JPS51147259A - Manufacturing process of semiconductor device - Google Patents
Manufacturing process of semiconductor deviceInfo
- Publication number
- JPS51147259A JPS51147259A JP7082875A JP7082875A JPS51147259A JP S51147259 A JPS51147259 A JP S51147259A JP 7082875 A JP7082875 A JP 7082875A JP 7082875 A JP7082875 A JP 7082875A JP S51147259 A JPS51147259 A JP S51147259A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor device
- manufacturing process
- film
- nitric
- oxide film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Local Oxidation Of Silicon (AREA)
- Element Separation (AREA)
Abstract
PURPOSE: To eliminate the effect of stress upon a substrate silicon due to a nitric film by the formation of nitric film and oxide film, or, oxide film and nitric film and oxide film.
COPYRIGHT: (C)1976,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7082875A JPS51147259A (en) | 1975-06-13 | 1975-06-13 | Manufacturing process of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7082875A JPS51147259A (en) | 1975-06-13 | 1975-06-13 | Manufacturing process of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS51147259A true JPS51147259A (en) | 1976-12-17 |
Family
ID=13442816
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7082875A Pending JPS51147259A (en) | 1975-06-13 | 1975-06-13 | Manufacturing process of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS51147259A (en) |
-
1975
- 1975-06-13 JP JP7082875A patent/JPS51147259A/en active Pending
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