JPS6224502B2 - - Google Patents

Info

Publication number
JPS6224502B2
JPS6224502B2 JP58051253A JP5125383A JPS6224502B2 JP S6224502 B2 JPS6224502 B2 JP S6224502B2 JP 58051253 A JP58051253 A JP 58051253A JP 5125383 A JP5125383 A JP 5125383A JP S6224502 B2 JPS6224502 B2 JP S6224502B2
Authority
JP
Japan
Prior art keywords
vacuum
tank
sample
vacuum chamber
holding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58051253A
Other languages
Japanese (ja)
Other versions
JPS59177367A (en
Inventor
Hiroshi Saeki
Tanejiro Ikeda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP5125383A priority Critical patent/JPS59177367A/en
Publication of JPS59177367A publication Critical patent/JPS59177367A/en
Publication of JPS6224502B2 publication Critical patent/JPS6224502B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Description

【発明の詳細な説明】 産業上の利用分野 本発明は常時真空吸引された真空蒸着槽に試料
を出し入れするための試料搬送機構を備えた真空
蒸着装置に関するものである。この装置によれ
ば、第1図に示した円筒加工物の円周面A、及び
第2図に示した角形加工物の面B,C,D,Eな
どのように、装置(治具)への挿着に用いられる
加工物の軸孔Hを囲む面に真空蒸着処理を施すこ
とができる。
DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a vacuum evaporation apparatus equipped with a sample transport mechanism for transporting a sample into and out of a vacuum evaporation tank that is constantly vacuumed. According to this device, the device (jig) A vacuum deposition process can be performed on the surface surrounding the shaft hole H of the workpiece used for insertion into the workpiece.

従来の構成とその問題点 従来の真空蒸着装置は、第3図及び第4図にそ
の具体例を示すように、架台1上に、真空排気装
置2に接続された真空槽3を設置し、この槽3の
内部には蒸発源4を備え、外側部には試料5を回
転させるための回転導入機6及びその駆動源であ
るモータ7を付設したものである。回転導入機6
の出力軸8には試料5を固定するための治具9が
設けられている。一方、真空槽3の頂部には昇降
機10により昇降するトツププレート10aが設
けられ、その開放(上昇)時において試料5を出
し入れできるようになつている。
Conventional configuration and its problems In the conventional vacuum evaporation apparatus, as shown in FIGS. 3 and 4, a vacuum chamber 3 connected to a vacuum evacuation device 2 is installed on a pedestal 1. An evaporation source 4 is provided inside the tank 3, and a rotation introducing device 6 for rotating the sample 5 and a motor 7 as its driving source are attached to the outside. Rotating introduction machine 6
A jig 9 for fixing the sample 5 is provided on the output shaft 8 of. On the other hand, a top plate 10a that is raised and lowered by an elevator 10 is provided at the top of the vacuum chamber 3, and the sample 5 can be taken in and taken out when the top plate 10a is opened (raised).

この装置において真空蒸着を行う際は、試料5
を出力軸8にはめた上治具9で固定し、昇降機9
によりトツププレート10aを真空槽3に密着さ
せた後、この槽内を真空排気装置2によつて真空
吸引し、所定の真空度に達した後、蒸発源4を作
動させて真空蒸着を行う。真空蒸着完了後は、真
空槽3内を大気に対して開放し、昇降機10によ
りトツププレート10aを上昇させて試料5を取
り出す。
When performing vacuum evaporation with this device, sample 5
is fixed with the upper jig 9 fitted on the output shaft 8, and the elevator 9
After the top plate 10a is brought into close contact with the vacuum chamber 3, the inside of the chamber is evacuated by the vacuum evacuation device 2, and after reaching a predetermined degree of vacuum, the evaporation source 4 is activated to perform vacuum evaporation. After the vacuum deposition is completed, the inside of the vacuum chamber 3 is opened to the atmosphere, the top plate 10a is raised by the elevator 10, and the sample 5 is taken out.

しかし、上記のような構成では、試料の入れ替
えのためにその都度真空槽内を大気開放しなけれ
ばならず、再び蒸着処理可能な真空度に到達させ
るには時間がかかりすぎ、しかも一度に多量の材
料の処理ができないため生産性の向上が図れない
という欠点を有していた。
However, with the above configuration, it is necessary to open the vacuum chamber to the atmosphere each time the sample is replaced, and it takes too much time to reach a vacuum level that is suitable for vapor deposition again. This method had the disadvantage that it was not possible to improve productivity because it could not process many materials.

発明の目的 本発明は上記欠点に鑑み、試料の入れ替えに伴
う真空引き時間を大幅に削減し、また真空槽内で
の試料個々の移載なくして一度に多量の試料の蒸
着処理を可能とする試料搬送機構を備えた真空蒸
着装置を提供しようとするものである。
Purpose of the Invention In view of the above-mentioned drawbacks, the present invention significantly reduces the evacuation time associated with sample replacement, and also enables vapor deposition processing of a large amount of samples at once without transferring individual samples in a vacuum chamber. The present invention aims to provide a vacuum evaporation apparatus equipped with a sample transport mechanism.

