JPS5390033A - Heat treatment equipment - Google Patents

Heat treatment equipment

Info

Publication number
JPS5390033A
JPS5390033A JP395777A JP395777A JPS5390033A JP S5390033 A JPS5390033 A JP S5390033A JP 395777 A JP395777 A JP 395777A JP 395777 A JP395777 A JP 395777A JP S5390033 A JPS5390033 A JP S5390033A
Authority
JP
Japan
Prior art keywords
heat treatment
treatment equipment
diffusion
furnace
cvd
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP395777A
Other languages
Japanese (ja)
Other versions
JPS5925142B2 (en
Inventor
Masakuni Akiba
Hiroto Nagatomo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP395777A priority Critical patent/JPS5925142B2/en
Publication of JPS5390033A publication Critical patent/JPS5390033A/en
Publication of JPS5925142B2 publication Critical patent/JPS5925142B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
  • Furnace Details (AREA)
  • Resistance Heating (AREA)

Abstract

PURPOSE: To keep temperature constant and complete elevation and reduction of it for a short time in a furnace of a heat treatment equipment such as a diffusion furnace applies diffusion or CVD to a semiconductor plate (wafer).
COPYRIGHT: (C)1978,JPO&Japio
JP395777A 1977-01-19 1977-01-19 heat treatment equipment Expired JPS5925142B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP395777A JPS5925142B2 (en) 1977-01-19 1977-01-19 heat treatment equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP395777A JPS5925142B2 (en) 1977-01-19 1977-01-19 heat treatment equipment

Publications (2)

Publication Number Publication Date
JPS5390033A true JPS5390033A (en) 1978-08-08
JPS5925142B2 JPS5925142B2 (en) 1984-06-14

Family

ID=11571573

Family Applications (1)

Application Number Title Priority Date Filing Date
JP395777A Expired JPS5925142B2 (en) 1977-01-19 1977-01-19 heat treatment equipment

Country Status (1)

Country Link
JP (1) JPS5925142B2 (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56146227A (en) * 1980-04-16 1981-11-13 Hitachi Ltd Heat treatment furnace
JPS58167702A (en) * 1982-03-29 1983-10-04 Sumitomo Electric Ind Ltd Luminous energy sintering method
JPS58206089A (en) * 1982-05-25 1983-12-01 レイデイアント・テクノロジ−・コ−ポレイシヨン Infrared furnace
JPS5947302A (en) * 1982-09-08 1984-03-17 Sumitomo Electric Ind Ltd Sintering furnace
JPS5947303A (en) * 1982-09-08 1984-03-17 Sumitomo Electric Ind Ltd Sintering furnace
JPS5977289A (en) * 1982-10-26 1984-05-02 ウシオ電機株式会社 Beam irradiating furnace
JPS59146177A (en) * 1983-02-09 1984-08-21 ウシオ電機株式会社 Light emitting heating method
JPS6188234U (en) * 1984-11-16 1986-06-09
JPS63148623A (en) * 1986-12-11 1988-06-21 Dainippon Screen Mfg Co Ltd Temperature-measuring system for substrate
JP2016050862A (en) * 2014-08-30 2016-04-11 四国電力株式会社 Sulfur trioxide density measurement method and device

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6337494B2 (en) * 1980-04-16 1988-07-26 Hitachi Ltd
JPS56146227A (en) * 1980-04-16 1981-11-13 Hitachi Ltd Heat treatment furnace
JPS6216241B2 (en) * 1982-03-29 1987-04-11 Sumitomo Electric Industries
JPS58167702A (en) * 1982-03-29 1983-10-04 Sumitomo Electric Ind Ltd Luminous energy sintering method
JPS58206089A (en) * 1982-05-25 1983-12-01 レイデイアント・テクノロジ−・コ−ポレイシヨン Infrared furnace
JPS6223042B2 (en) * 1982-09-08 1987-05-21 Sumitomo Electric Industries
JPS5947303A (en) * 1982-09-08 1984-03-17 Sumitomo Electric Ind Ltd Sintering furnace
JPS5947302A (en) * 1982-09-08 1984-03-17 Sumitomo Electric Ind Ltd Sintering furnace
JPS5977289A (en) * 1982-10-26 1984-05-02 ウシオ電機株式会社 Beam irradiating furnace
JPS59146177A (en) * 1983-02-09 1984-08-21 ウシオ電機株式会社 Light emitting heating method
JPH0150837B2 (en) * 1983-02-09 1989-10-31 Ushio Denki Kk
JPS6188234U (en) * 1984-11-16 1986-06-09
JPS63148623A (en) * 1986-12-11 1988-06-21 Dainippon Screen Mfg Co Ltd Temperature-measuring system for substrate
JP2016050862A (en) * 2014-08-30 2016-04-11 四国電力株式会社 Sulfur trioxide density measurement method and device

Also Published As

Publication number Publication date
JPS5925142B2 (en) 1984-06-14

Similar Documents

Publication Publication Date Title
JPS52139378A (en) Integrated treatment apparatus for semiconductor wafers
JPS5224478A (en) Semiconductor device manufacturing process
JPS5390033A (en) Heat treatment equipment
JPS5441176A (en) Semiconductor strain measuring device
JPS53124087A (en) Manufacture of semiconductor device
JPS51115212A (en) Apparatus for heat treatment with non-oxidizing atmosphere
JPS52142972A (en) Semiconductor production device
JPS5423379A (en) Formation of insulating film on semiconductor surface
JPS53130981A (en) Manufacture for semiconductor device
JPS5236980A (en) Heat sink for semiconductor devices
JPS51126070A (en) Weber treatment equipment
JPS53108373A (en) Manufacture for semiconductor device
JPS522163A (en) Wafer cleaning and drying device
JPS5428479A (en) Device of treating melted matter
JPS523385A (en) Semiconductor device
JPS544069A (en) Producing method of oxide film
JPS5226059A (en) Furnace-heat securing device
JPS52149968A (en) Heat treatment method of semiconductor wafers
JPS5230163A (en) Method for junction of semiconductor parts
JPS5326663A (en) Manu facture of semiconductor device
JPS5325351A (en) Heat treatment method of semiconductor wafers
JPS5425159A (en) Thermal processing method for semiconductor
JPS5224476A (en) Planar thyristor manufacturing process
JPS52139380A (en) Thin plate supporting device
JPS53128986A (en) Manufacture of semiconductor device