JPS51132762A - Heat-treatment method of semiconductor device - Google Patents

Heat-treatment method of semiconductor device

Info

Publication number
JPS51132762A
JPS51132762A JP5766275A JP5766275A JPS51132762A JP S51132762 A JPS51132762 A JP S51132762A JP 5766275 A JP5766275 A JP 5766275A JP 5766275 A JP5766275 A JP 5766275A JP S51132762 A JPS51132762 A JP S51132762A
Authority
JP
Japan
Prior art keywords
heat
semiconductor device
treatment method
wafer
impurities
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5766275A
Other languages
Japanese (ja)
Inventor
Masahiro Nakajima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Home Electronics Ltd
NEC Corp
Original Assignee
NEC Home Electronics Ltd
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Home Electronics Ltd, Nippon Electric Co Ltd filed Critical NEC Home Electronics Ltd
Priority to JP5766275A priority Critical patent/JPS51132762A/en
Publication of JPS51132762A publication Critical patent/JPS51132762A/en
Pending legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

PURPOSE: In order to obtain a diffusion layer by means of rotating the wafer, in a diffusion method which uses solid-impurities.
COPYRIGHT: (C)1976,JPO&Japio
JP5766275A 1975-05-13 1975-05-13 Heat-treatment method of semiconductor device Pending JPS51132762A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5766275A JPS51132762A (en) 1975-05-13 1975-05-13 Heat-treatment method of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5766275A JPS51132762A (en) 1975-05-13 1975-05-13 Heat-treatment method of semiconductor device

Publications (1)

Publication Number Publication Date
JPS51132762A true JPS51132762A (en) 1976-11-18

Family

ID=13062101

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5766275A Pending JPS51132762A (en) 1975-05-13 1975-05-13 Heat-treatment method of semiconductor device

Country Status (1)

Country Link
JP (1) JPS51132762A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57138130A (en) * 1981-02-20 1982-08-26 Fujitsu Ltd Diffusion treatment method

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4834670A (en) * 1971-09-07 1973-05-21

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4834670A (en) * 1971-09-07 1973-05-21

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57138130A (en) * 1981-02-20 1982-08-26 Fujitsu Ltd Diffusion treatment method

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