JPS5230167A - Method for production of semiconductor device - Google Patents
Method for production of semiconductor deviceInfo
- Publication number
- JPS5230167A JPS5230167A JP10593175A JP10593175A JPS5230167A JP S5230167 A JPS5230167 A JP S5230167A JP 10593175 A JP10593175 A JP 10593175A JP 10593175 A JP10593175 A JP 10593175A JP S5230167 A JPS5230167 A JP S5230167A
- Authority
- JP
- Japan
- Prior art keywords
- production
- semiconductor device
- film
- devices
- various kinds
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Bipolar Transistors (AREA)
- Formation Of Insulating Films (AREA)
Abstract
PURPOSE: A method for production of semiconductor device applicable as passivation film for various kinds of the devices while keeping characteristics of glassivation film.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10593175A JPS5230167A (en) | 1975-09-03 | 1975-09-03 | Method for production of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10593175A JPS5230167A (en) | 1975-09-03 | 1975-09-03 | Method for production of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5230167A true JPS5230167A (en) | 1977-03-07 |
Family
ID=14420587
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10593175A Pending JPS5230167A (en) | 1975-09-03 | 1975-09-03 | Method for production of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5230167A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55116203U (en) * | 1979-02-09 | 1980-08-16 | ||
JPS5632729A (en) * | 1979-08-23 | 1981-04-02 | Sanyo Electric Co Ltd | Etching method |
JPS5640255A (en) * | 1979-09-08 | 1981-04-16 | Toshiba Corp | Manufacture of bipolar type integrated circuit |
JPS5678125A (en) * | 1979-11-30 | 1981-06-26 | Hitachi Ltd | Manufacture of semiconductor device |
JPS57120341A (en) * | 1981-01-17 | 1982-07-27 | Toshiba Corp | Glass passivation semiconductor device |
JPS5968932A (en) * | 1982-10-13 | 1984-04-19 | Internatl Rectifier Corp Japan Ltd | Manufacture of semiconductor device |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS49105466A (en) * | 1973-02-07 | 1974-10-05 |
-
1975
- 1975-09-03 JP JP10593175A patent/JPS5230167A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS49105466A (en) * | 1973-02-07 | 1974-10-05 |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55116203U (en) * | 1979-02-09 | 1980-08-16 | ||
JPS5632729A (en) * | 1979-08-23 | 1981-04-02 | Sanyo Electric Co Ltd | Etching method |
JPS5640255A (en) * | 1979-09-08 | 1981-04-16 | Toshiba Corp | Manufacture of bipolar type integrated circuit |
JPS5678125A (en) * | 1979-11-30 | 1981-06-26 | Hitachi Ltd | Manufacture of semiconductor device |
JPS57120341A (en) * | 1981-01-17 | 1982-07-27 | Toshiba Corp | Glass passivation semiconductor device |
JPS6322456B2 (en) * | 1981-01-17 | 1988-05-12 | Tokyo Shibaura Electric Co | |
JPS5968932A (en) * | 1982-10-13 | 1984-04-19 | Internatl Rectifier Corp Japan Ltd | Manufacture of semiconductor device |
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