JPS5816454A - Wafer processing unit in ion implantation device - Google Patents

Wafer processing unit in ion implantation device

Info

Publication number
JPS5816454A
JPS5816454A JP57088111A JP8811182A JPS5816454A JP S5816454 A JPS5816454 A JP S5816454A JP 57088111 A JP57088111 A JP 57088111A JP 8811182 A JP8811182 A JP 8811182A JP S5816454 A JPS5816454 A JP S5816454A
Authority
JP
Japan
Prior art keywords
disk
ion implantation
door
chamber
lock chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP57088111A
Other languages
Japanese (ja)
Inventor
Nobuhiro Yoshioka
吉岡 信博
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Nihon Shinku Gijutsu KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc, Nihon Shinku Gijutsu KK filed Critical Ulvac Inc
Priority to JP57088111A priority Critical patent/JPS5816454A/en
Publication of JPS5816454A publication Critical patent/JPS5816454A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/18Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

PURPOSE:To facilitate the disk exchange work and to improve the wafer processing profficiency by providing a disk exchange unit capable of holding a disk which has been implanted with ions and a disk for exhange simultaneously on the door of a lock chamber with varying conditions. CONSTITUTION:A door 12 free of opening and closing is provided to a lock chamber 7 provided on one side of an ion implantation chamber and with its status varied into a vacuum condition or an atmospheric condition facing one side of the disk 3 shifted from the implantation chamber, and a disk 3a for exchange is provided on the other side, then a disk exchange unit 11 free of going in and out of the lock chamber 7 and capable of holding these disks 3, 3a simultaneously is provided on the door 12. The exchange unit 11 is provided with a cylindrical body 14, for instance, which penetrates in hermetic sealing the door 12 provided free of opening and closing at the back of the lock chamber 7, so that the cylindrical body 14 is reciprocated in the axial direction in the lock chamber by means of a fluid cylinder 13 provided outside the door 12. Accordingly, the processing profficiency of wafers can be improved.

Description

【発明の詳細な説明】 本発明はイオン注入装置に於けるウニ八始理装置に関す
る。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an introductory device for an ion implantation device.

出願人社先にこの種イオン注入装置として、複数枚のウ
ニ^を取付けたディスクをイオン注入口を備ええ常時真
空のイオン注入室内で一転させ、該注入口を介して導入
されるイオンビー^によ)骸つニへにイオン注入処理を
行な−、その鋤珊が終ると該ディスクを該注入室からそ
の1傭に設けたゲージパルプを介して真v11状簡と大
気圧状態とに変動する一ツタ璽へとキャ1ツジその他O
#送手段によ゛)移送する弐040を提案したが、処理
を終えたウニ八をそのディスクと共に真空のイオン注入
室内に於−て新九なウニ^を取付轄た交換用ディスクと
交換し得ればイオン注入1[Kこれを大気圧とすること
なく迅速Kl[交換用ディスクを送夛込めてウニ^O#
&lI能串を向上させ得て好tし−。
As an ion implantation device of this type, the applicant company previously developed a system in which a disk to which a plurality of sea urchins were attached was rotated once inside a constantly vacuumed ion implantation chamber equipped with an ion injection port, and ion beams were introduced through the injection port. 2) Perform the ion implantation process into the skeleton, and when the ion implantation process is completed, the disc is changed from the injection chamber to the atmospheric pressure state via a gauge pulp installed in the middle of the injection chamber. One ivy seal and one other o
# We proposed 2040 to be transported by means of transport, but after processing the processed sea urchins were placed in a vacuum ion implantation chamber and replaced with a replacement disk containing a new sea urchin. If obtained, ion implantation 1 [K] can be quickly performed without bringing it to atmospheric pressure.
I like that I can improve my ability.

本実明轄これに遣し九つニ^処運装置を提供するをそO
@的とし九もので、複数枚Oウニ^を着脱自在に取付け
たディスクをイオン注入口を備見え常時真空のイオン注
入室内で一転させて該注入口を介して導入されるイオン
ビー^によシ該つニへにイオン注入処理を行な−、該デ
ィスクを該注入室からその1@に設は九開閉自在のゲー
)パルプを介して真空状態と大気圧状態とに変動するり
ツタ室へと移送する式のものに於て、1IvIツタli
Kこれに送られて来るディスタの1傭に対向して開閉自
在の扉を設けると共にその他側に交換用ディスクを設け
、該−にlamツタ癲内へ出没自在であると共にこれら
ディスクを同時に把持自在のディスク交換装置を設けて
成る。
I am in charge of this matter and will provide nine processing equipment to it.
A disk with multiple O-uni^ removably attached to it is rotated once in a constantly vacuumed ion implantation chamber equipped with an ion injection port, and the ion beams introduced through the injection port are implanted. The ion implantation process is performed on the two, and the disk is transferred from the injection chamber to the ivy chamber, which changes between a vacuum state and an atmospheric pressure state via a pulp (a game machine that can be opened and closed). In the type of transport, 1IvI ivy li
A door that can be opened and closed is provided opposite one of the disks sent there, and a replacement disk is provided on the other side, and the disk can be moved in and out of the laminate, and these disks can be held at the same time. A disk exchange device is provided.