発明の構成 本発明の真空蒸着装置は、 a 真空排気装置に接続されており、内部に真空
蒸着処理を行うための蒸発源を有する真空蒸着
槽と、 b 試料入れ替え用扉を備え、かつ真空排気装置
に接続されており、内部を真空状態及び大気圧
状態にすることができる予備真空槽と、 c 前記真空蒸着槽及び前記予備真空槽を連結す
る気密管路であつて両槽間を開閉するための遮
断機構を有する管路部と、 d 前記真空蒸着槽から前記管路部、及び前記管
路部から前記予備真空槽に到る直線ガイド機構
と、 e 前記直線ガイド機構上において摺動すること
ができる少くとも2個の試料保持ユニツトと、 f 前記予備真空槽内において、前記少くとも2
個の保持ユニツトのうちの1個を前記直線ガイ
ド上で摺動しうる動作位置に、残りの保持ユニ
ツトを待機位置に順次持たらすためのユニツト
準備機構、及び g 前記動作位置に持たらされた試料保持ユニツ
トを前記予備真空槽から前記真空蒸着槽に送り
込み、かつ逆戻しするための往復チヤツク機
構、 を備え、前記真空蒸着槽に外部回転動力を槽内
に導びくための回転導入機を設けると共に、前記
試料保持ユニツトに複数個の試料を回転自在に保
持する保持回転部、及び前記保持回転部を前記回
転導入機の出力端に接続する接続部とを設けたこ
とを特徴とするものである。
Composition of the Invention The vacuum evaporation apparatus of the present invention includes: a) a vacuum evaporation tank connected to a vacuum evacuation device and having an evaporation source therein for performing vacuum evaporation; b) a sample exchange door, and a vacuum evaporator a preliminary vacuum chamber that is connected to the apparatus and capable of bringing the inside to a vacuum state and an atmospheric pressure state; c. an airtight conduit that connects the vacuum evaporation chamber and the preliminary vacuum chamber and opens and closes between the two chambers; d) a linear guide mechanism extending from the vacuum deposition tank to the duct, and from the duct to the preliminary vacuum tank; e) sliding on the linear guide mechanism; at least two sample holding units capable of holding the sample; and f in the preliminary vacuum chamber, at least two
a unit preparation mechanism for sequentially bringing one of the holding units into an operating position where it can slide on the linear guide and the remaining holding units into a standby position; A reciprocating chuck mechanism for sending the sample holding unit from the preliminary vacuum chamber to the vacuum deposition tank and back, and providing the vacuum deposition tank with a rotation introduction machine for guiding external rotational power into the tank. In addition, the sample holding unit is provided with a holding/rotating part for rotatably holding a plurality of samples, and a connecting part for connecting the holding/rotating part to the output end of the rotation introducing machine. be.

従つて、一つの保持ユニツトにより真空蒸着槽
内に配置した複数個の試料を真空蒸着する間に、
予備真空槽内において蒸着済み試料を新たな試料
と交換しておき、蒸着処理終了時には両槽の真空
度を維持したままその蒸着槽内の試料保持ユニツ
トを交換し、この後、従来のように真空引きを行
うことなく、新たな試料について直ちに蒸着処理
工程に入ることができる。
Therefore, while vacuum evaporating multiple samples placed in a vacuum evaporation tank using one holding unit,
The sample that has been evaporated is replaced with a new sample in the preliminary vacuum chamber, and when the evaporation process is completed, the sample holding unit in the evaporation chamber is replaced while maintaining the degree of vacuum in both chambers. The vapor deposition process can be started immediately on a new sample without evacuation.

また、真空槽内での試料個々の移し替えなくし
て搬送保持ユニツトに保持された状態で一度に複
数個の試料への均一な蒸着膜形成が可能である。
Further, it is possible to form a uniform vapor deposition film on a plurality of samples at a time while the samples are held in a conveyance/holding unit without having to transfer each sample individually within a vacuum chamber.

実施例の説明 以下、本発明の実施例につき、図面を参照して
説明する。
DESCRIPTION OF EMBODIMENTS Hereinafter, embodiments of the present invention will be described with reference to the drawings.

第5図及び第6図は、本発明に従つて構成され
た試料搬送機構を有する真空蒸着装置の平面及び
部分破断正面をそれぞれ示している。この真空蒸
着装置において、蒸着用真空槽12、管路部2
3、管路部23により前記真空槽12に連結され
た予備真空槽34、及びチヤツク駆動用エアシリ
ンダ36が順次第5図及び第6図の右から左にか
けて直列的に配置されている。
5 and 6 show a plan view and a partially cutaway front view, respectively, of a vacuum deposition apparatus having a sample transport mechanism constructed in accordance with the present invention. In this vacuum evaporation apparatus, a vacuum chamber 12 for evaporation, a pipe section 2
3. A preliminary vacuum tank 34 connected to the vacuum tank 12 through a conduit 23 and a chuck driving air cylinder 36 are arranged in series from right to left in FIGS. 5 and 6.

