JPS6367745B2 - - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a door opening device for a door that is opened and closed to exchange wafers in an ion implantation apparatus that performs ion implantation processing on wafers of semiconductor material.

The applicant previously developed a disk d on which a plurality of wafers c were removably attached in a vacuum ion implantation chamber b equipped with an ion implantation port a as shown in FIGS.
is rotated to implant ions introduced into each wafer c through the ion injection port a, and the disk d is once attached to the door f of the lock chamber e connected to the ion implantation chamber b, and the door f is closed. We proposed an ion implanter that can be taken out to the outside when the door is opened. According to this, at least two disks d are prepared, and while one of the disks d is in the ion implantation chamber b and ion implantation is being performed on the wafer c, the gate valve g
After closing the lock chamber e, opening the door f of the lock chamber e, and replacing the ion-implanted wafer c on the other disk d with a new one, the lock chamber e can be evacuated, and the ion implantation chamber b can be evacuated. There is an advantage that the disk d can be replaced without deteriorating the processing efficiency and the processing efficiency can be improved. In this case, the disk d is mounted on a movable carriage h equipped with means for locking it, and is moved between the lock chamber e and the ion implantation chamber b, and in the ion implantation chamber b, it moves in and out and rotates. A movable drive device i removes a disk d from a carriage h and gives it rotation, and in a lock chamber e, a retractable chuck j drives a disk d and a carriage prepared at the back of the lock chamber e, for example. By grasping the disk d on the carriage h at the same time and shrinking it toward the door f side, the disk d on the carriage h is removed.
A ready-to-remove disk d can be mounted on the carriage h.

Furthermore, the applicant previously made the disk d as shown in FIGS. 3 and 4 horizontally rotate intermittently using the drive shaft k,
The processed wafer c is removed by rotating the L-shaped arm m with the suction cup l by 90 degrees, and at the same time a new wafer c is removed.
However, when the disk d is taken out from the lock chamber e of the ion implanter, it will automatically become ready to be attached to the drive shaft k of the automatic wafer exchanger after a series of ion implantations. Desirable for automating processing steps.

The purpose of the present invention is to satisfy these demands.In a vacuum ion implantation chamber equipped with an ion implantation port, a disk on which a plurality of wafers are removably attached is rotated to implant ions into each wafer. In a type in which the disk is once attached to the door of a lock chamber connected to the ion implantation chamber and taken out to the outside when the door is opened, the disk is attached to the outside of the door and attached to the lock chamber. The present invention is characterized in that it includes a moving device that moves forward and backward, and a swinging device that swings the moving device so that the disk inside the door faces downward when the moving device moves backward.

An embodiment of the present invention will be described with reference to FIG. 5. Reference numeral 1 indicates a vacuum ion implantation chamber equipped with an ion injection port 2, 3 indicates a disk on which a plurality of wafers 4 are detachably attached, and the disk 3 is removed from the front carriage 8 and rotated by a drive device 7 consisting of an electric motor 5 and a cylinder provided separately in the ion implantation chamber 1, and the ions introduced into the plurality of wafers 4 from the ion implantation port 2 are rotated. The beam is irradiated. Numeral 9 is a lock chamber connected to the side of the ion implantation chamber 1 via a gate valve 10. When the valve 10 is opened, the lock chamber 9 is also maintained at approximately the same vacuum as the ion implantation chamber 1, and a carriage can be freely operated. 8 is both rooms 1,
You can move between 9 spaces. 11 is a door for taking out the disk 3 from the lock chamber 9, and 12 is a chuck for temporarily locking the disk 3 to the door 11. The chuck 12 is moved into and out of the lock chamber 9 by a cylinder 13, and its claw The piece 12a can be expanded arbitrarily to grip the disk 3 by means of pressure fluid,
When the door 11 is opened, the disk 3 held by the chuck 12 also operates in the same manner as the door 11.