本発明装置01例を図面につ自説明すれば、第111F
iその全体の両断平面図を示すもので、これに11!&
て…は比較的扁平に形成され、真空ポンプで吸引された
常時真空歌劇のイオン注入室、伐)紘鋏注入富(1)内
にイオンビー^を導入するイオン注入口、(3)は傭歇
牧のウェハ(4りが取付けられて11転するディスクを
示し、誼ディスク(3)は例えば第!閣示のように円盤
型に形成され、その鳩縁耐近Kll孔形成した複数個の
円孔(5)K夫夫冑応させて各ウェハ(4)が止め具(
6)により着脱自在に取付けされる。(7)は該イオン
注入富口)01偶に設けた真空状態と大気圧状態とに変
動1れる買ツタ富、(8)祉誼イオン注入室<Uと該−
ツタ室(7)とを連通する比較的長手011口部、(9
)は該開口部(8)を開閉するゲートパルプを示し、前
記ディスク(3)はキャリッジそO他Os送乎毅α・に
よp該璽ツクIK (7)と該イオン注入11(1)と
O聞を往復寥動される。
To explain 01 example of the present invention device with reference to the drawings, the 111F
i This is a double cross-sectional plan view of the whole, and 11! &
(1) is a relatively flat ion implantation chamber that is constantly vacuumed by a vacuum pump; Maki's wafer (shows a disk that rotates 11 times with four rips attached, and the yi disk (3) is formed into a disk shape, for example, as in No. 1! Kakiji, and has a plurality of circles formed with holes near its dovetail edge. Each wafer (4) is fitted with a stopper (
6), it is removably attached. (7) refers to the ion implantation room (8) the ion implantation chamber <U and the −
Relatively long mouth part 011 communicating with the ivy chamber (7), (9
) indicates the gate pulp that opens and closes the opening (8), and the disc (3) is the carriage and other Os sending gate IK (7) and the ion implantation 11 (1). I was moved back and forth between the two.

以上の構成は先KIN案じ九4のと待に員ならな−か、
本発明のものは該ロック富(7)に、該注入室…から移
送されて来るディスク(3301傭に対肉畜せて開閉自
在osaat設けると共にその他側に交換用ディスク(
Ml)を設け、該扉(1,1に該冑ツタ室(7)内へ出
没自在てらると共に辷れもディスク(3) (3m)を
同時・に把持自在のディスクの交換装置aυを設けて真
空状11にある曹ツタ寵(7)内でのディスク(31(
1m) O交換を可能ならしめ、さらK1Inツタ室(
7)への交換用ディスク(S&)の設置と該璽ツタ11
(7)からディスク(3)O取出しが容易となるように
し良。
The above structure must be a member of the previous KIN case 94.
The device of the present invention is equipped with a disk (3301) transferred from the injection chamber (7) that can be opened and closed freely, and a replacement disk (3301) on the other side.
A disc changing device aυ is provided at the door (1, 1) that can freely enter and retract into the helmet room (7) and that can freely grasp the sliding disc (3) (3 m) at the same time. Disk (31 (
1m) to enable O exchange, and then install the K1In ivy chamber (
7) Installation of the replacement disk (S&) and the ivy 11
It should be possible to easily remove the disk (3) from (7).