真空槽12は、真空排気装置53を有する架台
54に設置されて真空引きされるようになつてい
るとともに、内部に蒸発源11を備えている。真
空槽12の右端壁部には回転導入機13、及びベ
ルト14を介してこの導入機を駆動するモータ1
5が固定されている。槽12内には管路部23内
から右端の支持ブロツク21,22に架設された
一対の広幅レール16,17と、これらの内側に
おいて前記管路部23内から槽12の蒸発源11
の手前まで延びる一対のレール18,19からな
る直線ガイド機構20が設置される。また、外側
レールの一方16には槽外のエアシリンダ24に
より駆動されるチヤツク解除機構25が係合して
いる。
The vacuum chamber 12 is installed on a pedestal 54 having an evacuation device 53 to be evacuated, and is provided with an evaporation source 11 inside. On the right end wall of the vacuum chamber 12, there is a rotating introduction device 13 and a motor 1 that drives this introduction device via a belt 14.
5 is fixed. Inside the tank 12, a pair of wide rails 16, 17 are installed from inside the pipe section 23 to the right end support blocks 21, 22, and inside these, the evaporation source 11 of the tank 12 is installed from inside the pipe section 23.
A linear guide mechanism 20 consisting of a pair of rails 18 and 19 that extends to the front side is installed. Further, a chuck release mechanism 25 driven by an air cylinder 24 outside the tank is engaged with one of the outer rails 16.

管路部23は槽12及び34を連絡する気密管
路からなり、エアシリンダ26により管外から駆
動される遮断機構27が配置され、その“閉”位
置において槽12,34間を気密遮断するもので
ある。また、管路部23内において遮断機構27
の左側には前記直線ガイド機構20の各レールに
対応する外側レール28,29及び内側レール3
0,31からなる第2の直線ガイド機構32が、
真空槽34の管路23側における部分フランジ3
3上に設置される。
The pipe section 23 consists of an airtight pipe connecting the tanks 12 and 34, and is provided with a shutoff mechanism 27 driven from outside the pipe by an air cylinder 26, which airtightly isolates the tanks 12 and 34 in its "closed" position. It is something. In addition, a blocking mechanism 27 is provided within the conduit section 23.
On the left side are outer rails 28 and 29 and an inner rail 3 corresponding to each rail of the linear guide mechanism 20.
The second linear guide mechanism 32 consisting of 0,31,
Partial flange 3 on the pipe line 23 side of the vacuum chamber 34
3.

真空槽34の左端、すなわち管路部23の反対
側にはチヤツク35をこの槽内において管路方向
に往復駆動するためのエアシリンダ36が突設さ
れる。槽34内において、試料37を保持するユ
ニツト38及び39はそれぞれ一対の上側レール
40,41及び下側レール42,43上に載置さ
れるようになつており、これらのレールはエレベ
ータ44により、前記直線ガイド機構32と同一
レベルに設定されたとき、そのガイド機構の外側
レール28,29と完全に対応するようになつて
いる。エレベータ44は真空槽34内に設置され
たスタンド45,46に固定されている垂直ガイ
ド47,48に沿つて昇降するように、エアシリ
ンダ49に駆動される。エアシリンダ49は真空
槽34の下側に固定される。チヤツク35は前記
ガイド機構と整合したレール40,41又は4
2,43上のユニツト38又は39の後端(図の
左端)を把持するが、槽34の左端に設けられた
解除ブロツク50はそれらレール上におけるチヤ
ツク35の把持解除を行うものである。
An air cylinder 36 is protruded from the left end of the vacuum chamber 34, that is, on the opposite side of the conduit section 23, for driving the chuck 35 back and forth in the direction of the conduit within the chamber. Inside the tank 34, the units 38 and 39 holding the sample 37 are placed on a pair of upper rails 40, 41 and a pair of lower rails 42, 43, respectively, and these rails are moved by an elevator 44. When set at the same level as the linear guide mechanism 32, it is adapted to perfectly correspond to the outer rails 28, 29 of that guide mechanism. The elevator 44 is driven by an air cylinder 49 to move up and down along vertical guides 47 and 48 fixed to stands 45 and 46 installed in the vacuum chamber 34. The air cylinder 49 is fixed to the lower side of the vacuum chamber 34. The chuck 35 has rails 40, 41 or 4 aligned with the guide mechanism.
A release block 50 provided at the left end of the tank 34 releases the chuck 35 from the rails.