The above configuration is not much different from the previously proposed ion implantation apparatus, but in the present invention, as shown in FIGS. 6 to 8, there is a A moving device 14 that moves forward and backward toward the door, and a swinging device 15 that swings the moving device 14 and turns the disk 3 inside the door 11 downward when the moving device 14 retreats. The wafer is automatically taken out above the drive shaft 17 of the automatic wafer exchange device 16. The automatic wafer exchange device 16 has substantially the same configuration as the automatic wafer exchange device proposed earlier, and its drive shaft 17 is movable up and down by a lower cylinder (not shown), and the boss 3a of the disk 3 can be moved upwardly and downwardly. It is provided with a chuck 18 that is gripped from the outer periphery. To explain further, the moving device 14 has wheels 19 on each side, for example.
It is composed of a truck 20 equipped with a pair of cylinders 20 and a pair of cylinders 21 that move the truck 20 forward and backward toward the lock chamber 9 from behind. The outer surface is attached and fixed, and when the trolley 20 is moved forward by the cylinder 21, the door 1
1 is pressed against the periphery of the opening 9a of the lock chamber 9 to seal the lock chamber 9. Further, the moving device 15 includes, for example, a swinging frame 25 that is swingably attached to an underframe 23 with a support shaft 24, and a swing frame 25 that is installed on the swing frame 25 in a direction perpendicular to the lock chamber 9. Twin rail 2
6, and a swing cylinder 27 that swings the front part of the swing frame 25 downward about the support shaft 24. It begins to expand little by little,
As shown by the chain line in FIG. 8, the inside of the door 11 is directed downward. In this case, the disk 3 is normally attached to the chuck 12 of the door 11, so as the door 11 swings, the disk 3 also swings together, and the disk 3 is installed below the swing frame 25. The drive shaft 17 of the wafer exchanger 16 is opposed to the drive shaft 17 of the wafer exchanger 16. The chuck 12 of the door 11 is released when the drive shaft 17 rises and grips the boss 3a of the disk 3 with its chuck 18, and the disk 3 is released from the drive shaft 17.
The ion-implanted wafer is then lowered and rotated intermittently to replace the ion-implanted wafer with a new one.

The rear end of the cylinder 21 for moving the truck 20 forward and backward is engaged with a swing frame 25, and the rear end of the swing cylinder 27 is engaged above the lock chamber 9. 28 is a stopper that limits the backward movement of the truck 20.

To explain its operation, when the disk 3, which has been ion-implanted into the wafer 4, is carried into the lock chamber 9 by the carriage 8 and is stopped by the chuck 12, the lock chamber 9, which is closed off by the gate valve 10, is opened. The pressure is increased to atmospheric pressure, the cylinder 21 of the moving device 14 that had been pressing the door 11 contracts, and the truck 20 moves backward. When the truck 20 moves backward and the door 11 becomes swingable, the swing cylinder 27 of the swing device 15 extends, and the swing frame 25 to which the truck 20 is attached swings downward from its front end. The trailing door 11 and the disk 3 on its inner surface are positioned approximately horizontally on the drive shaft 17 of the automatic wafer exchange device 16. Therefore, the exchanger 16 can easily receive the disk 3 by moving the drive shaft 17 up and down, and can automatically carry out the entire process from ion implantation to wafer exchange.

In this way, according to the present invention, the door of the lock chamber is opened by a moving device that can move forward and backward, and a rocking device that swings when the door moves backward, so that the disk inside the door is automatically moved to the bottom surface. It is possible to take it out and attach it to a wafer exchange device for the next process, automate a series of ion implantation processing steps, and its structure is relatively simple and can be manufactured at low cost.

[Brief explanation of drawings]

Fig. 1 is a cross-sectional plan view of the ion implanter, Fig. 2 is a side view taken along the - line, Fig. 3 is a plan view of the automatic wafer exchanger, Fig. 4 is a side view taken along the - line, and Fig. 5. 6 is a cutaway plan view of an embodiment of the present invention, FIG. 6 is an enlarged plan view of the main part thereof, FIG. 7 is a rear view thereof, and FIG. 8 is a side view of FIG. 6. 1...Ion implantation chamber, 2...Ion injection port, 3
...Disk, 4...Wafer, 9...Lock chamber,
11... Door, 14... Moving device, 15... Rocking device.

Claims (1)

[Claims] 1 In a vacuum ion implantation chamber equipped with an ion implantation port, a disk on which multiple wafers are removably attached is rotated to implant ions into each wafer, and the disk is connected to the ion implantation chamber by the door of the lock chamber. In the type of locking device that is once attached to the door and taken out to the outside when the door is opened, there is a moving device on the outside of the door that moves forward and backward toward the lock chamber together with the moving device, and when the moving device is moved back. 1. A door opening device for an ion implantation apparatus, comprising a swinging device for swinging a disk inside the door to face downward.