これをさらに詳述するに該交換装置αυは例えば纂5図
示のように該ロック富(7)の背後に設けた闘閉自在a
y@口を気密に挿通する筒体軸を備え、腋筒体14が該
s (13O外部に設は大空気その他の流体シリンダ0
によ)その軸方向に往復動されるとその先端部にmsに
間隔を存して2連に設は丸側画形状が略8字形の起伏爪
片aう(ハ)が該ロツタ寵内を往復動するようKしえ、
また該筒体114)内にはピストン舖が設けられ、これ
が空気その他の流体圧力によ〕往復動されるとそのビス
シン胃ツドt?10先端の係合電輪が往復動して前記起
伏爪片Li1uts關し九ディスク把持状鯵と細小し九
1m状態とに一斉に作動する。 aSoは!傭1組の取
付部材で、筒体a4の先端部には例えにそ04組が@4
11示の如く等間隔で設けられるようKL、各組Kti
支軸翰で揺動自在に支承され大起伏爪片■が前後に2偏
設けられ、全体として前方と後方とに夫々4個ずつの起
伏爪片(IIを有するようにし友、交換用ディスク(i
a)は冒ツタII (’iF)の奥部に板にねその他の
係止部材(2)によ〕該意向に脱落せずしかもその前方
取外し得るように保持され、この場合該ディスク(6&
)はこれに形成し九中心孔(2)が筒体a40軸線上に
合致するようにして配置される。
To explain this in more detail, the exchange device αυ is, for example, a removable a.
The axillary cylinder body 14 is equipped with a cylinder shaft that airtightly passes through the mouth.
2) When reciprocated in the axial direction, the undulating claws (a) and (c), which are approximately figure 8-shaped on the round side, are set in two rows at the tip with an interval of ms, and the undulating claws (a) and (c) are placed in the rotor's center. Make it move back and forth,
A piston is provided within the cylinder 114), and when this piston is reciprocated by the pressure of air or other fluid, the piston t? The engagement electric wheels at the tips of 10 reciprocate and operate simultaneously between the 9-disc gripping state and the 91-m state in relation to the undulating claw pieces Li1uts. aSo! For example, one set of mounting members is attached to the tip of the cylinder a4.
KL and each set Kti are arranged at equal intervals as shown in 11.
It is swingably supported by a support shaft, and two large undulating claw pieces (■) are provided at the front and rear, and the front and rear sides each have four undulating claw pieces (II). i
a) is held in the inner part of the adventurer II ('iF) by a plate or other locking member (2) in such a way that it will not fall off and can be removed from the front; in this case, the disc (6 &
) is formed in this and arranged so that the nine-center hole (2) coincides with the axis of the cylindrical body a40.

イオン注入1!+11と胃ツク寵(7)との間にディス
ク(3)を移送する手段−は籐2図及び第S図に明らか
なようにディスク保持装置0を備え大略方形の囲枠状フ
レーム(2)にて構成され、さらに腋ディスク保持装置
(ハ)は例えば該7レー^−〇四隅の該ディスク(3)
の端縁を支える支片(ハ)とばね(2)によ)弾発され
て突出して該ディスク(310両面を支える先端2叉状
のり−ラ(財)とから成シ、該−−ラrnはその背後に
接続し九ワイヤ(2)が7レー^@4o左右に設けえレ
バー@によ〕引かれると鋏ばね(至)K抗して没入し、
かくて該7レー^(2)からディスク(3)を取外し或
は交換用ディスク(1荀を塔職することが許容される。
Ion implantation 1! The means for transporting the disk (3) between +11 and the stomach tube (7) is a generally rectangular surrounding frame (2) equipped with a disk holding device 0, as shown in Figure 2 and Figure S. Furthermore, the axillary disk holding device (c) is configured by, for example, the disks (3) at the four corners of the seven lanes.
It consists of a support piece (C) that supports the edge of the disc (310) and a two-pronged glue-la at the tip (310) that is elastically protruded by a spring (2) and supports both sides of the disc (310). rn is connected behind it, and when the 9 wires (2) are pulled by the levers provided on the left and right of the 7 wires, the scissors spring (to) is immersed against K.
Thus, it is permissible to remove the disc (3) from the 7-ray (2) or to use a replacement disc (1x).

誼レバー@(2)はイオン注入11(1)或紘田ツタ璽
(7)のディスク着脱位置Kl1手段αGが停止しえと
き各室+1)(7)のIi1%方から出没するシリンダ
OI■によ勤押されて作動するもので、この際該手段a
鳴を不動とすべ(各1! (11(7)に出没自在の窒
ツクピンロυe珍が設けられる。tた#フレーム(財)
の1側にはラック@が取付けられ、これにタイ竜ングベ
ルト(至)その他によシ互(同期回転する各基(l)(
))内の歯車軸が絞合すると該手段a・は各m1(11
(7)K夫々設けられたレールaS#s上を車輪(至)
て走行する。
The lever @ (2) is the cylinder OI that comes out and retracts from the Ii1% side of each chamber +1) (7) when the disk attachment/detachment position Kl1 means αG of the ion implantation 11 (1) or the Hirota Tsuta Seal (7) can be stopped. It is activated by being pressed by a
The sound is immovable (1 each! (11 (7) has a Nitsukupinro υechin that can appear at will.
A rack @ is attached to one side of the rack, and a rack is attached to this rack with a tie-ring belt (to) and other parts (each unit (l) that rotates synchronously).
)) When the gear shafts in
(7) Wheels on the rails aS#s provided for each K (towards)
drive.

