JPS6188234U

JPS6188234U -

Info

Publication number: JPS6188234U
Application number: JP17314484U
Authority: JP
Priority date: 1984-11-16
Filing date: 1984-11-16
Publication date: 1986-06-09

Description

[Brief explanation of drawings]

第１図は本考案の実施例の概要を示す縦断面図
、第２図は従来の縦形半導体熱処理炉の一例の概
要を示す縦断面図、第３図は従来の半導体熱処理
炉の、また第４図は本考案の半導体熱処理炉の各
１加熱サイクルの温度−時間特性の一例を示す特
性曲線図である。１……炉体、１ａ〜１ｄ……壁体、２……面状
赤外線放射ヒータ、３……石英管、Ｆ……炉本体
、Ｗ……半導体基板、５……上・下に駆動される
アーム、６……回転駆動機、７……トレイ支持台
、８……トレイ、１０……送気管、１１……排気
管。 FIG. 1 is a longitudinal sectional view showing an outline of an embodiment of the present invention, FIG. 2 is a longitudinal sectional view showing an outline of an example of a conventional vertical semiconductor heat treatment furnace, and FIG. 3 is a longitudinal sectional view showing an outline of an example of a conventional vertical semiconductor heat treatment furnace. FIG. 4 is a characteristic curve diagram showing an example of the temperature-time characteristics of each heating cycle of the semiconductor heat treatment furnace of the present invention. DESCRIPTION OF SYMBOLS 1... Furnace body, 1a to 1d... Wall body, 2... Planar infrared radiation heater, 3... Quartz tube, F... Furnace body, W... Semiconductor substrate, 5... Driven upward and downward. arm, 6... rotary drive machine, 7... tray support stand, 8... tray, 10... air pipe, 11... exhaust pipe.

Claims

[Scope of utility model registration request]

A vertical furnace arranged approximately vertically, with a heater on the inner wall of a cylindrical furnace body with a closed upper end and an open lower end, and a quartz tube with a gap spaced inside the heater and with at least the lower end open. A main body, a tray on which a semiconductor is placed for heat-treating the semiconductor in the furnace main body, and a vertical relationship between the furnace main body and the tray is relatively changed so that the tray is placed below the furnace main body. In the vertical semiconductor heat treatment furnace, the furnace body has a plurality of thin wall bodies each having a surface treated to increase heat reflectivity, and the furnace body has a plurality of thin wall bodies that are processed to increase heat reflectance on each surface of the furnace body. The heater is composed of a planar infrared radiant heater, and the space between the furnace body and the quartz tube and the space between the heater and the quartz tube is provided with cooling air. 1. A vertical semiconductor heat treatment furnace comprising: an air supply pipe for feeding air; and an exhaust pipe for discharging air from the gap to the outside of the furnace.