JPS57152653A - Wafer processing equipment for ion implanting device - Google Patents
Wafer processing equipment for ion implanting deviceInfo
- Publication number
- JPS57152653A JPS57152653A JP3723181A JP3723181A JPS57152653A JP S57152653 A JPS57152653 A JP S57152653A JP 3723181 A JP3723181 A JP 3723181A JP 3723181 A JP3723181 A JP 3723181A JP S57152653 A JPS57152653 A JP S57152653A
- Authority
- JP
- Japan
- Prior art keywords
- disk
- ion implanting
- chamber
- exchange
- lock chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
Abstract
PURPOSE:To secure the rapid exchange of a disk under vacuum condition by providing a lock chamber with an exchange device, which holds a disk sent from an ion implanting chamber and an exchange disk prepared within the lock chamber simultaneously. CONSTITUTION:A disk 3, to which a number of wafers 4 are fixed so that they can be freely detached, is rotated in a vacuum ion implanting chamber 1 equipped with an ion implanting hole 2 so as to subject the wafers 4 to ion implanting treatment carried out with ion beams introduced into the chamber 1 through the hole 2. A lock chamber 7 is provided with a disk exchange device, which can hold both the disk 3 sent from the chamber 1 and an exchange disk prepared within the lock chamber simultaneously and can be inserted into and withdrawn from the chamber 7 freely. After the above exchange disk is located on a transfer means 10, the disk 3 exhausted through the ion implanting is detached.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3723181A JPS57152653A (en) | 1981-03-17 | 1981-03-17 | Wafer processing equipment for ion implanting device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3723181A JPS57152653A (en) | 1981-03-17 | 1981-03-17 | Wafer processing equipment for ion implanting device |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57088111A Division JPS5816454A (en) | 1982-05-26 | 1982-05-26 | Wafer processing unit in ion implantation device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57152653A true JPS57152653A (en) | 1982-09-21 |
Family
ID=12491827
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3723181A Pending JPS57152653A (en) | 1981-03-17 | 1981-03-17 | Wafer processing equipment for ion implanting device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57152653A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0382552U (en) * | 1989-12-13 | 1991-08-22 | ||
US6330489B1 (en) | 1998-10-21 | 2001-12-11 | Nec Corporation | Magnetic tape apparatus |
-
1981
- 1981-03-17 JP JP3723181A patent/JPS57152653A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0382552U (en) * | 1989-12-13 | 1991-08-22 | ||
US6330489B1 (en) | 1998-10-21 | 2001-12-11 | Nec Corporation | Magnetic tape apparatus |
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