真空槽34のトツププレート51は第2のエレ
ベータ52により昇降移動する。
The top plate 51 of the vacuum chamber 34 is moved up and down by a second elevator 52.

真空槽34はこれに接続された真空排気装置5
5を保持した架台56上に設置される。架台56
には装置全体を制御する制御装置56aが設置さ
れるとともに、エアシリンダ36のための支持板
57が取付けられる。
The vacuum chamber 34 has a vacuum exhaust device 5 connected thereto.
It is installed on a pedestal 56 that holds 5. Frame 56
A control device 56a for controlling the entire device is installed at the holder, and a support plate 57 for the air cylinder 36 is attached.

保持ユニツト38,39の先端にはそれぞれ接
続具58,59が固定されており、回転導入機1
3における出力軸60の先端に取りつけられた接
続具61とかみ合うようになつている。
Connectors 58 and 59 are fixed to the tips of the holding units 38 and 39, respectively, and the rotation introduction machine 1
It is adapted to mesh with a connecting tool 61 attached to the tip of the output shaft 60 at No. 3.

以上で装置の概略を説明したので、次にその動
作を説明する。
Now that the outline of the device has been explained above, its operation will be explained next.

まず、トツププレート51が上昇した“開”位
置にあるものとして、取出したユニツト38,3
9に試料37を固定し、エレベータ44上に置
く。ここでエレベータ44を例えば第6図のレベ
ルまで下降させるとともに、第2のエレベータ5
2によりトツププレート51を下降させて真空槽
34を密閉した後、真空排気装置55で真空引き
を行う。
First, assuming that the top plate 51 is in the raised "open" position, the units 38 and 3 taken out are
The sample 37 is fixed to the holder 9 and placed on the elevator 44. Here, the elevator 44 is lowered to the level shown in FIG. 6, for example, and the second elevator 5
2, the top plate 51 is lowered to seal the vacuum chamber 34, and then the evacuation device 55 evacuates it.

一方、真空槽12内は、真空排気装置53によ
りあらかじめ所定の真空度まで真空引きされてい
るとともに、遮断機構27により管路部23が遮
断されているものとする。そこで、真空槽34が
所定の真空度に達すると、蒸発源11を作動さ
せ、遮断機構27を解除して管路23を開く。同
時にエアシリンダ36を駆動して先端のチヤツク
35によりユニツト38を把持し、これを直線ガ
イド機構32,20に沿つて真空槽12内の蒸発
源11上に移動させる。この時、ユニツト先端の
接続具58が回転導入機の接続具61とかみ合
い、モータ15を回転させることにより試料37
を回転させる。チヤツク35はチヤツク解除機構
25に付勢されてユニツト38を解放し、直線ガ
イド機構の内側レール18,19、及び30,3
1に沿つて真空槽34内にもどる。ここで遮断機
構27により管路23を遮断し、真空槽12内に
おいて真空蒸着を行う。
On the other hand, it is assumed that the inside of the vacuum chamber 12 is evacuated in advance to a predetermined degree of vacuum by the evacuation device 53, and the conduit section 23 is cut off by the cutoff mechanism 27. Therefore, when the vacuum chamber 34 reaches a predetermined degree of vacuum, the evaporation source 11 is activated, the shutoff mechanism 27 is released, and the conduit 23 is opened. At the same time, the air cylinder 36 is driven to grip the unit 38 by the chuck 35 at its tip and move it along the linear guide mechanisms 32, 20 onto the evaporation source 11 in the vacuum chamber 12. At this time, the connecting tool 58 at the tip of the unit engages with the connecting tool 61 of the rotation introducing machine, and by rotating the motor 15, the sample 37
Rotate. The chuck 35 is biased by the chuck release mechanism 25 to release the unit 38 and release the inner rails 18, 19 and 30, 3 of the linear guide mechanism.
1 and return inside the vacuum chamber 34. Here, the pipeline 23 is shut off by the shutoff mechanism 27, and vacuum evaporation is performed in the vacuum chamber 12.

真空蒸着が完了すると、遮断機構27を解除し
て管路23を開放し、チヤツク35を再び真空槽
12まで前進させてユニツト38を把持させ、真
空槽34にもどしてこれをエレベータ49に搬入
する。この時、チヤツク35は解除ブロツク50
によりユニツト38を解放する。
When the vacuum deposition is completed, the shutoff mechanism 27 is released to open the pipeline 23, and the chuck 35 is advanced again to the vacuum chamber 12 to grasp the unit 38, returned to the vacuum chamber 34, and carried into the elevator 49. . At this time, the check 35 is released by the release block 50.
to release the unit 38.

