JPS5255869A - Production of semiconductor device - Google Patents

Production of semiconductor device

Info

Publication number
JPS5255869A
JPS5255869A JP13165375A JP13165375A JPS5255869A JP S5255869 A JPS5255869 A JP S5255869A JP 13165375 A JP13165375 A JP 13165375A JP 13165375 A JP13165375 A JP 13165375A JP S5255869 A JPS5255869 A JP S5255869A
Authority
JP
Japan
Prior art keywords
production
semiconductor device
resist layer
photo resist
type photo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13165375A
Other languages
Japanese (ja)
Inventor
Katsuyuki Inayoshi
Yorihiro Uchiyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP13165375A priority Critical patent/JPS5255869A/en
Publication of JPS5255869A publication Critical patent/JPS5255869A/en
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To make possible the etching of fine patterns by forming a thin negative type photo resist layer and a thick positive type photo resist layer on the surface of a material to be etchied, and using a mask obtained by patterning.
COPYRIGHT: (C)1977,JPO&Japio
JP13165375A 1975-11-01 1975-11-01 Production of semiconductor device Pending JPS5255869A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13165375A JPS5255869A (en) 1975-11-01 1975-11-01 Production of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13165375A JPS5255869A (en) 1975-11-01 1975-11-01 Production of semiconductor device

Publications (1)

Publication Number Publication Date
JPS5255869A true JPS5255869A (en) 1977-05-07

Family

ID=15063075

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13165375A Pending JPS5255869A (en) 1975-11-01 1975-11-01 Production of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5255869A (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5259580A (en) * 1975-11-11 1977-05-17 Matsushita Electric Ind Co Ltd Photo etching method
JPS5618420A (en) * 1979-07-23 1981-02-21 Fujitsu Ltd Manufacture of semiconductor device
JPS5621328A (en) * 1979-07-31 1981-02-27 Fujitsu Ltd Method of making pattern
JPS5655055A (en) * 1979-10-12 1981-05-15 Matsushita Electric Ind Co Ltd Manufacture of semiconductor device
JPS589323A (en) * 1981-07-10 1983-01-19 Nippon Telegr & Teleph Corp <Ntt> Formation of fine resist pattern
JPS6027131A (en) * 1983-07-25 1985-02-12 Rohm Co Ltd Method for coating photoresist
JPS6045511U (en) * 1983-09-02 1985-03-30 日本電気株式会社 solid state microwave oscillator
JPS60161622A (en) * 1984-02-02 1985-08-23 Rohm Co Ltd Manufacture of semiconductor device
JP2002110509A (en) * 2000-09-27 2002-04-12 Fujitsu Ltd Method for manufacturing electronic device
CN102592991A (en) * 2012-03-09 2012-07-18 上海宏力半导体制造有限公司 Photoresist removing method, metal wire etching method and production method of integrated circuit

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5259580A (en) * 1975-11-11 1977-05-17 Matsushita Electric Ind Co Ltd Photo etching method
JPS54372B2 (en) * 1975-11-11 1979-01-10
JPS5618420A (en) * 1979-07-23 1981-02-21 Fujitsu Ltd Manufacture of semiconductor device
JPS5621328A (en) * 1979-07-31 1981-02-27 Fujitsu Ltd Method of making pattern
JPS5655055A (en) * 1979-10-12 1981-05-15 Matsushita Electric Ind Co Ltd Manufacture of semiconductor device
JPS589323A (en) * 1981-07-10 1983-01-19 Nippon Telegr & Teleph Corp <Ntt> Formation of fine resist pattern
JPS6027131A (en) * 1983-07-25 1985-02-12 Rohm Co Ltd Method for coating photoresist
JPS6045511U (en) * 1983-09-02 1985-03-30 日本電気株式会社 solid state microwave oscillator
JPS60161622A (en) * 1984-02-02 1985-08-23 Rohm Co Ltd Manufacture of semiconductor device
JP2002110509A (en) * 2000-09-27 2002-04-12 Fujitsu Ltd Method for manufacturing electronic device
CN102592991A (en) * 2012-03-09 2012-07-18 上海宏力半导体制造有限公司 Photoresist removing method, metal wire etching method and production method of integrated circuit

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