14 高見澤彰一 Method for producing silicon epitaxial wafer

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4915989A (en) * 1972-06-07 1974-02-12
JPS4919946A (en) * 1972-06-12 1974-02-21

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4915989A (en) * 1972-06-07 1974-02-12
JPS4919946A (en) * 1972-06-12 1974-02-21

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022075369A1 (en) * 2020-10-09 2022-04-14 高見澤彰一 Method for producing silicon epitaxial wafer

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