JPS5651732A - Exposure processing method - Google Patents

Exposure processing method

Info

Publication number
JPS5651732A
JPS5651732A JP12704079A JP12704079A JPS5651732A JP S5651732 A JPS5651732 A JP S5651732A JP 12704079 A JP12704079 A JP 12704079A JP 12704079 A JP12704079 A JP 12704079A JP S5651732 A JPS5651732 A JP S5651732A
Authority
JP
Japan
Prior art keywords
exposure
wafer
mask
chuck
semiconductor wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12704079A
Other languages
Japanese (ja)
Inventor
Teruo Shirai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP12704079A priority Critical patent/JPS5651732A/en
Publication of JPS5651732A publication Critical patent/JPS5651732A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE: To simultaneously operate position alignment and exposure by closely contacting a mask for X-ray exposure and a substrate (semiconductor wafer) to be exposed and performing the transfer from the position alignment position of patterns to the exposure position and exposure without breaking the relative position.
CONSTITUTION: An exposure mask 11 for X-rays is held fixed to a substrate supporting frame 11a, and both are so constituted as to be handled as one piece. A frame member 14 and a semiconductor wafer 13 are placed on a wafter chuck 15, and the exhaust hole 15a provided to the wafer chuck 15 is evacuated with a vacuum pump to fix the wafer 13. Thence, the wafer chuck 15 is moved upward to approach said exposure mask 11 and wafer 13, whereby position alignment of both is accomplished. Next, the wafer chuck 15 is slightly moved upward to closely contact said two. The transfer and exposure may be performed without breaking the relative position of both by closely contacting the mask 11 for X-ray exposure and the semiconductor wafer 13 in this way.
COPYRIGHT: (C)1981,JPO&Japio
JP12704079A 1979-10-02 1979-10-02 Exposure processing method Pending JPS5651732A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12704079A JPS5651732A (en) 1979-10-02 1979-10-02 Exposure processing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12704079A JPS5651732A (en) 1979-10-02 1979-10-02 Exposure processing method

Publications (1)

Publication Number Publication Date
JPS5651732A true JPS5651732A (en) 1981-05-09

Family

ID=14950139

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12704079A Pending JPS5651732A (en) 1979-10-02 1979-10-02 Exposure processing method

Country Status (1)

Country Link
JP (1) JPS5651732A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2745928A1 (en) 1976-10-13 1978-04-20 Hitachi Construction Machinery CONTROL PROCESS AND DEVICE FOR STABLE DRIVE ON THE WORK SURFACE DURING TUNNEL CONSTRUCTION WITH A TUNNEL BUILDING MACHINE OR SHIELD DRIVING MACHINE
JPS5921710U (en) * 1982-08-02 1984-02-09 株式会社ミツトヨ Measuring machine air bearing
JPS59108910A (en) * 1982-11-18 1984-06-23 ドクトル・ヨハネス・ハイデンハイン・ゲゼルシヤフト・ミト・ベシユレンクテル・ハフツング Measuring device
JPH01289424A (en) * 1988-05-13 1989-11-21 Takeshi Kuwazaki Water-sprinkling tube
EP0516317A2 (en) * 1991-05-29 1992-12-02 Orc Manufacturing Co., Ltd. Method of locating work in automatic exposing apparatus
EP0696762A1 (en) * 1994-07-29 1996-02-14 Orc Manufacturing Co., Ltd. Exposing apparatus with mask alignment system and method of aligning, exposing, and transferring work
USRE35537E (en) * 1987-12-18 1997-06-17 Konica Corporation Method and apparatus for forming color proof

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2745928A1 (en) 1976-10-13 1978-04-20 Hitachi Construction Machinery CONTROL PROCESS AND DEVICE FOR STABLE DRIVE ON THE WORK SURFACE DURING TUNNEL CONSTRUCTION WITH A TUNNEL BUILDING MACHINE OR SHIELD DRIVING MACHINE
JPS5921710U (en) * 1982-08-02 1984-02-09 株式会社ミツトヨ Measuring machine air bearing
JPS59108910A (en) * 1982-11-18 1984-06-23 ドクトル・ヨハネス・ハイデンハイン・ゲゼルシヤフト・ミト・ベシユレンクテル・ハフツング Measuring device
USRE35537E (en) * 1987-12-18 1997-06-17 Konica Corporation Method and apparatus for forming color proof
JPH01289424A (en) * 1988-05-13 1989-11-21 Takeshi Kuwazaki Water-sprinkling tube
EP0516317A2 (en) * 1991-05-29 1992-12-02 Orc Manufacturing Co., Ltd. Method of locating work in automatic exposing apparatus
EP0696762A1 (en) * 1994-07-29 1996-02-14 Orc Manufacturing Co., Ltd. Exposing apparatus with mask alignment system and method of aligning, exposing, and transferring work

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