(ロ)はイオン注入室(鳳)内KMて電動機(至)によ
シへ 左右動する密閉容器を示し、該容器(ロ)内に骸移送手
段a・からディスク(31を把んで取外すために出没自
在で参ると共に該ディスク(3)に回転を与えるぺ<a
転自在O出没回転装置(至)が収容され、該容−@O左
右動とa出没−板装置(至)の回転とで該ディスク(3
1の各ウニ八(4)KM−にイオンビー^が注入される
ようにし九、−一はゲートパルプ(9)を−口部(8)
 OIII方に案内する案内レール、41111は該バ
ルブ(9)をllI關口It(和に圧接してこれを密閉
する大めのシリンダである。
(b) shows a closed container that moves left and right in the ion implantation chamber (O) by an electric motor (to); A disk (3) that can appear and appear at will and rotates the disk (3).
A rotatable O-extending and retracting rotation device (to) is housed, and the disc (3
Inject the ion beam into each sea urchin 8 (4) KM- of 1, and 9, -1 inject the gate pulp (9) into the -mouth part (8).
The guide rail 41111 that guides the valve (9) in the OIII direction is a large cylinder that presses the valve (9) against it to seal it.

そO作動を説明するに、真空のイオン注入室(至)の回
転とで該装置(至)が把持するディスク(3)のウニ^
(4)K均等にイオンビー^が注入され、そのイオン注
入処理が終ると該ディスク(3)Fi骸装置I(至)に
より移送手段α(IK塔載される。該移送手W1as 
gゲートパルプ(9)の開いえ開口部(8)を介して真
空化された田ツタ11())内に移動する。基型(7)
内にはそO奥部に予め交換用ディスクe&)が用意され
てお〉、該手段αGがその前方に停止するとディスク交
換装置■がシリンダα3&eストンa・O作JIKよ)
起伏爪片側を伏せて突出し、前方のディスク(33及び
交換用ディスク(S&)の各中心孔(2)内へと突入す
る。このあと前記ピストンaSを逆作動させれば2連O
起伏爪片as #E 44 f 4 X ? (8) 
(lla) 0 中<p孔@輪内に11にて一斉に起立
し、両ディスタは同時に把持畜れる。さらKll送手段
I・Oディスク保持装置(至)を解除し、シリンダnを
伸長さぜると交換用ディスク(i a)をS過手段aθ
O位置に移動出来ると共にディスク(3)が該手段al
から取外され″′C璽ツタ室(7)の扉−〇直前O位筐
に移動畜れ、前記ディスク保持装置@會作動して交換用
ディスク(1a)を移送手段aQ上に−保し大のちビス
)ン(Ieを逆作動させて起伏爪片(ハ)を伏せ、さら
にシリンダ0を伸長作動すれげ該爪片(lSは交換用デ
ィスク(5a)から抜けgiWJ示のようになる。gち
移送手段a・上に交換用ディスク(50が塔載され、イ
オン注入の終えたディスク(3)が取外される。
To explain the operation, the rotation of the vacuum ion implantation chamber (end) causes the rotation of the disk (3) held by the device (end).
(4) Ion beams are injected evenly into K, and when the ion implantation process is completed, the disk (3) is transferred to the transfer means α (IK tower) by the Fi shell device I.
g through the open opening (8) of the gate pulp (9) into the evacuated ivy 11 ()). Base mold (7)
Inside, a replacement disk (e&) is prepared in advance at the back of the cylinder (O), and when the means αG stops in front of it, the disk exchange device (■) is inserted into the cylinder α3 & e stone a/O (by JIK).
The undulating claw protrudes with one side facing down, and plunges into each center hole (2) of the front disk (33) and the replacement disk (S&).After this, if the piston aS is reversely operated, the double O
Relief claw piece as #E 44 f 4 X? (8)
(lla) 0 Middle < p hole @ Stand up all at once in the ring at 11, and both distas are grasped at the same time. Furthermore, when the Kll feeding means I/O disk holding device (to) is released and the cylinder n is extended, the replacement disk (i a) is moved to the S passing means aθ.
The disk (3) can be moved to the O position and the means al
The disk is removed from the ivy chamber (7) and moved to the O cabinet just before the door of the ivy chamber (7), and the disk holding device is operated to hold the replacement disk (1a) on the transfer means aQ. Afterwards, the screw (Ie) is reversely operated to turn the undulating claw piece (c) upside down, and the cylinder 0 is further extended and the claw piece (lS) is removed from the replacement disk (5a) and becomes as shown in giWJ. A replacement disk (50) is mounted on the transfer means (a), and the disk (3) after ion implantation is removed.

