JPS5425169A - Matching method for photo mask against semiconductor wafer - Google Patents

Matching method for photo mask against semiconductor wafer

Info

Publication number
JPS5425169A
JPS5425169A JP9070877A JP9070877A JPS5425169A JP S5425169 A JPS5425169 A JP S5425169A JP 9070877 A JP9070877 A JP 9070877A JP 9070877 A JP9070877 A JP 9070877A JP S5425169 A JPS5425169 A JP S5425169A
Authority
JP
Japan
Prior art keywords
semiconductor wafer
matching method
photo mask
mask against
against semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9070877A
Other languages
Japanese (ja)
Inventor
Yasuhiro Funakoshi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP9070877A priority Critical patent/JPS5425169A/en
Publication of JPS5425169A publication Critical patent/JPS5425169A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To attain the matching with shifts between couples of marks made pointsymmetric by providing a plural number of marks to point-symmetrical points against a chip center and by providing a plural number of marks, which correspond to them, inside a mask.
COPYRIGHT: (C)1979,JPO&Japio
JP9070877A 1977-07-27 1977-07-27 Matching method for photo mask against semiconductor wafer Pending JPS5425169A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9070877A JPS5425169A (en) 1977-07-27 1977-07-27 Matching method for photo mask against semiconductor wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9070877A JPS5425169A (en) 1977-07-27 1977-07-27 Matching method for photo mask against semiconductor wafer

Publications (1)

Publication Number Publication Date
JPS5425169A true JPS5425169A (en) 1979-02-24

Family

ID=14006016

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9070877A Pending JPS5425169A (en) 1977-07-27 1977-07-27 Matching method for photo mask against semiconductor wafer

Country Status (1)

Country Link
JP (1) JPS5425169A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57102021A (en) * 1980-11-03 1982-06-24 Zeiss Jena Veb Carl Device for automatically controlling at least one article
JPS57106111U (en) * 1980-12-20 1982-06-30
JPS57106131A (en) * 1980-12-24 1982-07-01 Fujitsu Ltd Manufacture of semiconductor device
JPS59101829A (en) * 1982-12-01 1984-06-12 Canon Inc Arranging method of alignment mark
JPS61123139A (en) * 1985-10-11 1986-06-11 Canon Inc Alignment apparatus
JPH0218924A (en) * 1988-05-13 1990-01-23 Mrs Technol Inc Optical aligner with low reflection error for photolithography

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57102021A (en) * 1980-11-03 1982-06-24 Zeiss Jena Veb Carl Device for automatically controlling at least one article
JPS57106111U (en) * 1980-12-20 1982-06-30
JPS6110260Y2 (en) * 1980-12-20 1986-04-02
JPS57106131A (en) * 1980-12-24 1982-07-01 Fujitsu Ltd Manufacture of semiconductor device
JPH0312456B2 (en) * 1980-12-24 1991-02-20 Fujitsu Ltd
JPS59101829A (en) * 1982-12-01 1984-06-12 Canon Inc Arranging method of alignment mark
JPS61123139A (en) * 1985-10-11 1986-06-11 Canon Inc Alignment apparatus
JPH0218924A (en) * 1988-05-13 1990-01-23 Mrs Technol Inc Optical aligner with low reflection error for photolithography

Similar Documents

Publication Publication Date Title
JPS52140280A (en) Semiconductor device
JPS5431273A (en) Manufacture of semiconductor device
JPS5425169A (en) Matching method for photo mask against semiconductor wafer
JPS5211774A (en) Method of detecting relative position of patterns
JPS5223263A (en) Method of manufacturing semiconductor device
JPS542668A (en) Manufacture of semiconductor device
JPS52144973A (en) Positioning method of semiconductor wafers
JPS51126073A (en) Pattern printing equpment made available by photo-etching method
JPS5313423A (en) Photosensitive element of selenium for electronic photography
JPS535573A (en) Photo mask for semiconductor device
JPS52153669A (en) Photo mask of semiconductor integrated circuit
JPS5382173A (en) Positioning method
JPS5357781A (en) Semiconductor integrated circuit
JPS542663A (en) Positioning method for mounting semiconductor chip
JPS525270A (en) Photo-mask
JPS51118369A (en) Manufacturing process for simiconduator unit
JPS5372567A (en) Semiconductor device
JPS5311577A (en) Soldering method for wafers of semiconductor devices
JPS51113580A (en) Memory unit of large-scale semi- conductor integrated circuit
JPS53135568A (en) Manufacture for semiconductor device
JPS52101991A (en) Preparation of silicon target
JPS51112292A (en) Semiconductor device
JPS5331963A (en) Production of semiconductor device
JPS51147180A (en) Method of manufacturing of semiconductor device
JPS5427372A (en) Manufacture of semiconductor device