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Konica Minolta Inc
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Konica Minolta Inc
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Priority to JP3992076ApriorityCriticalpatent/JPS52144969A/en
Publication of JPS52144969ApublicationCriticalpatent/JPS52144969A/en
Preparing Plates And Mask In Photomechanical Process
(AREA)
Abstract
PURPOSE: The durability of a hard mask is improved by depositing a transparent film which is not attacked by an etching solution for hard mask materials as a contact layer for substrates and forming the hard mask thereon.