JPS5255869A - Production of semiconductor device - Google Patents
Production of semiconductor deviceInfo
- Publication number
- JPS5255869A JPS5255869A JP13165375A JP13165375A JPS5255869A JP S5255869 A JPS5255869 A JP S5255869A JP 13165375 A JP13165375 A JP 13165375A JP 13165375 A JP13165375 A JP 13165375A JP S5255869 A JPS5255869 A JP S5255869A
- Authority
- JP
- Japan
- Prior art keywords
- production
- semiconductor device
- resist layer
- photo resist
- type photo
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Drying Of Semiconductors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To make possible the etching of fine patterns by forming a thin negative type photo resist layer and a thick positive type photo resist layer on the surface of a material to be etchied, and using a mask obtained by patterning.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13165375A JPS5255869A (en) | 1975-11-01 | 1975-11-01 | Production of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13165375A JPS5255869A (en) | 1975-11-01 | 1975-11-01 | Production of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5255869A true JPS5255869A (en) | 1977-05-07 |
Family
ID=15063075
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13165375A Pending JPS5255869A (en) | 1975-11-01 | 1975-11-01 | Production of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5255869A (en) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5259580A (en) * | 1975-11-11 | 1977-05-17 | Matsushita Electric Ind Co Ltd | Photo etching method |
JPS5618420A (en) * | 1979-07-23 | 1981-02-21 | Fujitsu Ltd | Manufacture of semiconductor device |
JPS5621328A (en) * | 1979-07-31 | 1981-02-27 | Fujitsu Ltd | Method of making pattern |
JPS5655055A (en) * | 1979-10-12 | 1981-05-15 | Matsushita Electric Ind Co Ltd | Manufacture of semiconductor device |
JPS589323A (en) * | 1981-07-10 | 1983-01-19 | Nippon Telegr & Teleph Corp <Ntt> | Formation of fine resist pattern |
JPS6027131A (en) * | 1983-07-25 | 1985-02-12 | Rohm Co Ltd | Method for coating photoresist |
JPS6045511U (en) * | 1983-09-02 | 1985-03-30 | 日本電気株式会社 | solid state microwave oscillator |
JPS60161622A (en) * | 1984-02-02 | 1985-08-23 | Rohm Co Ltd | Manufacture of semiconductor device |
JP2002110509A (en) * | 2000-09-27 | 2002-04-12 | Fujitsu Ltd | Method for manufacturing electronic device |
CN102592991A (en) * | 2012-03-09 | 2012-07-18 | 上海宏力半导体制造有限公司 | Photoresist removing method, metal wire etching method and production method of integrated circuit |
-
1975
- 1975-11-01 JP JP13165375A patent/JPS5255869A/en active Pending
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5259580A (en) * | 1975-11-11 | 1977-05-17 | Matsushita Electric Ind Co Ltd | Photo etching method |
JPS54372B2 (en) * | 1975-11-11 | 1979-01-10 | ||
JPS5618420A (en) * | 1979-07-23 | 1981-02-21 | Fujitsu Ltd | Manufacture of semiconductor device |
JPS5621328A (en) * | 1979-07-31 | 1981-02-27 | Fujitsu Ltd | Method of making pattern |
JPS5655055A (en) * | 1979-10-12 | 1981-05-15 | Matsushita Electric Ind Co Ltd | Manufacture of semiconductor device |
JPS589323A (en) * | 1981-07-10 | 1983-01-19 | Nippon Telegr & Teleph Corp <Ntt> | Formation of fine resist pattern |
JPS6027131A (en) * | 1983-07-25 | 1985-02-12 | Rohm Co Ltd | Method for coating photoresist |
JPS6045511U (en) * | 1983-09-02 | 1985-03-30 | 日本電気株式会社 | solid state microwave oscillator |
JPS60161622A (en) * | 1984-02-02 | 1985-08-23 | Rohm Co Ltd | Manufacture of semiconductor device |
JP2002110509A (en) * | 2000-09-27 | 2002-04-12 | Fujitsu Ltd | Method for manufacturing electronic device |
CN102592991A (en) * | 2012-03-09 | 2012-07-18 | 上海宏力半导体制造有限公司 | Photoresist removing method, metal wire etching method and production method of integrated circuit |
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