次にエレベータ49がユニツト39を直線ガイ
ド機構32に沿つて搬出できる位置まで上昇し、
再びチヤツク35によりユニツト38の場合と同
様にこの新たなユニツト39を真空槽12内に搬
送し、真空蒸着を行う。この間遮断機構27によ
り管路23が塞れているので真空槽34を大気に
対し開放し、トツププレート51を上昇させてユ
ニツト38の試料を交換する。そして再びユニツ
ト38をエレベータ49上に置き、真空槽34内
を再び真空引きし、前記したとおりの工程を実施
する。以下、このような動作がユニツト38,3
9について交互に繰返される。
Next, the elevator 49 rises to a position where the unit 39 can be carried out along the linear guide mechanism 32, and
This new unit 39 is transported again into the vacuum chamber 12 by the chuck 35 in the same manner as the unit 38, and vacuum evaporation is performed. During this time, since the conduit 23 is blocked by the shutoff mechanism 27, the vacuum chamber 34 is opened to the atmosphere, the top plate 51 is raised, and the sample in the unit 38 is replaced. Then, the unit 38 is placed on the elevator 49 again, the inside of the vacuum chamber 34 is evacuated again, and the process described above is carried out. Hereinafter, such an operation will be performed in units 38 and 3.
Repeated alternately for 9.

以上が本実施例の概略であるが、次に各部の構
造及び機能の詳細を説明する。
The above is an outline of the present embodiment, and next, details of the structure and function of each part will be explained.

回転導入機13の出力軸60先端における接続
具61は第7図及び第8図に示すとおり、出力軸
60にはめ込まれた円柱材62の端面に直径板6
3を突設したものであり、これがユニツトの接続
具58及び59とかみ合うものである。
As shown in FIGS. 7 and 8, the connecting tool 61 at the tip of the output shaft 60 of the rotation introduction machine 13 has a diameter plate 6 on the end surface of a cylindrical member 62 fitted into the output shaft 60.
3 protrudingly provided, which engages with the connectors 58 and 59 of the unit.

次に、試料保持ユニツト38及び39は第9図
〜第12図に示すような構造を有する。すなわ
ち、ユニツトはエレベータ44上のレールに係合
し、この上を摺動できる両側ガイドプレート6
4,65と、それぞれ内部にレールと平行な軸を
有するベアリング66,68,70及び67,6
9,71を装着した前記ガイドプレート64,6
5間の一対のベアリングプレート75,76と、
これらのプレート75,76間において前記ベア
リング66−67,70−71及び68−69に支持
された外側ギア72,73及びメインギア74
と、チヤツク35によるユニツト把持を助ける係
合孔77を有するガイドプレート64,65の後
端下部に固定されたメインバー78(第10図及
び第11図)と、試料37を貫通保持するシヤフ
ト79,80を前記外側ギア72,73に連結す
るカツプリング81,82及び前記シヤフト7
9,80を前記カツプリング81,82に解除可
能に係合させるべく前記メインバー78と協同し
てそれらのシヤフト後端を保持する分離可能なセ
パレートプレート83を備えている。試料37は
シヤフト上の治具84,85により固定され、シ
ヤフト79,80の先端はネジ87,88により
カツプリング81,82に固定される。一方、メ
インギア74の先端には前記接続具58又は59
が固定され、その接続具先端面には4個のピン
86a,86b,86c,86dが対角配置され、これが前
記回転導入部材の接続板63(第7,8図)と係
合する。
Next, the sample holding units 38 and 39 have a structure as shown in FIGS. 9 to 12. That is, the unit has guide plates 6 on both sides that engage and can slide on rails on the elevator 44.
4, 65, and bearings 66, 68, 70 and 67, 6, each having an axis parallel to the rail inside.
The guide plates 64 and 6 equipped with the guide plates 9 and 71
a pair of bearing plates 75, 76 between 5;
Outer gears 72, 73 and main gear 74 are supported by the bearings 66-67, 70-71 and 68-69 between these plates 75, 76.
, a main bar 78 (FIGS. 10 and 11) fixed to the lower rear end of the guide plates 64 and 65, which has an engagement hole 77 that helps the chuck 35 grip the unit, and a shaft 79 that penetrates and holds the sample 37. , 80 to the outer gears 72, 73 and the shaft 7.
A separable separate plate 83 is provided which cooperates with the main bar 78 to hold the rear ends of the shafts 9, 80 in releasable engagement with the coupling rings 81, 82. The sample 37 is fixed by jigs 84, 85 on the shaft, and the tips of the shafts 79, 80 are fixed to coupling rings 81, 82 by screws 87, 88. On the other hand, the connecting tool 58 or 59 is attached to the tip of the main gear 74.
is fixed, and there are four pins on the tip of the connector.
86a, 86b, 86c and 86d are arranged diagonally and engage with the connecting plate 63 (FIGS. 7 and 8) of the rotation introducing member.

