JPS5588323A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS5588323A JPS5588323A JP15986778A JP15986778A JPS5588323A JP S5588323 A JPS5588323 A JP S5588323A JP 15986778 A JP15986778 A JP 15986778A JP 15986778 A JP15986778 A JP 15986778A JP S5588323 A JPS5588323 A JP S5588323A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- heater
- diffusion
- impurities
- furnace
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: To make diffusion of impurities uniform and also to decrease the unevenness of element characteristic in and between wafers by giving a vertical or rotary movement to a semiconductor wafer hold almost horizontally in a vertical diffusion furnace.
CONSTITUTION: A multitude of wafers 11 are mounted in a wafer holding jig 12 in a vertical diffusion furnace 13, which are held with a jig holder 16. The diffusion furnace 13 is provided with a heater 14 and arranged to introduce a carrier gas containing impurities from below. For diffusion treatment, the gas 15 is introduced in the furnace 13, the wafer 11 is heated to a given temperature by the heater 14, the jig holder 16 retaining the holding jig 2 is moved vertically and also rotated at the same time. Heat of the heater 14 and impurities of the gas 15 can thus be allowed to act uniformly to the wafer 11, and unevenness of element characteristic can be minimized consequently.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15986778A JPS5588323A (en) | 1978-12-27 | 1978-12-27 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15986778A JPS5588323A (en) | 1978-12-27 | 1978-12-27 | Manufacture of semiconductor device |
Related Child Applications (4)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP29056485A Division JPS61172325A (en) | 1985-12-25 | 1985-12-25 | Vertical type heat treating furnace |
JP16792686A Division JPS6211224A (en) | 1986-07-18 | 1986-07-18 | Heat treatment method for semiconductor wafer |
JP15110287A Division JPS6323313A (en) | 1987-06-19 | 1987-06-19 | Heat-treatment of semiconductor wafer |
JP191891A Division JPH03273620A (en) | 1991-01-11 | 1991-01-11 | Heat treating method of semiconductor wafer |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5588323A true JPS5588323A (en) | 1980-07-04 |
JPS633446B2 JPS633446B2 (en) | 1988-01-23 |
Family
ID=15702940
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15986778A Granted JPS5588323A (en) | 1978-12-27 | 1978-12-27 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5588323A (en) |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58108735A (en) * | 1981-12-23 | 1983-06-28 | Fujitsu Ltd | Basket for vertical type reaction tube |
JPS58110034A (en) * | 1981-12-24 | 1983-06-30 | Fujitsu Ltd | Vertical vapor phase epitaxial device |
JPS5974621A (en) * | 1982-10-21 | 1984-04-27 | Stanley Electric Co Ltd | Impurity diffusion and jig therefor |
JPS59232434A (en) * | 1983-06-16 | 1984-12-27 | Nippon Telegr & Teleph Corp <Ntt> | Work rotating apparatus in vacuum treatment apparatus |
JPS6127625A (en) * | 1984-07-18 | 1986-02-07 | Deisuko Saiyaa Japan:Kk | Heat treatment process and device of semiconductor wafer |
JPS6211224A (en) * | 1986-07-18 | 1987-01-20 | Hitachi Ltd | Heat treatment method for semiconductor wafer |
JPS633136U (en) * | 1986-06-24 | 1988-01-11 | ||
JPH0258825A (en) * | 1988-08-24 | 1990-02-28 | Nec Kyushu Ltd | Vertical reduced-pressure cvd apparatus |
JPH02152224A (en) * | 1988-12-02 | 1990-06-12 | Toshiba Corp | Vapor growth apparatus |
JPH0467619A (en) * | 1990-07-09 | 1992-03-03 | Nec Kyushu Ltd | Semiconductor manufacturing device |
JPH05157006A (en) * | 1991-11-29 | 1993-06-22 | Kubota Corp | Engine exhaust heat recovery device |
JPH06349738A (en) * | 1993-06-08 | 1994-12-22 | Nec Corp | Vertical low-pressure cvd device |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0267137A (en) * | 1988-09-02 | 1990-03-07 | Komori Printing Mach Co Ltd | Automatic dust removing apparatus of printing cylinder |
