JPS5210069A - Automatic apparatus for cleaning and drying wafer - Google Patents

Automatic apparatus for cleaning and drying wafer

Info

Publication number
JPS5210069A
JPS5210069A JP8647975A JP8647975A JPS5210069A JP S5210069 A JPS5210069 A JP S5210069A JP 8647975 A JP8647975 A JP 8647975A JP 8647975 A JP8647975 A JP 8647975A JP S5210069 A JPS5210069 A JP S5210069A
Authority
JP
Japan
Prior art keywords
cleaning
automatic
drying wafer
drying
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8647975A
Other languages
Japanese (ja)
Inventor
Tatsuya Matsui
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP8647975A priority Critical patent/JPS5210069A/en
Publication of JPS5210069A publication Critical patent/JPS5210069A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To make work simple in such a way that an apparatus for cleaning and that for drying semiconductor wafers and a jig are united and integrated, and operated automatically without a person's help.
COPYRIGHT: (C)1977,JPO&Japio
JP8647975A 1975-07-14 1975-07-14 Automatic apparatus for cleaning and drying wafer Pending JPS5210069A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8647975A JPS5210069A (en) 1975-07-14 1975-07-14 Automatic apparatus for cleaning and drying wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8647975A JPS5210069A (en) 1975-07-14 1975-07-14 Automatic apparatus for cleaning and drying wafer

Publications (1)

Publication Number Publication Date
JPS5210069A true JPS5210069A (en) 1977-01-26

Family

ID=13888097

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8647975A Pending JPS5210069A (en) 1975-07-14 1975-07-14 Automatic apparatus for cleaning and drying wafer

Country Status (1)

Country Link
JP (1) JPS5210069A (en)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52103097A (en) * 1976-02-24 1977-08-29 Tipton Mfg Corp Reciprocating machine tools provided with oscillating movement
JPS52115496A (en) * 1976-03-24 1977-09-28 Tipton Mfg Corp Process and apparatus for reciprocatingly working with rockable motion
JPS57501257A (en) * 1980-03-06 1982-07-15
JPS57142841U (en) * 1981-03-05 1982-09-07
JPS57147381A (en) * 1981-03-06 1982-09-11 Hitachi Denshi Ltd Delayed transmitting circuit of high frequency signal
JPS57178328A (en) * 1981-04-27 1982-11-02 Hitachi Ltd Wafer dryer
JPS5834923A (en) * 1981-08-27 1983-03-01 Toshiba Corp Drying method of semiconductor device
JPS63185488A (en) * 1987-01-27 1988-08-01 Fujitsu Ltd Automatic washing and draining device for body to be washed
JPH01312830A (en) * 1988-06-10 1989-12-18 Tokyo Electron Ltd Cleaning
US4960141A (en) * 1987-10-05 1990-10-02 Nukem Gmbh Device for cleaning in particular of disc-shaped oxide substrates
JPH0313600A (en) * 1989-06-12 1991-01-22 Daicel Chem Ind Ltd Stamper cleaning device

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52103097A (en) * 1976-02-24 1977-08-29 Tipton Mfg Corp Reciprocating machine tools provided with oscillating movement
JPS5442717B2 (en) * 1976-02-24 1979-12-15
JPS52115496A (en) * 1976-03-24 1977-09-28 Tipton Mfg Corp Process and apparatus for reciprocatingly working with rockable motion
JPS5442718B2 (en) * 1976-03-24 1979-12-15
JPS57501257A (en) * 1980-03-06 1982-07-15
JPS57142841U (en) * 1981-03-05 1982-09-07
JPS57147381A (en) * 1981-03-06 1982-09-11 Hitachi Denshi Ltd Delayed transmitting circuit of high frequency signal
JPS57178328A (en) * 1981-04-27 1982-11-02 Hitachi Ltd Wafer dryer
JPS5834923A (en) * 1981-08-27 1983-03-01 Toshiba Corp Drying method of semiconductor device
JPS63185488A (en) * 1987-01-27 1988-08-01 Fujitsu Ltd Automatic washing and draining device for body to be washed
US4960141A (en) * 1987-10-05 1990-10-02 Nukem Gmbh Device for cleaning in particular of disc-shaped oxide substrates
JPH01312830A (en) * 1988-06-10 1989-12-18 Tokyo Electron Ltd Cleaning
JPH0313600A (en) * 1989-06-12 1991-01-22 Daicel Chem Ind Ltd Stamper cleaning device

Similar Documents

Publication Publication Date Title
DE2966253D1 (en) Device for cooling semiconductor chips with monolithic integrated circuits
GB2099951B (en) Apparatus for cleaning semiconductor wafers
JPS5965426A (en) Heat treatment device for semiconductor wafer
DE68914479D1 (en) Edge exposure process for semiconductor wafers.
JPS5821332A (en) Device for baking resist on semiconductor wafer
DE2964965D1 (en) Semiconductor chip with improved ability for testing the large scale integrated circuits
GB2075921B (en) Processing semiconductor wafers
DE3466134D1 (en) Apparatus for the automatic, precise transport of objects, e.g. semiconductor wafers
GB2075259B (en) Semiconductor components for integrated circuits
JPS53108763A (en) Device for polishing semiconductor wafer
IL56224A (en) Substrate clamp for use in semiconductor fabrication
JPS51131274A (en) Tip bonding method
JPS5264872A (en) Apparatus for holding semiconductor wafers
JPS52117564A (en) Device for treating computerrcontrolled semiconductor wafer
GB2039030B (en) Alignment device for semiconductor masks and wafers
JPS51127682A (en) Manufacturing process of semiconductor device
JPS57178343A (en) Semiconductor wafer positioning method and device
JPS592342A (en) Heat treating device for semiconductor wafer
JPS52140280A (en) Semiconductor device
JPS51137393A (en) Manufacturing method for semiconductor light emitting device
JPS5212576A (en) Wafer washing drying device
JPS51114079A (en) Construction of semiconductor memory device
JPS5431273A (en) Manufacture of semiconductor device
DE2966008D1 (en) Device for the precise alignment of planar workpieces, e.g. semiconductor wafers
JPS51119168A (en) Floating matter filtration-and treatment apparatus