JPS5263666A - Boron diffusion to silicon wafers - Google Patents

Boron diffusion to silicon wafers

Info

Publication number
JPS5263666A
JPS5263666A JP13950175A JP13950175A JPS5263666A JP S5263666 A JPS5263666 A JP S5263666A JP 13950175 A JP13950175 A JP 13950175A JP 13950175 A JP13950175 A JP 13950175A JP S5263666 A JPS5263666 A JP S5263666A
Authority
JP
Japan
Prior art keywords
silicon wafers
boron diffusion
wafer
diffusion
firing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13950175A
Other languages
Japanese (ja)
Inventor
Sadao Yoshimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP13950175A priority Critical patent/JPS5263666A/en
Publication of JPS5263666A publication Critical patent/JPS5263666A/en
Pending legal-status Critical Current

Links

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  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

PURPOSE: To prevent the formation of insoluble boron silicate in hydrofluoric acid by coating B compound on an Si wafer, firing the wafer for 1W20 minutes in an O2 or N2 + O2 atmosphere at 600W1200°C, then subjecting the wafer to diffusion treatment.
COPYRIGHT: (C)1977,JPO&Japio
JP13950175A 1975-11-20 1975-11-20 Boron diffusion to silicon wafers Pending JPS5263666A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13950175A JPS5263666A (en) 1975-11-20 1975-11-20 Boron diffusion to silicon wafers

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13950175A JPS5263666A (en) 1975-11-20 1975-11-20 Boron diffusion to silicon wafers

Publications (1)

Publication Number Publication Date
JPS5263666A true JPS5263666A (en) 1977-05-26

Family

ID=15246739

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13950175A Pending JPS5263666A (en) 1975-11-20 1975-11-20 Boron diffusion to silicon wafers

Country Status (1)

Country Link
JP (1) JPS5263666A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5671933A (en) * 1979-11-19 1981-06-15 Toshiba Corp Impurity diffusion to semiconductor substrate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5671933A (en) * 1979-11-19 1981-06-15 Toshiba Corp Impurity diffusion to semiconductor substrate

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