JPS5230171A - Method for fabrication of semiconductor device - Google Patents

Method for fabrication of semiconductor device

Info

Publication number
JPS5230171A
JPS5230171A JP10591475A JP10591475A JPS5230171A JP S5230171 A JPS5230171 A JP S5230171A JP 10591475 A JP10591475 A JP 10591475A JP 10591475 A JP10591475 A JP 10591475A JP S5230171 A JPS5230171 A JP S5230171A
Authority
JP
Japan
Prior art keywords
fabrication
semiconductor device
processes
scarce
insulator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10591475A
Other languages
Japanese (ja)
Inventor
Toru Inaba
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP10591475A priority Critical patent/JPS5230171A/en
Publication of JPS5230171A publication Critical patent/JPS5230171A/en
Pending legal-status Critical Current

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  • Element Separation (AREA)
  • Weting (AREA)

Abstract

PURPOSE: To simplify the fabrication processes and to make polishing processes as scarce as possible in the method for fabrication of semiconductor device by the insulator-separation mode.
COPYRIGHT: (C)1977,JPO&Japio
JP10591475A 1975-09-03 1975-09-03 Method for fabrication of semiconductor device Pending JPS5230171A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10591475A JPS5230171A (en) 1975-09-03 1975-09-03 Method for fabrication of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10591475A JPS5230171A (en) 1975-09-03 1975-09-03 Method for fabrication of semiconductor device

Publications (1)

Publication Number Publication Date
JPS5230171A true JPS5230171A (en) 1977-03-07

Family

ID=14420118

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10591475A Pending JPS5230171A (en) 1975-09-03 1975-09-03 Method for fabrication of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5230171A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56140625A (en) * 1980-04-01 1981-11-04 Nippon Telegr & Teleph Corp <Ntt> Manufacture of semiconductor integrated circuit
US4515909A (en) * 1982-02-16 1985-05-07 Kiyohito Sawano Resinous composition for the prolonged release of fragrant substances

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4838689A (en) * 1971-09-17 1973-06-07

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4838689A (en) * 1971-09-17 1973-06-07

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56140625A (en) * 1980-04-01 1981-11-04 Nippon Telegr & Teleph Corp <Ntt> Manufacture of semiconductor integrated circuit
US4515909A (en) * 1982-02-16 1985-05-07 Kiyohito Sawano Resinous composition for the prolonged release of fragrant substances

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