JPS6442122A - Vertical-type reaction device - Google Patents

Vertical-type reaction device

Info

Publication number
JPS6442122A
JPS6442122A JP19851087A JP19851087A JPS6442122A JP S6442122 A JPS6442122 A JP S6442122A JP 19851087 A JP19851087 A JP 19851087A JP 19851087 A JP19851087 A JP 19851087A JP S6442122 A JPS6442122 A JP S6442122A
Authority
JP
Japan
Prior art keywords
reaction
carrier
wafer
reaction device
jig
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19851087A
Other languages
Japanese (ja)
Inventor
Yoshiko Mino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP19851087A priority Critical patent/JPS6442122A/en
Publication of JPS6442122A publication Critical patent/JPS6442122A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To enhance the operation efficiency as a reaction device by a method wherein a carrier transfer mechanism is installed between a reaction part and a clean bench as a wafer exchange space and a wafer exchange mechanism is separated from the reaction part so that an occupied duration of the reaction device can be shortened. CONSTITUTION:A jig and a mechanism which are used to transfer a wafer-mounting carrier 1 by shifting it horizontally, raising or lowering it and turning it while the wafer-mounting carrier 1 is suspended are installed in a reaction device. A hole 16 for insertion of a suspension jig 16 is made in a top plate of the carrier 1; the jig can be taken out from a reaction tube in a hightemperature state due to a heat treatment; a wafer can be cooled on a clean bench outside a reaction chamber and can be exchanged; at the same time, a second carrier where another wafer has been set in advance is inserted into a reaction tube, and a film is formed. A plate or a freely opened and shut umbrella-like mechanism which is used to suspend the carrier 1 is installed at a tip part of the suspension jig 15; the suspension jig 15 can be turned for an alignment operation when it is to be suspended. By this setup, an operation rate of the reaction tube can be increased, and the operation efficiency as the reaction device can be enhanced.
JP19851087A 1987-08-07 1987-08-07 Vertical-type reaction device Pending JPS6442122A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19851087A JPS6442122A (en) 1987-08-07 1987-08-07 Vertical-type reaction device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19851087A JPS6442122A (en) 1987-08-07 1987-08-07 Vertical-type reaction device

Publications (1)

Publication Number Publication Date
JPS6442122A true JPS6442122A (en) 1989-02-14

Family

ID=16392337

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19851087A Pending JPS6442122A (en) 1987-08-07 1987-08-07 Vertical-type reaction device

Country Status (1)

Country Link
JP (1) JPS6442122A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5382128A (en) * 1993-03-03 1995-01-17 Takahashi; Kiyoshi Wafer transfer device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5382128A (en) * 1993-03-03 1995-01-17 Takahashi; Kiyoshi Wafer transfer device

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