該移送乎Ha・は交換用ディスク(3a)を塔載してこ
れにイオン注入すべくイオン注入1[111へとj!〕
、ゲートパルプ(9)が閉じるとロック属(7)を−大
気圧としてこれの扉0を開きイオン注入の終ええディス
ク(3)を取出すと共に新たに交換用ディスクかロック
富(7)0$111に用意されるelE扉11は例えに
−書を中心として胃ツク1! (7)から離れ備KNか
れるが、そO開扉に際してはイオン注入済みのディスク
13」が該扉a3に設けたディスク交換装置11)K掛
けられてリッタ璽(7)外へと取出され、交換作業が容
易となる。ディスタO交I11か終るとl[vツタII
 (’F)の扉Iを閉じ真空化されて再びイオン注入室
(1)からディスタが送られて来るのを待つ。
The transfer is to ion implantation 1 [111] to mount the replacement disk (3a) and implant ions into it. ]
When the gate pulp (9) is closed, the lock (7) is set to -atmospheric pressure, and the door 0 is opened to finish the ion implantation and the disk (3) is taken out, and a new replacement disk or lock wealth (7) 0 is inserted. The elE door 11 prepared for 111 is, for example, a stomach tsuke 1 centered on books! (7), but when the door is opened, the ion-implanted disk 13 is hung on the disk exchange device 11) installed in the door a3 and taken out of the liter seal (7). Replacement work becomes easier. When dista o cross I11 ends l [v ivy II
Close the door I of ('F) to create a vacuum and wait for the distar to be sent from the ion implantation chamber (1) again.

このように本発明によるときはイオン注入室口)の11
aに設は九真空状鯵と大気圧状態とに変動する田ツタ室
の開閉自在の扉にイオン注入済のディスクと交換用ディ
スクとを同時に把持自在のディスク交換装置を設けたの
で扉を開くと同時にディスクを讐ツタ寥外に取出し得、
ディスク交換作業が容易で短時間に行なえるのでウニ^
の処理能率を向上させ得る等の効果がある。
In this way, according to the present invention, 11 of the ion implantation chamber entrance)
In a, we installed a disk exchange device that can freely hold the ion-implanted disk and the replacement disk at the same time on the openable door of the Tatsuta room, which changes between vacuum state and atmospheric pressure, so the door can be opened. At the same time, the disk can be taken out of the enemy's possession,
I love that the disk replacement work is easy and can be done in a short time.
This has the effect of improving processing efficiency.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図線本発明装置の1例の裁断平面図、第21!Iは
七のn−u線両断側W図、第511i1Jは第1図のm
−m5拡大断面図、第4図はそtvTV −TV線断面
図、第!1図は1g2図の一部拡大断面図、第411t
;を第2図のVI−Vl線部分の拡大断面図である。 (1)・・・イオン注入室 (21・・・イオン注入口 (31・・・ディスク Ql a)・・・交換用ディスタ (4)−・・ウ エ ^ (7)・・・田ツタ室 (9)・・・ゲートパルプ 帥・・・移送手段 6υ・・・ディスク交換装置 aり・・・扉 外2名
Fig. 1 is a cutting plan view of an example of the device of the present invention, No. 21! 511i1J is m in Figure 1.
-m5 enlarged sectional view, Figure 4 is tvTV -TV line sectional view, Figure 4! Figure 1 is a partially enlarged sectional view of Figure 1g2, No. 411t
is an enlarged cross-sectional view taken along line VI-Vl in FIG. 2; (1)...Ion implantation chamber (21...Ion injection port (31...Disk Qla)...Replacement disk (4)--Ue ^ (7)...Tatsuta chamber (9)...Gate pulp commander...Transfer means 6υ...Disc exchange device a...2 people outside the door

Claims (1)

