JPS5362475A - Photographic processing method of semiconductor wafers - Google Patents

Photographic processing method of semiconductor wafers

Info

Publication number
JPS5362475A
JPS5362475A JP13807776A JP13807776A JPS5362475A JP S5362475 A JPS5362475 A JP S5362475A JP 13807776 A JP13807776 A JP 13807776A JP 13807776 A JP13807776 A JP 13807776A JP S5362475 A JPS5362475 A JP S5362475A
Authority
JP
Japan
Prior art keywords
semiconductor wafers
photographic processing
processing method
mask
transparent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13807776A
Other languages
Japanese (ja)
Inventor
Tadayoshi Mifune
Yasuaki Nakane
Iwao Mori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP13807776A priority Critical patent/JPS5362475A/en
Publication of JPS5362475A publication Critical patent/JPS5362475A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To facilitate photographic processing of semiconductor wafers by bonding a transparent thin plate for mask to transparent plate for supporting and using an exposure mask which is so arranged as to give atmospheric pressure in the space between both.
COPYRIGHT: (C)1978,JPO&Japio
JP13807776A 1976-11-16 1976-11-16 Photographic processing method of semiconductor wafers Pending JPS5362475A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13807776A JPS5362475A (en) 1976-11-16 1976-11-16 Photographic processing method of semiconductor wafers

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13807776A JPS5362475A (en) 1976-11-16 1976-11-16 Photographic processing method of semiconductor wafers

Publications (1)

Publication Number Publication Date
JPS5362475A true JPS5362475A (en) 1978-06-03

Family

ID=15213412

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13807776A Pending JPS5362475A (en) 1976-11-16 1976-11-16 Photographic processing method of semiconductor wafers

Country Status (1)

Country Link
JP (1) JPS5362475A (en)

Similar Documents

Publication Publication Date Title
JPS5431273A (en) Manufacture of semiconductor device
JPS5225651A (en) Process for fabricating an optical curved surface using a photopolymer izable adhesive
JPS52136590A (en) Production of semiconductor device
JPS5318967A (en) Wafer sucking jig
JPS53114685A (en) Manufacture for semiconductor device
JPS5258374A (en) Improvement in sensitivity of positive type photo resist
JPS5362475A (en) Photographic processing method of semiconductor wafers
JPS51136289A (en) Semi-conductor producing
JPS5424571A (en) Manufacture for semiconductor wafer
JPS543473A (en) Manufacture of semiconductor device
JPS526467A (en) Manufacturing method of semi-conductors
JPS5252370A (en) Fabrication of glass-sealed semiconductor device
JPS51118392A (en) Manuforcturing process for semiconductor unit
JPS538073A (en) Mis type semiconductor device
JPS525270A (en) Photo-mask
JPS5359368A (en) Plasma etching
JPS52153669A (en) Photo mask of semiconductor integrated circuit
JPS52150975A (en) X-ray transfer apparatus
JPS5250690A (en) Etching process
JPS51132085A (en) Manufacturing method of semiconductor device
JPS5415672A (en) Manufacture of semiconductor device
JPS51118369A (en) Manufacturing process for simiconduator unit
JPS5382186A (en) Semiconductor photo detecting device
JPS5339872A (en) Etching method of wafers
JPS51114710A (en) Bottom plate structure