チヤツク35は第13図A及びBに示すとおり
の構造を有する。図の左端に仮想図示したシリン
ダロツド89は、第5図及び第6図に示したエア
シリンダ36の部分であり、この先端にチヤツク
35のセンタブロツク90が固定され、この両側
にレバー91を回動自在に支持するサイドプレー
ト97,98が固定される。サイドプレート9
7,98はブロツクより十分に突出し、先端にピ
ン95を突設したブロツク96を支持している。
レバー91はサイドプレートの後下部に設けられ
たピン92に枢支され、プレート97,98間の
架設ピン94に係止されたスプリング93により
ブロツク96の下側に圧接するよう引張られる。
従つて、チヤツク35は先端のピン95とレバー
91の先端フツクとの間においてユニツト38又
は39の後端バーを把持する。
The chuck 35 has a structure as shown in FIGS. 13A and 13B. The cylinder rod 89 shown virtually at the left end of the figure is a part of the air cylinder 36 shown in FIGS. 5 and 6. A center block 90 of the chuck 35 is fixed to the tip of the cylinder rod 89, and a lever 91 can be rotated on both sides of the cylinder rod 89. Side plates 97 and 98 that freely support are fixed. side plate 9
7 and 98 fully protrude from the block and support a block 96 having a pin 95 protruding from its tip.
The lever 91 is pivotally supported by a pin 92 provided at the rear lower part of the side plate, and is pulled so as to come into pressure contact with the lower side of the block 96 by a spring 93 that is engaged with an erection pin 94 between the plates 97 and 98.
Therefore, the chuck 35 grips the rear end bar of the unit 38 or 39 between the pin 95 at the end and the end hook of the lever 91.

チヤツク解除機構25の構造、及びこれとレー
ル16との関係は第14図及び第15図に示すと
おりである。レール16はユニツト38又は39
を支持及び摺動させるための段落面16aを内側
に形成し、段落面16aより高い外側上部16b
において、チヤツク解除機構25を係合させるべ
き位置にこの上部を横断する溝99を形成したも
のである。レール上部16bにはこの溝99に被
せるプレート100を固定し、その下側面101
を解除機構25の解除プレート102のための摺
動面とする。解除プレート102はレール16と
直交して水平に延びる本体が溝99内に突入し、
後端を垂直に折り曲げてナツト103によりエア
シリンダ24(第5図及び第6図)のシリンダロ
ツド104に固定されている。解除プレート10
2は管路23側の下側縁を面取りしてカム面と
し、シリンダロツド104が突出した第14図の
ごとき動作位置においてチヤツク35のレバー9
1の先端部と係合してこれを押し下げる。また、
エアシリンダ24により、シリンダロツド10
4、従つて解除プレート102を第15図の位置
から図の右方に後退させれば、チヤツク35のレ
バー91はこれによる押圧を解除され、再びユニ
ツト38又は39のメインバー78をひつかける
ことができる。
The structure of the chuck release mechanism 25 and the relationship between it and the rail 16 are as shown in FIGS. 14 and 15. Rail 16 is connected to unit 38 or 39
A stepped surface 16a for supporting and sliding is formed on the inside, and an outer upper part 16b higher than the stepped surface 16a.
A groove 99 is formed across the upper part of the chuck at the position where the chuck release mechanism 25 is to be engaged. A plate 100 that covers this groove 99 is fixed to the upper rail 16b, and the lower surface 101 of the plate 100 is fixed to the upper rail 16b.
is a sliding surface for the release plate 102 of the release mechanism 25. The release plate 102 has a main body extending horizontally perpendicular to the rail 16 and plunges into the groove 99.
The rear end is bent vertically and fixed to a cylinder rod 104 of an air cylinder 24 (FIGS. 5 and 6) with a nut 103. Release plate 10
2 is a cam surface by chamfering the lower edge of the conduit 23 side, and the lever 9 of the chuck 35 is in the operating position as shown in FIG.
1 and press it down. Also,
By the air cylinder 24, the cylinder rod 10
4. Therefore, if the release plate 102 is moved back from the position shown in FIG. 15 to the right in the figure, the lever 91 of the chuck 35 will be released from the pressure and the main bar 78 of the unit 38 or 39 can be engaged again. I can do it.

チヤツク35のレバー91の後端は、再び第1
3図を参照して明らかなとおり、先端フツクと逆
向のカムフオロワGを形成し、従つてエアシリン
ダ36(第5図及び第6図)により真空槽34内
の出発位置までチヤツク35が復帰した時は、解
除ブロツク50によりレバー91を押圧され、ユ
ニツト38又は39の把持を解除することが容易
に理解されよう。
The rear end of the lever 91 of the chuck 35 is again connected to the first
As is clear from FIG. 3, when the chuck 35 is returned to the starting position in the vacuum chamber 34 by the air cylinder 36 (FIGS. 5 and 6), the cam follower G is formed in the opposite direction to the end hook. It will be readily understood that the lever 91 is pressed by the release block 50 to release the grip on the unit 38 or 39.

