JPS5425169A - Matching method for photo mask against semiconductor wafer - Google Patents
Matching method for photo mask against semiconductor waferInfo
- Publication number
- JPS5425169A JPS5425169A JP9070877A JP9070877A JPS5425169A JP S5425169 A JPS5425169 A JP S5425169A JP 9070877 A JP9070877 A JP 9070877A JP 9070877 A JP9070877 A JP 9070877A JP S5425169 A JPS5425169 A JP S5425169A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor wafer
- matching method
- photo mask
- mask against
- against semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To attain the matching with shifts between couples of marks made pointsymmetric by providing a plural number of marks to point-symmetrical points against a chip center and by providing a plural number of marks, which correspond to them, inside a mask.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9070877A JPS5425169A (en) | 1977-07-27 | 1977-07-27 | Matching method for photo mask against semiconductor wafer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9070877A JPS5425169A (en) | 1977-07-27 | 1977-07-27 | Matching method for photo mask against semiconductor wafer |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5425169A true JPS5425169A (en) | 1979-02-24 |
Family
ID=14006016
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9070877A Pending JPS5425169A (en) | 1977-07-27 | 1977-07-27 | Matching method for photo mask against semiconductor wafer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5425169A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57102021A (en) * | 1980-11-03 | 1982-06-24 | Zeiss Jena Veb Carl | Device for automatically controlling at least one article |
JPS57106111U (en) * | 1980-12-20 | 1982-06-30 | ||
JPS57106131A (en) * | 1980-12-24 | 1982-07-01 | Fujitsu Ltd | Manufacture of semiconductor device |
JPS59101829A (en) * | 1982-12-01 | 1984-06-12 | Canon Inc | Arranging method of alignment mark |
JPS61123139A (en) * | 1985-10-11 | 1986-06-11 | Canon Inc | Alignment apparatus |
JPH0218924A (en) * | 1988-05-13 | 1990-01-23 | Mrs Technol Inc | Optical aligner with low reflection error for photolithography |
-
1977
- 1977-07-27 JP JP9070877A patent/JPS5425169A/en active Pending
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57102021A (en) * | 1980-11-03 | 1982-06-24 | Zeiss Jena Veb Carl | Device for automatically controlling at least one article |
JPS57106111U (en) * | 1980-12-20 | 1982-06-30 | ||
JPS6110260Y2 (en) * | 1980-12-20 | 1986-04-02 | ||
JPS57106131A (en) * | 1980-12-24 | 1982-07-01 | Fujitsu Ltd | Manufacture of semiconductor device |
JPH0312456B2 (en) * | 1980-12-24 | 1991-02-20 | Fujitsu Ltd | |
JPS59101829A (en) * | 1982-12-01 | 1984-06-12 | Canon Inc | Arranging method of alignment mark |
JPS61123139A (en) * | 1985-10-11 | 1986-06-11 | Canon Inc | Alignment apparatus |
JPH0218924A (en) * | 1988-05-13 | 1990-01-23 | Mrs Technol Inc | Optical aligner with low reflection error for photolithography |
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