JPS5345177A - Production of semiconductor device - Google Patents
Production of semiconductor deviceInfo
- Publication number
- JPS5345177A JPS5345177A JP12010476A JP12010476A JPS5345177A JP S5345177 A JPS5345177 A JP S5345177A JP 12010476 A JP12010476 A JP 12010476A JP 12010476 A JP12010476 A JP 12010476A JP S5345177 A JPS5345177 A JP S5345177A
- Authority
- JP
- Japan
- Prior art keywords
- production
- semiconductor device
- performming
- annealing
- reduce
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To reduce the number and size of stacking faults by performming annealing in an inert gas such as N2, etc. after halogen oxidation.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12010476A JPS5345177A (en) | 1976-10-06 | 1976-10-06 | Production of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12010476A JPS5345177A (en) | 1976-10-06 | 1976-10-06 | Production of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5345177A true JPS5345177A (en) | 1978-04-22 |
Family
ID=14778013
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12010476A Pending JPS5345177A (en) | 1976-10-06 | 1976-10-06 | Production of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5345177A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5972508A (en) * | 1982-10-20 | 1984-04-24 | Takamatsu Kikai Kogyo Kk | Working order setting circuit of machine tool |
JPS60133734A (en) * | 1983-12-21 | 1985-07-16 | Mitsubishi Electric Corp | Manufacture of semiconductor device |
JPS6120674A (en) * | 1984-07-06 | 1986-01-29 | Matsushita Electric Ind Co Ltd | Control device for resistance welder |
US5506178A (en) * | 1992-12-25 | 1996-04-09 | Sony Corporation | Process for forming gate silicon oxide film for MOS transistors |
US6981588B2 (en) | 2001-03-30 | 2006-01-03 | Yugen Kaisha Toho Label | Packaging material for commodity |
-
1976
- 1976-10-06 JP JP12010476A patent/JPS5345177A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5972508A (en) * | 1982-10-20 | 1984-04-24 | Takamatsu Kikai Kogyo Kk | Working order setting circuit of machine tool |
JPS60133734A (en) * | 1983-12-21 | 1985-07-16 | Mitsubishi Electric Corp | Manufacture of semiconductor device |
JPH026223B2 (en) * | 1983-12-21 | 1990-02-08 | Mitsubishi Electric Corp | |
JPS6120674A (en) * | 1984-07-06 | 1986-01-29 | Matsushita Electric Ind Co Ltd | Control device for resistance welder |
US5506178A (en) * | 1992-12-25 | 1996-04-09 | Sony Corporation | Process for forming gate silicon oxide film for MOS transistors |
US6981588B2 (en) | 2001-03-30 | 2006-01-03 | Yugen Kaisha Toho Label | Packaging material for commodity |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5297666A (en) | Production of semiconductor device containing pn junctions | |
JPS5345177A (en) | Production of semiconductor device | |
JPS51115775A (en) | Semiconductor apparatus | |
JPS51112187A (en) | Processing method of semiconductor equipment | |
JPS5211525A (en) | Method of manufacturing headrests | |
JPS529379A (en) | Semiconductor device manufacturing process | |
JPS5383467A (en) | Production of semiconductor device | |
JPS51139263A (en) | Method of selective oxidation of silicon substrate | |
JPS51150986A (en) | Fabrication method of semiconductor device | |
JPS5233480A (en) | Semiconductor device | |
JPS5273673A (en) | Production of semiconductor device | |
JPS5252370A (en) | Fabrication of glass-sealed semiconductor device | |
JPS5230171A (en) | Method for fabrication of semiconductor device | |
JPS538569A (en) | Ic test method | |
JPS52179A (en) | Method of fabricating semiconductor | |
JPS5422776A (en) | Manufacture of semiconductor device | |
JPS51120174A (en) | Method of manufacturing semiconductors | |
JPS5257907A (en) | Turbine generator | |
JPS51151089A (en) | Manufacturing method of a semiconductor | |
JPS51112266A (en) | Semiconductor device production method | |
JPS52119192A (en) | Semiconductor | |
JPS51132985A (en) | Semiconductor device | |
JPS5261956A (en) | Production of semiconductor device | |
JPS51151088A (en) | Manufacturing method of a semiconductor integrated circuit apparatus | |
JPS52143768A (en) | Production of semiconductor device |