最後に、第16図を参照して遮断機構27の説
明を行う。遮断機構27は、管路部23の中間に
突起した遮断機カバー部23aを一体形成し、こ
のカバー部23a及びその下側の管路部内に垂直
案内面105を形成し、これに沿つてゲート10
6を昇降させるようにしたものである。ゲート1
06はカバー部23a内に持ちあげられた時に管
路部23を開放し、管路部23内に下降した時に
はシート部107に固定されたOリング108に
密接して管路を遮断することができる。
Finally, the blocking mechanism 27 will be explained with reference to FIG. The shutoff mechanism 27 includes a breaker cover part 23a that projects in the middle of the conduit part 23, and forms a vertical guide surface 105 in the cover part 23a and the conduit part below the cover part 23a. 10
6 can be raised and lowered. gate 1
06 opens the conduit section 23 when it is lifted into the cover section 23a, and when it descends into the conduit section 23, it comes into close contact with the O-ring 108 fixed to the seat section 107 to shut off the conduit. can.

以上、本発明の一実施例を説明したが、予備真
空槽34でのユニツト準備数は図示説明した2個
に限るものではなく、同槽の容積及びエレベータ
44によるユニツト支持段数を増加させること等
で容易に増やすことができ、これによつてさらに
生産性を向上しうるものである。
Although one embodiment of the present invention has been described above, the number of units prepared in the preliminary vacuum tank 34 is not limited to the two illustrated and described, and the volume of the tank and the number of units supported by the elevator 44 can be increased, etc. can be easily increased, thereby further improving productivity.

発明の効果 本発明によれば、蒸着用真空槽と、複数個の試
料を保持回転しうる機構を有する搬送保持ユニツ
トを少くとも2個以上保持し、そのうち1個を蒸
着槽へ搬送するための機構を有する独立して真
空、又は大気状態を実現することが可能な真空予
備室と、蒸着槽と予備室を連結するための遮断機
構を有する気密管路とを備えた構成により試料交
換に要する時間を大幅に短縮できることはすでに
述べたとおりであり、しかも、真空槽内での試料
個々の移載が不必要なため槽内の機構も簡素化で
き、メンテナンスも容易である。また、蒸発源を
毎回調整することなく、一定状態に保つことで均
一な膜をつくりだすことができ、通じて生産性の
大幅な向上が望める。
Effects of the Invention According to the present invention, a vacuum chamber for vapor deposition and at least two conveyance/holding units each having a mechanism capable of holding and rotating a plurality of samples are held, and one of them is conveyed to a vapor deposition tank. The configuration includes a vacuum preparatory chamber with a mechanism that can independently create a vacuum or atmospheric state, and an airtight pipe line with a shutoff mechanism to connect the deposition tank and the preparatory chamber, making it possible to easily exchange samples. As already mentioned, the time can be significantly shortened, and since there is no need to transfer individual samples within the vacuum chamber, the mechanism inside the chamber can be simplified and maintenance is also easy. Additionally, by keeping the evaporation source constant without having to adjust it each time, a uniform film can be created, which can greatly improve productivity.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は円筒加工物の針視図、第2図は角形加
工物の斜視図、第3図は従来の真空蒸着装置の一
部断面平面図、第4図は同装置の一部断面正面
図、第5図は本発明の一実施例である真空蒸着装
置用試料搬送装置の平面図、第6図は同装置の平
面図、第7図、第8図は同装置の接続具詳細図、
第9図はユニツトの平面図、第10図は同装置の
断面正面図、第11図は同装置の側面図、第12
図は同装置の接続具詳細図、第13図A及びBは
チヤツクの平面図と断面正面図、第14図はチヤ
ツク解除機構の正面図、第15図は同機構の側面
図、第16図は遮断機構の断面図である。 53……真空排気装置、12……真空槽、11
……蒸発源、37……試料、55……真空排気装
置、23……管路、20,32……直線案内、3
8,39……ユニツト、35……チヤツク、5
8,59,61……接続具。
Fig. 1 is a needle perspective view of a cylindrical workpiece, Fig. 2 is a perspective view of a rectangular workpiece, Fig. 3 is a partially sectional plan view of a conventional vacuum evaporation apparatus, and Fig. 4 is a partially sectional front view of the same apparatus. 5 is a plan view of a sample transport device for a vacuum evaporation device which is an embodiment of the present invention, FIG. 6 is a plan view of the same device, and FIGS. 7 and 8 are detailed views of the connectors of the same device. ,
Figure 9 is a plan view of the unit, Figure 10 is a sectional front view of the unit, Figure 11 is a side view of the unit, and Figure 12 is a side view of the unit.
The figure is a detailed view of the connector of the same device, Figures 13A and B are a plan view and sectional front view of the chuck, Figure 14 is a front view of the chuck release mechanism, Figure 15 is a side view of the mechanism, and Figure 16. is a cross-sectional view of the blocking mechanism. 53... Vacuum exhaust device, 12... Vacuum chamber, 11
... Evaporation source, 37 ... Sample, 55 ... Vacuum exhaust device, 23 ... Pipe line, 20, 32 ... Straight line guide, 3
8, 39...Unit, 35...Chick, 5
8, 59, 61... Connection tool.

