JPS544069A - Producing method of oxide film - Google Patents
Producing method of oxide filmInfo
- Publication number
- JPS544069A JPS544069A JP6890777A JP6890777A JPS544069A JP S544069 A JPS544069 A JP S544069A JP 6890777 A JP6890777 A JP 6890777A JP 6890777 A JP6890777 A JP 6890777A JP S544069 A JPS544069 A JP S544069A
- Authority
- JP
- Japan
- Prior art keywords
- oxide film
- producing method
- hfe
- dispersion
- semiconductor wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To reduce the dispersion in hFE, by preventing bending of semiconductor wafer and life time killer, through performing gradual heating and cooling processes under reducing atmosphere.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6890777A JPS544069A (en) | 1977-06-13 | 1977-06-13 | Producing method of oxide film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6890777A JPS544069A (en) | 1977-06-13 | 1977-06-13 | Producing method of oxide film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS544069A true JPS544069A (en) | 1979-01-12 |
Family
ID=13387182
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6890777A Pending JPS544069A (en) | 1977-06-13 | 1977-06-13 | Producing method of oxide film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS544069A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63190173A (en) * | 1987-02-02 | 1988-08-05 | Tokyo Electron Ltd | Plasma treating device |
US6593253B1 (en) | 1997-12-24 | 2003-07-15 | Asahi Kasei Microsystems Co., Ltd. | Method of manufacturing semiconductor device |
-
1977
- 1977-06-13 JP JP6890777A patent/JPS544069A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63190173A (en) * | 1987-02-02 | 1988-08-05 | Tokyo Electron Ltd | Plasma treating device |
US6593253B1 (en) | 1997-12-24 | 2003-07-15 | Asahi Kasei Microsystems Co., Ltd. | Method of manufacturing semiconductor device |
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