【特許請求の範囲】[Claims] II&牧のウニ^を着脱自在に取付けたディスクをイオ
ン注入口を備え九電時真空Oイオン注入璽内で回転させ
て該注入口を介して導入される、イオンビー^によjl
lllllウニへン注入処理を行な−、骸ディスクを該
注入室からその1個に毅けえ開閉自在のダー)パルプを
介して真空状s2大気圧伏蒙とに変動する田ツク富へと
移送する式のものに凝て、該胃ツタl[K、これKll
られて来るディスクの1側に対向して開閉自在OSt段
けると共にその他備に交換用ディスクを設け、諌−に該
四ツタ寵内へ出没自在であると共にこれらディスクを同
時に把持自在のディスク交換装置を設けて成るイオン注
入装置。
II &Maki's Uni^ is removably attached to the disc, which is equipped with an ion injection port and is rotated in a vacuum O ion implantation chamber, and the ion beam is introduced through the injection port.
After performing the sea urchin injection process, the Mukuro disk is transferred from the injection chamber to one of the disks through the pulp, which can be opened and closed, to the Tatsuku Tomi, which fluctuates to a vacuum state and atmospheric pressure. I was fixated on things that could be transported, and I thought,
A disk changing device which has an OSt stage that can be opened and closed facing one side of the disks that are coming in, and has a disk for replacement on the other side, and can freely move in and out of the four-sided space and can hold these disks at the same time. An ion implantation device comprising:
JP57088111A 1982-05-26 1982-05-26 Wafer processing unit in ion implantation device Pending JPS5816454A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57088111A JPS5816454A (en) 1982-05-26 1982-05-26 Wafer processing unit in ion implantation device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57088111A JPS5816454A (en) 1982-05-26 1982-05-26 Wafer processing unit in ion implantation device

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP3723181A Division JPS57152653A (en) 1981-03-17 1981-03-17 Wafer processing equipment for ion implanting device

Publications (1)

Publication Number Publication Date
JPS5816454A true JPS5816454A (en) 1983-01-31

Family

ID=13933768

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57088111A Pending JPS5816454A (en) 1982-05-26 1982-05-26 Wafer processing unit in ion implantation device

Country Status (1)

Country Link
JP (1) JPS5816454A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103268850A (en) * 2013-05-03 2013-08-28 中国电子科技集团公司第四十八研究所 Solar battery piece ion implanter

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103268850A (en) * 2013-05-03 2013-08-28 中国电子科技集团公司第四十八研究所 Solar battery piece ion implanter
CN103268850B (en) * 2013-05-03 2015-09-02 中国电子科技集团公司第四十八研究所 A kind of solar battery sheet ion implantor

Similar Documents

Publication Publication Date Title
US4932160A (en) Closure apparatus and method
EP0591706B1 (en) Chamber for transport of substrates
TWI338325B (en) Apparatus and method for cleaning and drying a container for semiconductor workpieces
JP4921741B2 (en) Vacuum interface between mini-environment pod and device
US4278380A (en) Lock and elevator arrangement for loading workpieces into the work chamber of an electron beam lithography system
JPS5816454A (en) Wafer processing unit in ion implantation device
CN110283701A (en) A kind of warm-blooded animal extracting genome DNA equipment
US9393600B2 (en) Machine for washing objects and method for the hydraulic and mechanical connection of a trolley carrying objects to be washed to a feed circuit of a washing liquid for a machine for washing objects
DE4235677A1 (en) Chamber for transport of components in a vacuum processing installation - with at least one radially movable transport unit mounted separately from rotatable component carriers.
US2531065A (en) Apparatus for changing the ion source of a cyclotron
JPS63190338A (en) Holder supplying device
KR101687911B1 (en) A door clamp apparatus of a chamber
CN208446305U (en) A kind of agricultural cultivation tissue culture bactericidal unit
JPS6224502B2 (en)
JPS61173445A (en) Wafer transport device of ion implanting device
CN217622308U (en) Carbon fiber material preparation autoclave
JPS6257377B2 (en)
CN109230762A (en) A kind of paper discharge apparatus and its application method
CN109318325A (en) A kind of wood impregnation method and the device for implementing this method
JPS6367745B2 (en)
CN108438472A (en) A kind of urological department Saving specimen device
CN217322335U (en) Cold chain package irradiation killing device
CN220441722U (en) Animal choking device
JPH08138615A (en) Ion implantation device and its exhaust method
CN114569773B (en) High-temperature high-pressure sterilization device and control mechanism for high-temperature high-pressure sterilization