JPS57138130A - Diffusion treatment method - Google Patents

Diffusion treatment method

Info

Publication number
JPS57138130A
JPS57138130A JP2381081A JP2381081A JPS57138130A JP S57138130 A JPS57138130 A JP S57138130A JP 2381081 A JP2381081 A JP 2381081A JP 2381081 A JP2381081 A JP 2381081A JP S57138130 A JPS57138130 A JP S57138130A
Authority
JP
Japan
Prior art keywords
diffusion
wafers
holder
quartz
pipe
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2381081A
Other languages
Japanese (ja)
Inventor
Koichi Inoue
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP2381081A priority Critical patent/JPS57138130A/en
Publication of JPS57138130A publication Critical patent/JPS57138130A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67115—Apparatus for thermal treatment mainly by radiation

Landscapes

  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

PURPOSE:To prevent the unevenness of diffusion resulting from the convection of a gas, and to enable uniform diffusion by exposing a substrate to be treated, which is received into a reaction pipe, to a gas atmosphere containing an impurity while turning the substrate, heating it and executing diffusion treatment to it. CONSTITUTION:A holder 2 holding a large number of wafers 3 is inserted into an oven core pipe 1 made of quartz, etc., a hole 10 formed to a disk 7 at one end section of the holder 2 is fitted glidingly to a projection 5 shaped to the oven core pipe 1, and the pipe 1 is slowly turned through a rod 4 welded at the other end 6. The holder 2 is manufactured by quartz, etc., and formed in structure in which the disks 6, 7 at both ends are connected by three quartz bars 8, and the wafers 3 are inserted to slits 9 shaped to each bar while rotating the wafers, and held. Accordingly, diffusion layers formed to the wafers treated can be uniformalized. This method can apply even to the case when a BN board, etc. are used as a diffusion source or the case when they are sealed into a capsule, and diffusion can be equalized.
JP2381081A 1981-02-20 1981-02-20 Diffusion treatment method Pending JPS57138130A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2381081A JPS57138130A (en) 1981-02-20 1981-02-20 Diffusion treatment method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2381081A JPS57138130A (en) 1981-02-20 1981-02-20 Diffusion treatment method

Publications (1)

Publication Number Publication Date
JPS57138130A true JPS57138130A (en) 1982-08-26

Family

ID=12120684

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2381081A Pending JPS57138130A (en) 1981-02-20 1981-02-20 Diffusion treatment method

Country Status (1)

Country Link
JP (1) JPS57138130A (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5067557A (en) * 1973-10-15 1975-06-06
JPS51132762A (en) * 1975-05-13 1976-11-18 Nec Home Electronics Ltd Heat-treatment method of semiconductor device
JPS55148433A (en) * 1979-05-08 1980-11-19 Nec Corp Manufacture of semiconductor device and device therefor

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5067557A (en) * 1973-10-15 1975-06-06
JPS51132762A (en) * 1975-05-13 1976-11-18 Nec Home Electronics Ltd Heat-treatment method of semiconductor device
JPS55148433A (en) * 1979-05-08 1980-11-19 Nec Corp Manufacture of semiconductor device and device therefor

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