Claims (1)

【特許請求の範囲】 1 a 真空排気装置に接続されており、内部に
真空蒸着処理を行うための蒸発源を有する真空
蒸着槽と、 b 試料入れ替え用扉を備え、かつ真空排気装置
に接続されており、内部を真空状態及び大気圧
状態にすることができる予備真空槽と、 c 前記真空蒸着槽及び前記予備真空槽を連結す
る気密管路であつて両槽間を開閉するための遮
断機構を有する管路部と、 d 前記真空蒸着槽から前記管路部、及び前記管
路部から前記予備真空槽に致る直線ガイド機構
と、 e 前記直線ガイド機構上において摺動すること
ができる少くとも2個の試料保持ユニツトと、 f 前記予備真空槽内において、前記少なくとも
2個の保持ユニツトのうちの1個を前記直線ガ
イド上で摺動しうる動作位置に、残りの保持ユ
ニツトを待機位置に順次持たらすためのユニツ
ト準備機構、及び g 前記動作位置に持たらされた試料保持ユニツ
トを前記予備真空槽から前記真空蒸着槽に送り
込み、かつ逆戻しするための往復チヤツク機構
を備え、 前記真空蒸着槽に外部回転動力を槽内に導びく
ための回転導入機を設けると共に、前記試料保持
ユニツトに少くとも1個の試料を回転自在に保持
する保持回転部、及び前記保持回転を前記回転導
入機の出力端に接続する接続部とを設けたことを
特徴とする試料搬送機構を有する真空蒸着装置。
[Claims] 1 a. A vacuum evaporation tank connected to a vacuum evacuation device and having an evaporation source therein for performing vacuum evaporation processing; b. A vacuum evaporation tank having a sample exchange door and connected to the vacuum evacuation device. c) an airtight conduit connecting the vacuum evaporation tank and the preliminary vacuum tank, and a shutoff mechanism for opening and closing between the two tanks; d. a linear guide mechanism extending from the vacuum deposition tank to the duct section and from the duct section to the preliminary vacuum chamber; e. and (f) in the preliminary vacuum chamber, one of the at least two holding units is placed in an operating position where it can be slid on the linear guide, and the remaining holding units are placed in a standby position. g. a reciprocating chuck mechanism for transporting the sample holding unit held at the operating position from the preliminary vacuum chamber to the vacuum evaporation tank and back; The vapor deposition tank is provided with a rotation introduction device for guiding external rotational power into the tank, and the sample holding unit includes a holding rotation section that rotatably holds at least one sample, and the holding rotation is provided with a rotation introduction device for guiding external rotational power into the tank. 1. A vacuum evaporation apparatus having a sample transport mechanism, characterized in that the apparatus includes a connection part connected to an output end of the apparatus.
JP5125383A 1983-03-25 1983-03-25 Vacuum deposition device having material conveying mechanism Granted JPS59177367A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5125383A JPS59177367A (en) 1983-03-25 1983-03-25 Vacuum deposition device having material conveying mechanism

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5125383A JPS59177367A (en) 1983-03-25 1983-03-25 Vacuum deposition device having material conveying mechanism

Publications (2)

Publication Number Publication Date
JPS59177367A JPS59177367A (en) 1984-10-08
JPS6224502B2 true JPS6224502B2 (en) 1987-05-28

Family

ID=12881780

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5125383A Granted JPS59177367A (en) 1983-03-25 1983-03-25 Vacuum deposition device having material conveying mechanism

Country Status (1)

Country Link
JP (1) JPS59177367A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03101011U (en) * 1990-02-01 1991-10-22

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4684414B2 (en) * 2000-12-27 2011-05-18 株式会社アドバンテスト Vapor deposition apparatus, vapor deposition method, electron beam exposure apparatus, deflection apparatus, and manufacturing method of deflection apparatus

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5526047B2 (en) * 1976-05-06 1980-07-10
JPS5698478A (en) * 1980-01-08 1981-08-07 Toshiba Corp Vacuum treating device
JPS5763678A (en) * 1980-10-03 1982-04-17 Hitachi Ltd Sputtering device

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58696Y2 (en) * 1978-08-07 1983-01-07 株式会社徳田製作所 Sample processing equipment

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5526047B2 (en) * 1976-05-06 1980-07-10
JPS5698478A (en) * 1980-01-08 1981-08-07 Toshiba Corp Vacuum treating device
JPS5763678A (en) * 1980-10-03 1982-04-17 Hitachi Ltd Sputtering device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03101011U (en) * 1990-02-01 1991-10-22

Also Published As

Publication number Publication date
JPS59177367A (en) 1984-10-08

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