JPH02169252A (en) * | 1988-12-23 | 1990-06-29 | Nippon Baldwin Kk | Cylinder cleaning device of printer |
JPH02286245A (en) * | 1989-04-26 | 1990-11-26 | Nippon Baldwin Kk | Device for cleaning cylinder of sheet-fed press |
-
1978
- 1978-12-27 JP JP15986778A patent/JPS5588323A/en active Granted
Cited By (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6222526B2 (en) * | 1981-12-23 | 1987-05-19 | Fujitsu Ltd | |
JPS58108735A (en) * | 1981-12-23 | 1983-06-28 | Fujitsu Ltd | Basket for vertical type reaction tube |
JPS58110034A (en) * | 1981-12-24 | 1983-06-30 | Fujitsu Ltd | Vertical vapor phase epitaxial device |
JPH0412023B2 (en) * | 1982-10-21 | 1992-03-03 | Stanley Electric Co Ltd | |
JPS5974621A (en) * | 1982-10-21 | 1984-04-27 | Stanley Electric Co Ltd | Impurity diffusion and jig therefor |
JPS59232434A (en) * | 1983-06-16 | 1984-12-27 | Nippon Telegr & Teleph Corp <Ntt> | Work rotating apparatus in vacuum treatment apparatus |
JPH0548626B2 (en) * | 1983-06-16 | 1993-07-22 | Nippon Telegraph & Telephone | |
JPS6127625A (en) * | 1984-07-18 | 1986-02-07 | Deisuko Saiyaa Japan:Kk | Heat treatment process and device of semiconductor wafer |
JPS633136U (en) * | 1986-06-24 | 1988-01-11 | ||
JPH0528755Y2 (en) * | 1986-06-24 | 1993-07-23 | ||
JPS6211224A (en) * | 1986-07-18 | 1987-01-20 | Hitachi Ltd | Heat treatment method for semiconductor wafer |
JPH0258825A (en) * | 1988-08-24 | 1990-02-28 | Nec Kyushu Ltd | Vertical reduced-pressure cvd apparatus |
JPH02152224A (en) * | 1988-12-02 | 1990-06-12 | Toshiba Corp | Vapor growth apparatus |
JPH0467619A (en) * | 1990-07-09 | 1992-03-03 | Nec Kyushu Ltd | Semiconductor manufacturing device |
JPH05157006A (en) * | 1991-11-29 | 1993-06-22 | Kubota Corp | Engine exhaust heat recovery device |
JPH06349738A (en) * | 1993-06-08 | 1994-12-22 | Nec Corp | Vertical low-pressure cvd device |
Also Published As
Publication number | Publication date |
---|---|
JPS633446B2 (en) | 1988-01-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5588323A (en) | Manufacture of semiconductor device | |
JPS5277590A (en) | Semiconductor producing device | |
US3644154A (en) | Method of fabricating semiconductor structures with reduced crystallographic defects | |
JPS5265662A (en) | Method and device for diffusion to semiconductor substrate by high fre quency induction heating | |
JPS5390033A (en) | Heat treatment equipment | |
JPS54154376A (en) | Jig for detecting internal temperature of horizontal type heat treatment furnace | |
JPS6020510A (en) | Diffusing method of impurity | |
JPS5542231A (en) | Reduced pressure vapor phase growing device | |
JPS6081819A (en) | Infrared ray heat treatment device | |
JPS63181315A (en) | Equipment for heat treatment | |
GB1115101A (en) | Improvements in or relating to the manufacture of semiconductor bodies | |
JPS5542230A (en) | Vapor phase growing device | |
JPH01268021A (en) | Processing equipment for semiconductor | |
JP2742938B2 (en) | Semiconductor wafer heat treatment equipment | |
JPH0143857Y2 (en) | ||
JPS5243361A (en) | Thermal diffusion device for production of semiconductor device | |
JPS5613720A (en) | Heat treating device | |
JPS5487700A (en) | Gas phase magnespinel growing apparatus | |
JPS5555524A (en) | Method of manufacturing semiconductor device | |
JPS5788736A (en) | Preparation of semiconductor device | |
JPH0727910B2 (en) | Substrate holder for wafer annealing | |
JPS5750425A (en) | Diffusing method for impurity of semiconductor | |
JPS57194524A (en) | Manufacture of semiconductor device | |
JPS57159022A (en) | Heating device and method for semiconductor substrate | |
JPS54125966A (en) | Defect elimination method for semiconductor wafer |