JPS5425159A - Thermal processing method for semiconductor - Google Patents

Thermal processing method for semiconductor

Info

Publication number
JPS5425159A
JPS5425159A JP9061377A JP9061377A JPS5425159A JP S5425159 A JPS5425159 A JP S5425159A JP 9061377 A JP9061377 A JP 9061377A JP 9061377 A JP9061377 A JP 9061377A JP S5425159 A JPS5425159 A JP S5425159A
Authority
JP
Japan
Prior art keywords
semiconductor
processing method
thermal processing
gas
dispersion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9061377A
Other languages
Japanese (ja)
Inventor
Shigenori Yokoyama
Yoshiki Sugimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Home Electronics Ltd
NEC Corp
Original Assignee
NEC Home Electronics Ltd
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Home Electronics Ltd, Nippon Electric Co Ltd filed Critical NEC Home Electronics Ltd
Priority to JP9061377A priority Critical patent/JPS5425159A/en
Publication of JPS5425159A publication Critical patent/JPS5425159A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To reduce the dispersion of a heat treatment by a a shielding body larger than a substrate to a gas exit perpendicularly to a flow of gas.
COPYRIGHT: (C)1979,JPO&Japio
JP9061377A 1977-07-27 1977-07-27 Thermal processing method for semiconductor Pending JPS5425159A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9061377A JPS5425159A (en) 1977-07-27 1977-07-27 Thermal processing method for semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9061377A JPS5425159A (en) 1977-07-27 1977-07-27 Thermal processing method for semiconductor

Publications (1)

Publication Number Publication Date
JPS5425159A true JPS5425159A (en) 1979-02-24

Family

ID=14003324

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9061377A Pending JPS5425159A (en) 1977-07-27 1977-07-27 Thermal processing method for semiconductor

Country Status (1)

Country Link
JP (1) JPS5425159A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005276875A (en) * 2004-03-23 2005-10-06 Shin Etsu Handotai Co Ltd Silicon single-crystal wafer and manufacturing method thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005276875A (en) * 2004-03-23 2005-10-06 Shin Etsu Handotai Co Ltd Silicon single-crystal wafer and manufacturing method thereof

Similar Documents

Publication Publication Date Title
JPS5224478A (en) Semiconductor device manufacturing process
JPS5390033A (en) Heat treatment equipment
JPS5421172A (en) Manufacture for semiconductor device
JPS5425159A (en) Thermal processing method for semiconductor
JPS53136484A (en) Wafer continuous machining method and unit used for the same
JPS5395879A (en) Operating method for silver-adsorbent filter
JPS53100775A (en) Production of semiconductor device
JPS5419656A (en) Bonding tool
JPS52155969A (en) Reduced pressure heat treatment furnace of semiconductor wafers
JPS52139373A (en) Treating method for compound semiconductor
JPS545386A (en) Surface processor for wafer
JPS5419364A (en) Semiconductor device
JPS5421171A (en) Manufacture for compound semiconductor device
JPS51118369A (en) Manufacturing process for simiconduator unit
JPS542670A (en) Plasma etching method
JPS52131453A (en) Thermal treating method for chemical compound semiconductor
JPS5413778A (en) Production of semiconductor device
JPS53106573A (en) Gas treatment method of semiconductor wafers
JPS5434755A (en) Manufacture of semiconductor device
JPS5429971A (en) Manufacture of semiconductor device
JPS51131458A (en) A process for treatment of high temperature high pressure exhaust gas
JPS5374360A (en) Heat treatment method for compound semiconductor
JPS5218467A (en) Process for treatment of gas containing cyanogen compound
JPS54875A (en) Gettering process system for semiconductor substrate
JPS5221552A (en) Shielding plate-loaded gasket